Disclosed is a process to produce a purified vapor comprising dialkyl-furan-2,5-dicarboxylate (DAFD). Furan-2,5-dicarboxylic acid (FDCA) and an alcohol in an esterification zone to generate a crude diester stream containing dialkyl furan dicarboxylate (DAFD), unreacted alcohol, 5-(alkoxycarbonyl)furan-2-carboxylic acid (ACFC), and alkyl furan-2-carboxylate (AFC). The esterification zone comprises at least one reactor that has been previously used in an DMT process.

Disclosed is an apparatus for collecting a by-product in a semiconductor manufacturing process. An objective of the present invention is to provide an apparatus for collecting a by-product such that exhaust gas having great amount of light gas is coagulated while having sufficient residence time in a long flow path, whereby the exhaust gas is collected as a high-density by-product. For this purpose, the apparatus includes: a housing receiving and discharging introduced exhaust gas and configured with a horizontal vortex plate; an upper plate covering an upper portion of the housing; an internal collecting tower provided with a collecting tower cover and a seed eliminating fin to extend a flow path and residence time of the exhaust gas; a heater having a heat conduction plate; and an extended discharging pipe configured to extend the flow path and residence time of the exhaust gas and discharge the exhaust gas.

A cold trap has multiple interior spaces formed within one unit such that a vacuum pump pulls only dry air and distillate substantially fully or fully condenses and drops out of the bottom of the device. Laminar flow through a side portal is converted into turbulent flow in a cooling region around a conical cold glass or other inert protrusion. The only other portal of the cooling region is a bottom portal such that though there is vacuum suction, vapors only exit through the bottom portal after condensing and falling through an outer section while dry air is pulled upwards to an upper vacuum portal.

A cold trap has multiple interior spaces formed within one unit such that a vacuum pump pulls only dry air and distillate substantially fully or fully condenses and drops out of the bottom of the device. Laminar flow through a side portal is converted into turbulent flow in a cooling region around a conical cold glass or other inert protrusion. The only other portal of the cooling region is a bottom portal such that though there is vacuum suction, vapors only exit through the bottom portal after condensing and falling through an outer section while dry air is pulled upwards to an upper vacuum portal.

A refrigerator system or cryopump includes a first refrigerator having at least first and second stages, and a second refrigerator. A thermal coupling between the first stage of the first refrigerator and a cold end of the second refrigerator is restricted to maintain a temperature difference between the cold end of the second refrigerator and the first stage of the first refrigerator. The refrigerator system or cryopump also includes a radiation shield in thermal contact with the cold end of the second refrigerator, and a condensing surface, spaced from and surrounded by the radiation shield, and in thermal contact with a second stage, e.g., coldest stage, of the first refrigerator. The restricted thermal coupling can be configured to balance the cooling load on the two refrigerators.

A refrigerator system or cryopump includes a first refrigerator having at least first and second stages, and a second refrigerator. A thermal coupling between the first stage of the first refrigerator and a cold end of the second refrigerator is restricted to maintain a temperature difference between the cold end of the second refrigerator and the first stage of the first refrigerator. The refrigerator system or cryopump also includes a radiation shield in thermal contact with the cold end of the second refrigerator, and a condensing surface, spaced from and surrounded by the radiation shield, and in thermal contact with a second stage, e.g., coldest stage, of the first refrigerator. The restricted thermal coupling can be configured to balance the cooling load on the two refrigerators.

Process for the chemical vapor deposition by DLI-MOCVD on a substrate of a protective coating composed of at least one protective layer comprising a transition metal M: a) having available, in a feed tank, a mother solution containing a hydrocarbon solvent devoid of oxygen atom and a precursor of bis(arene) type containing the transition metal M to be deposited, and, if appropriate, a carbon-incorporation inhibitor; b) vaporizing said mother solution and introducing it into a CVD reactor in order to carry out the deposition of the protective layer on said substrate; c) collecting, at the outlet of the reactor, a fraction of the gaseous effluent comprising the unconsumed precursor, the aromatic byproducts of the precursor and the solvent, these entities together forming a daughter solution, and; d) pouring the daughter solution thus obtained into the feed tank in order to obtain a new mother solution capable of being used in step a).

Process for the chemical vapor deposition by DLI-MOCVD on a substrate of a protective coating composed of at least one protective layer comprising a transition metal M: a) having available, in a feed tank, a mother solution containing a hydrocarbon solvent devoid of oxygen atom and a precursor of bis(arene) type containing the transition metal M to be deposited, and, if appropriate, a carbon-incorporation inhibitor; b) vaporizing said mother solution and introducing it into a CVD reactor in order to carry out the deposition of the protective layer on said substrate; c) collecting, at the outlet of the reactor, a fraction of the gaseous effluent comprising the unconsumed precursor, the aromatic byproducts of the precursor and the solvent, these entities together forming a daughter solution, and; d) pouring the daughter solution thus obtained into the feed tank in order to obtain a new mother solution capable of being used in step a).

Device and method for the cryogenic purification of a stream of gas, comprising a purification circuit comprising a first inlet and a first set of filters arranged in series, the first set of filters comprising a terminal heat exchanger in a heat-exchange relationship with a cold source, the purification circuit comprising, downstream of the terminal exchanger, a first outlet, the device comprising at least one drive member intended to set the stream of gas in motion in the circuit, the purification circuit further comprising, between the terminal exchanger and the first outlet, a second set of filter(s), and the at least one drive member being configured to set two successive volumes of gas for purification in motion in opposite directions of circulation in the circuit. The invention also relates to a machine including such a device.

Device and method for the cryogenic purification of a stream of gas, comprising a purification circuit comprising a first inlet and a first set of filters arranged in series, the first set of filters comprising a terminal heat exchanger in a heat-exchange relationship with a cold source, the purification circuit comprising, downstream of the terminal exchanger, a first outlet, the device comprising at least one drive member intended to set the stream of gas in motion in the circuit, the purification circuit further comprising, between the terminal exchanger and the first outlet, a second set of filter(s), and the at least one drive member being configured to set two successive volumes of gas for purification in motion in opposite directions of circulation in the circuit. The invention also relates to a machine including such a device.