Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

An air conditioning device is disclosed. The present air conditioning device comprises: a photocatalytic filter including a space through which air can pass and having a transition metal oxide formed in a nanotube form on the surface thereof, the transition metal oxide removing gases included in the air and including at least one of TiO.sub.2, ZnO, NiO, and WO.sub.3; and a light source for emitting light to the photocatalytic filter.

A gas trap system for metal organic chemical vapor deposition (MOCVD) exhaust abatement operations is provided. The gas trap system may include a housing including an inlet configured to receive exhaust gas and an outlet. The gas trap system may also include a conical inlet shield positioned within the housing. The conical inlet shield may form a first path between the housing and the conical inlet shield, wherein the first path receives the exhaust gas from the inlet. The conical inlet shield may also cool the exhaust gas and cause the exhaust gas to be uniformly distributed in the first path. The gas trap system may also include a filter configured to receive the exhaust gas from the first path and to filter the exhaust gas, wherein the filtered gas exhaust is provided to the outlet.

Process for the removal of volatile compounds from a tackifier comprising a resin with repeating units of formula I wherein R.sup.1 is a linear or branched alkylen group with 1 to 10 carbon atoms and R.sup.2 is a linear or branched, saturated or unsaturated N aliphatic hydrocarbon group with up to 20 carbon atoms, and optionally a plasticizer, wherein the tackifier is passed through at least one evaporator as film and the volatile compounds are removed from the film. ##STR00001##

A system configured to capture CO.sub.2 and able to be washed of the captured CO.sub.2 includes a material including an ionic liquid configured to capture CO.sub.2 in response to exposure to a gas comprising CO.sub.2 and to a thermal energy source and an aerogel holding the ionic liquid therein. The system may also include a washing solution configured to wash the captured CO.sub.2 from the material.

A synergetic system for waste treatment is provided. The synergetic system includes a waste treatment system configured to perform biological treatment of waste. Additionally, the synergetic system includes a gas purification system configured to purify exhaust gas generated during the biological treatment of the waste. The synergetic system further includes a feeding system configured to feed excess heat from the gas purification system back to the waste treatment system. The waste treatment system is further configured to use the fed back excess heat for the biological treatment of the waste.

In a process for the separation of a mixture containing hydrogen and carbon monoxide to produce gaseous hydrogen, the mixture is cooled down to a temperature below −180° C. and then separated at a temperature below −100° C. to produce a gas enriched in hydrogen and a fluid enriched in carbon monoxide, at least a part of the gas enriched in hydrogen is sent to a pressure swing adsorption separation apparatus operating at a temperature above 0° C. to produce a gas rich in hydrogen at a pressure of at least 20 bars, and at least a part of the gas rich in hydrogen is cooled in the heat exchanger down to a temperature below −100° C., reduced in pressure in a turbine down to a pressure of at least 8 bars and reheated in the heat exchanger to constitute a product rich in hydrogen at a pressure of at least 8 bars.

The present disclosure relates to methods for processing plastic waste pyrolysis gas, such as methods wherein clogging of the systems used in the method is avoided or at least alleviated.

Methods, systems, and apparatuses for coating a material by contacting the material with a coating material and a solvent are disclosed herein. The coated material can be obtained by evaporating the solvent: by heating the coated material directly or indirectly with electromagnetic radiation; by heating with heat generated from a heat source that heats an internal container for the material to be coated and/or coated material; and/or in an interior volume of a coating container having a side wall, by heating a portion of the side wall of the coating container and/or internal container with a heat source that is positioned outside of the interior volume of the coating container.

Systems for and methods of treating a fluid containing siloxanes, silanes and/or other silicon compounds. A hot box is configured to receive an initial flow of the fluid, react the flow with water at a temperature and pressure suitable for hydrolysis to generate a first treated flow, in which at least a portion is hydrolyzed to produce silicon dioxide and methane, and discharge the first treated flow. A solid removal mechanism can be configured to receive the first treated flow, separate at least a portion of the silicon dioxide as solid material, and discharge the remaining components as a second treated flow. Techniques of the present disclosure can lead to very low siloxane levels.