A feed system for a reactor, a reactor assembly comprising such a feed system, and a method of supplying a feed material to a reactor with a feed system are provided. The reactor may be a pyrolysis reactor, such as a fluidised bed pyrolysis reactor. A method of pyrolysing a feed material is also provided. The feed system may comprise a feed conduit extending from an inlet to an outlet, and may have a first section including the inlet and a second section including the outlet. The first section may accommodate an auger. The second section may comprise at least one plug forming zone in which feed material is compressed into a substantially gas-tight plug during operation. There may be a temperature regulator for controlling the temperature in the second section. The temperature regulator may comprise a cooling jacket.

The present disclosure generally relates to gas inject apparatus for a process chamber for processing of semiconductor substrates. The gas inject apparatus include one or more gas injectors which are configured to be coupled to the process chamber. Each of the gas injectors are configured to receive a process gas and distribute the process gas across one or more gas outlets. The gas injectors include a plurality of pathways, a fin array, and a baffle array. The gas injectors are individually heated. A gas mixture assembly is also utilized to control the concentration of process gases flown into a process volume from each of the gas injectors. The gas mixture assembly enables the concentration as well as the flow rate of the process gases to be controlled.

Devices and methods for reducing the specific energy required to reform or pyrolyze reactants in plasmas operating at high flow rates and high pressures are presented. These systems and methods include 1) introducing electrons and/or easily ionized materials to a plasma reactor, 2) increasing turbulence and swirl velocity of the flows of feed gases to have improved mixing in a plasma reactor, and 3) reducing slippage from a plasma reactor system. Such plasma systems may allow plasma reactors to operate at lower temperatures, higher pressure, with improved plasma ignition, increased throughput and improved energy efficiency. In preferred embodiments, the plasma reactors are used to produce hydrogen and carbon monoxide, hydrogen and carbon, or carbon monoxide through reforming and pyrolysis reactions. Preferred feedstocks include methane, carbon dioxide, and other hydrocarbons.

The present disclosure provides an apparatus for preparing oligomer including: a reactor; a gas-liquid separator; a solvent transfer line; a second transfer line; a first spray nozzle unit; and a second spray nozzle unit. The apparatus is capable of improving stability of the entire process by including a first spray nozzle unit and a second spray nozzle unit in a reactor and thus preventing by-products containing polymer substances such as C20+ from being entrained with a desired product during a reaction.

A clustered reaction system includes multiple reaction devices, a cooling device and a gas supply device. Each of the reaction devices includes a reaction tank unit defining a reaction space, multiple through holes extending through the reaction tank unit, a heat exchange module including a heat exchange passage surrounding the reaction tank, and an injection module extending through one of the through hole. The cooling device is connected to the heat exchange passages of the reaction devices for supplying a coolant into the heat exchange passages. The gas supply device is communicated fluidly with one of the through holes of each of the reaction devices for supplying a gas to the reaction devices.

The present disclosure relates to a device for directing a coking-prone liquid to a high temperature environment, where the device includes an inner tube positioned concentrically within an outer tube, creating a first annular space between an outer wall of the inner tube and an inner wall of the outer tube and a first intermediate tube positioned concentrically around the outer tube, creating a second annular space.

To prevent solidified aluminum chloride from adhering to and accumulating on a pipe and also prevent stress-corrosion cracking in the pipe, a method for producing trichlorosilane includes a cooling step of cooling a discharge gas that is discharged from a fluidized-bed reactor and that contains the trichlorosilane, the cooling step involving causing a fluid to flow through a space (4) inside a side wall (3) of a pipe (10), the pipe being a pipe for discharging the discharge gas from the fluidized-bed reactor, in such a manner that the side wall (3) has a surface (1a) having a temperature of not lower than 110° C.

An adsorbent system including an enclosure having a cavity defining a humidity-controlled environment and a body having or defining a channel therein. The body is coupled to the enclosure such that a first end of the channel is in selective fluid communication with an ambient environment and a second end of the channel is in fluid communication with the humidity-controlled environment. The system further includes an adsorbent material in the channel, wherein the channel and adsorbent material are configured such that inlet fluid flowing from the first end to the second end through the channel is flowable over at least a portion of the adsorbent material, and such that outlet fluid flowing from the second end to the first end is directly flowable over a majority of the portion of the adsorbent material that is flowable over by the inlet fluid, The system further includes a valve system positioned at or adjacent to or in fluid communication with the first end of the channel. The valve system includes an inlet valve portion that is biased to a closed position to generally block a flow of inlet fluid therethrough and that is movable to an open position when a pressure in the channel is sufficiently low relative to a pressure in the ambient environment. The valve system further includes an outlet valve portion that is biased to a closed position to generally block a flow of outlet fluid therethrough and that is movable to an open position when the pressure in the channel is sufficiently high relative to the pressure in the ambient environment.

The present disclosure relates to an apparatus for preparing an oligomer, and more particularly, to an apparatus for preparing an oligomer including: a reactor including a gaseous area having a first gaseous reactant inlet provided at a lower portion thereof, and a reaction area in which a reaction medium reacts with the gaseous reactant above the gaseous area; a second gaseous reactant inlet provided on an inner wall of the reactor in the gaseous area and a third gaseous reactant inlet provided on an inner wall of the reactor facing the second gaseous reactant inlet; and a first injection nozzle connected to the second gaseous reactant inlet and a second injection nozzle connected to the third gaseous reactant inlet.

A reactor for accommodating high contaminant feedstocks includes a reactor vessel having an inlet for introducing a feedstock containing contaminants into an interior of the reactor vessel. A basket is located within the reactor vessel interior and contains a particulate material for removing contaminants from the feedstock to form a purified feedstock that is discharged to a purified feedstock outlet. A catalyst is located within the reactor vessel and in fluid communication with the purified feedstock outlet of the basket for contacting the purified feedstock to form a desired product.