Process for the chemical vapor deposition by DLI-MOCVD on a substrate of a protective coating composed of at least one protective layer comprising a transition metal M: a) having available, in a feed tank, a mother solution containing a hydrocarbon solvent devoid of oxygen atom and a precursor of bis(arene) type containing the transition metal M to be deposited, and, if appropriate, a carbon-incorporation inhibitor; b) vaporizing said mother solution and introducing it into a CVD reactor in order to carry out the deposition of the protective layer on said substrate; c) collecting, at the outlet of the reactor, a fraction of the gaseous effluent comprising the unconsumed precursor, the aromatic byproducts of the precursor and the solvent, these entities together forming a daughter solution, and; d) pouring the daughter solution thus obtained into the feed tank in order to obtain a new mother solution capable of being used in step a).

A laminar path distillation device receives gaseous and/or liquid condensate material from a condenser. The liquid material exits through a bottom-side portal while the gaseous material is further cooled by way of a chilled coil. Some, all, or substantially all of the gaseous material which enters the laminar path distillation device passes there-through in a laminar manner until exiting via an exit portal into an apparatus housing a cold trap. As such, the laminar path of the gas is pulled through via a vacuum and also, in embodiments of the disclosed technology, extends on a diagonal slant downwards through the laminar path distillation device or cow.

A laminar path distillation device receives gaseous and/or liquid condensate material from a condenser. The liquid material exits through a bottom-side portal while the gaseous material is further cooled by way of a chilled coil. Some, all, or substantially all of the gaseous material which enters the laminar path distillation device passes there-through in a laminar manner until exiting via an exit portal into an apparatus housing a cold trap. As such, the laminar path of the gas is pulled through via a vacuum and also, in embodiments of the disclosed technology, extends on a diagonal slant downwards through the laminar path distillation device or cow.

A heat treatment furnace device for heat-treating precursor fiber bundles of carbon fibers, having: a heat treatment chamber, in which continuously supplied precursor fiber bundles are treated with hot air, a hot air circulation path, through which hot air from the heat treatment chamber returns to the heat treatment chamber, and a condensation/separation device, into which the hot air flowing through the hot air circulation path is introduced and separated into a condensate and a gas; wherein the condensation/separation device has:

a condensation treatment chamber and a condensation unit, which is provided in the condensation treatment chamber and has condensation surfaces on which the condensate is formed and allowed to drip down.

A heat treatment furnace device for heat-treating precursor fiber bundles of carbon fibers, having: a heat treatment chamber, in which continuously supplied precursor fiber bundles are treated with hot air, a hot air circulation path, through which hot air from the heat treatment chamber returns to the heat treatment chamber, and a condensation/separation device, into which the hot air flowing through the hot air circulation path is introduced and separated into a condensate and a gas; wherein the condensation/separation device has:

a condensation treatment chamber and a condensation unit, which is provided in the condensation treatment chamber and has condensation surfaces on which the condensate is formed and allowed to drip down.

Methods and systems for removing impurities (e.g. volatile organic compounds, water) from process gas streams, including condensing and freezing of the process gas stream, are provided herein.

A laminar path distillation device receives gaseous and/or liquid condensate material from a condenser. The liquid material exits through a bottom-side portal while the gaseous material is further cooled by way of a chilled coil. Some, all, or substantially all of the gaseous material which enters the laminar path distillation device passes there-through in a laminar manner until exiting via an exit portal into an apparatus housing a cold trap. As such, the laminar path of the gas is pulled through via a vacuum and also, in embodiments of the disclosed technology, extends on a diagonal slant downwards through the laminar path distillation device or cow.

A laminar path distillation device receives gaseous and/or liquid condensate material from a condenser. The liquid material exits through a bottom-side portal while the gaseous material is further cooled by way of a chilled coil. Some, all, or substantially all of the gaseous material which enters the laminar path distillation device passes there-through in a laminar manner until exiting via an exit portal into an apparatus housing a cold trap. As such, the laminar path of the gas is pulled through via a vacuum and also, in embodiments of the disclosed technology, extends on a diagonal slant downwards through the laminar path distillation device or cow.

An apparatus including a movable cryopump that may be disposed in a first operational position and a second regeneration position is disclosed. In the first operational position, the front surface of the cryopump may be disposed in the same plane as the wall of the processing chamber, effectively serving as a part of a chamber wall. In certain embodiments, the front surface of the cryopump may extend into the processing chamber. In the second regeneration position, the cryopump is retracted into a cavity, which is isolated from the processing chamber by a movable gate. The first operational position serves to enhance the pumping speed of the cryopump, while the second regeneration position ensures that previously trapped molecules are not released back into the processing chamber.

An apparatus including a movable cryopump that may be disposed in a first operational position and a second regeneration position is disclosed. In the first operational position, the front surface of the cryopump may be disposed in the same plane as the wall of the processing chamber, effectively serving as a part of a chamber wall. In certain embodiments, the front surface of the cryopump may extend into the processing chamber. In the second regeneration position, the cryopump is retracted into a cavity, which is isolated from the processing chamber by a movable gate. The first operational position serves to enhance the pumping speed of the cryopump, while the second regeneration position ensures that previously trapped molecules are not released back into the processing chamber.