Patent classifications
B01D41/00
AUTOMATED MEMBRANE CLEANING MODULE
A system performs automatic cleaning of a membrane module that is used in a water treatment unit to remove impurities from water. The water treatment unit is part of a water purification system that also includes a membrane cleaning unit that is located remotely from the water treatment unit. While both are part of a water purification system, a membrane cleaning unit may be physically separated from a water treatment unit. Such separation of positioning and functionality may allow for parallel operations of water purification and membrane module cleaning.
AUTOMATED MEMBRANE CLEANING MODULE
A system performs automatic cleaning of a membrane module that is used in a water treatment unit to remove impurities from water. The water treatment unit is part of a water purification system that also includes a membrane cleaning unit that is located remotely from the water treatment unit. While both are part of a water purification system, a membrane cleaning unit may be physically separated from a water treatment unit. Such separation of positioning and functionality may allow for parallel operations of water purification and membrane module cleaning.
EFFLUENT MANAGEMENT INLINE CLEANER
A cleaning apparatus for cleaning electronic substrates includes a rinse module having a rinse station configured to perform a rinse of electronic substrates and a rinse tank in fluid communication with the rinse station and configured to receive effluent from the rinse station. The cleaning apparatus further includes an effluent management and filtration system in fluid communication with the rinse tank. The effluent management and filtration system includes a pump in fluid communication with the rinse tank, the pump being configured to pump effluent from the rinse tank, a first filter in fluid communication with the pump, the first filter being configured to remove larger particles from the effluent, and a second filter in fluid communication with the first filter and the rinse tank, the second filter being configured to break down organics matter from the effluent.
EFFLUENT MANAGEMENT INLINE CLEANER
A cleaning apparatus for cleaning electronic substrates includes a rinse module having a rinse station configured to perform a rinse of electronic substrates and a rinse tank in fluid communication with the rinse station and configured to receive effluent from the rinse station. The cleaning apparatus further includes an effluent management and filtration system in fluid communication with the rinse tank. The effluent management and filtration system includes a pump in fluid communication with the rinse tank, the pump being configured to pump effluent from the rinse tank, a first filter in fluid communication with the pump, the first filter being configured to remove larger particles from the effluent, and a second filter in fluid communication with the first filter and the rinse tank, the second filter being configured to break down organics matter from the effluent.
ORGANIC SOLVENT COLLECTION APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND ORGANIC SOLVENT COLLECTION METHOD
An organic solvent collection apparatus includes at least one collection tank, a dewatering circulator, and a purification circulator. The collection tank stores a mixed liquid of an organic solvent and water. The dewatering circulator includes at least one dewatering circulation pipe connected to the collection tank and a circulation dewaterer that separates water from the mixed liquid, and generates a first concentrated liquid that is a mixed liquid in which a solvent concentration of the organic solvent is increased by circulation through the dewatering circulation pipe. The purification circulator includes at least one purification circulation pipe through which the first concentrated liquid is circulated and at least one filter that captures an impurity of the first concentrated liquid, and circulates the first concentrated liquid through the purification circulation pipe to generate a recycling liquid in which a content rate of the impurity in the first concentrated liquid is reduced.
ORGANIC SOLVENT COLLECTION APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND ORGANIC SOLVENT COLLECTION METHOD
An organic solvent collection apparatus includes at least one collection tank, a dewatering circulator, and a purification circulator. The collection tank stores a mixed liquid of an organic solvent and water. The dewatering circulator includes at least one dewatering circulation pipe connected to the collection tank and a circulation dewaterer that separates water from the mixed liquid, and generates a first concentrated liquid that is a mixed liquid in which a solvent concentration of the organic solvent is increased by circulation through the dewatering circulation pipe. The purification circulator includes at least one purification circulation pipe through which the first concentrated liquid is circulated and at least one filter that captures an impurity of the first concentrated liquid, and circulates the first concentrated liquid through the purification circulation pipe to generate a recycling liquid in which a content rate of the impurity in the first concentrated liquid is reduced.
DEVICE FOR CLEANING AND/OR SUCTIONING PILE FIBERS FOR PILE CLOTH FILTRATION
A device for cleaning and/or suctioning pile fibers for pile fabric filtration can be brought into a fluid connection with a suction source and includes at least one suction slot. The device for cleaning and/or suctioning has structure for mechanically cleaning, restoring and profiling the pile fibers. The structure increases the cleaning effect and simultaneously realigns the pile fibers and thus restores the pile fibers layer.
DEVICE FOR CLEANING AND/OR SUCTIONING PILE FIBERS FOR PILE CLOTH FILTRATION
A device for cleaning and/or suctioning pile fibers for pile fabric filtration can be brought into a fluid connection with a suction source and includes at least one suction slot. The device for cleaning and/or suctioning has structure for mechanically cleaning, restoring and profiling the pile fibers. The structure increases the cleaning effect and simultaneously realigns the pile fibers and thus restores the pile fibers layer.
FLUID FILTER FOR AN APPLIANCE INCORPORATING A DYNAMIC BYPASS MECHANISM
An appliance includes a filter housing having a filter chamber between a fluid inlet and outlet. A fluid filter is within the filter chamber and has a base and a particulate collector attached via a biasing mechanism that biases the particulate collector toward a filtering position. Operation of a fluid pump directs fluid from the fluid inlet and through a filter media of the particulate collector that biases the particulate collector away from the filtering position. The filter media separates particulate matter from the fluid. When the filter media is impacted by an amount of the captured particulate, the fluid creates a pressure differential that overcomes the biasing mechanism and biases the particulate collector to a bypass position that directs the fluid around an outside surface of the particulate collector and to the fluid outlet.
FLUID FILTER FOR AN APPLIANCE INCORPORATING A DYNAMIC BYPASS MECHANISM
An appliance includes a filter housing having a filter chamber between a fluid inlet and outlet. A fluid filter is within the filter chamber and has a base and a particulate collector attached via a biasing mechanism that biases the particulate collector toward a filtering position. Operation of a fluid pump directs fluid from the fluid inlet and through a filter media of the particulate collector that biases the particulate collector away from the filtering position. The filter media separates particulate matter from the fluid. When the filter media is impacted by an amount of the captured particulate, the fluid creates a pressure differential that overcomes the biasing mechanism and biases the particulate collector to a bypass position that directs the fluid around an outside surface of the particulate collector and to the fluid outlet.