An adjustable nozzle assembly includes a receiver having a fluid inlet configured to be fluidly coupled to a fluid source and an internal surface defining a reception chamber fluidly coupled to the fluid inlet, a swivel member disposed in the reception chamber of the receiver, a nozzle coupled to the swivel member, fluidly coupled to the reception chamber, and configured to discharge fluid along a discharge axis, and a restriction member coupled to the receiver such that the swivel member is positioned between the receiver and the restriction member. The swivel member has an external surface including a substantially spherical external surface portion in contact with the internal surface of the receiver. The restriction member has a surface geometry defining a passageway through which the nozzle extends, and the surface geometry limits rotation of the swivel member within the receiver.

There is provided a shower head electrode assembly of a plasma processing apparatus, comprising: an electrode having a plurality of first gas flow paths and having a surface exposed to plasma; and a backing member attached to the electrode and having a plurality of second gas flow paths which communicate with the plurality of first gas flow paths. Each of the plurality of second gas flow paths is a slit-shaped elongated hole, and is configured such that a length of the elongated hole in radial direction is longer than a length of the elongated hole in circumferential direction with respect to a central axis of the shower head electrode assembly.

Exemplary dual-channel showerheads may include an upper plate that defines a first plurality of apertures. The showerheads may include a base having a lower plate. The lower plate may define a second plurality of apertures and a third plurality of apertures. Each of the first plurality of apertures may be fluidly coupled with a respective one of the second plurality of apertures to define a fluid path extending from a top surface of the showerhead through a bottom surface of the showerhead. The base may define a gas inlet that is fluidly coupled with the third plurality of apertures. The base may be detachably coupled with the upper plate using one or more fastening mechanisms. The showerheads may include a compressible gasket positioned between the upper plate and the lower plate.

A rectification member 32 is a rectification member that rectifies air that cools molten resin filaments discharged from a nozzle, including: a multi-cylindrical part in which a plurality of cylindrical cells 34a are formed; and a wire net 36 arranged to cover an opening part of the multi-cylindrical part. The wire net 36 has a mesh opening that is smaller than the size of the cylindrical cells 34a.

The present disclosure relates to automated or remotely controlled methods and apparatuses for cleaning and drying soiled external 2-D or 3-D image sensor surfaces such as objective lenses on Light Detection and Ranging (“LIDAR”) sensors when mounted in a configuration that is exposed to dirty environments.

An aircraft windshield wiper system includes a wiper arm, a wiper blade coupled to a first end of the wiper arm, and an output shaft coupled to a second end of the wiper arm. The wiper blade includes a fluid dispensing system including nozzles, a fluid control unit, fluid lines, fluid source, and a user interface. The wiper blade with the fluid dispensing system is configured to dispense a variety of fluids directly from the wiper blade onto the windshield of an aircraft.

A substance dispensing system including a first pressure vessel defining a first interior space; a first substance positioned in the first interior space; a first portion of a first propellant positioned in the first interior space; and a first portion of a second propellant positioned in the first interior space. At least 90 percent by weight of the first propellant is at least one of carbon dioxide, nitrous oxide, and combinations thereof. At least 90 percent by weight of the second propellant is at least one of nitrogen, argon, helium, oxygen, and combinations thereof.

A lithography apparatus includes a wafer chuck configured to hold a wafer, a fluid source configured to contain a fluid to be applied towards the wafer during a lithography process, a dispensing nozzle positioned above the wafer chuck and in fluid communication with the fluid source, the dispensing nozzle having an adjustable cross-section, and a mechanical mechanism operable to apply a force towards an outer surface of the dispensing nozzle to change the adjustable cross-section.

Systems and methods for fluid delivery into a ventilation system are disclosed. In an example, the technology relates to a fluid delivery system for delivery of aerosolized liquid. The fluid delivery system includes an injection tip having a set of orifices configured to aerosolize a liquid having certain properties. The injection tip may be couplable with components of a breathing circuit. For example, the injection tip may be couplable with components at or below a wye component (e.g., at a wye component or between the wye component and a patient), such as at the wye component or at an endotracheal tube multi-port connector. Alternatively, the injection tip may be integrated into a breathing circuit, such as at an endotracheal tube connector or at an endotracheal tube.

Provided is an equipment for treating a substrate. The substrate treating equipment may include: a nozzle supplying a chemical solution to a substrate; and a chemical solution supply apparatus supplying the chemical solution to the nozzle, and the chemical solution supply apparatus may include a pump member, an extraction nozzle provided on a flow path through which the chemical solution is introduced into the pump member and spraying the chemical solution by a spray scheme, and a control unit controlling an operation of the pump member.