Patent classifications
B05C3/00
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
According to embodiments, a substrate treatment apparatus includes a housing, a heater and a pipe. The housing stores solution containing phosphoric acid and houses a substrate including a silicon substrate. The heater heats the solution over a normal boiling point of the solution. The pipe supplies heated solution heated by the heater into the housing while generating air bubbles.
Agricultural seed treatment control system for liquid agrochemicals
A seed treatment applicator for applying a liquid seed treatment to an agricultural seed within a treatment chamber. A multi-port valve allows a first liquid source and a second liquid source to be fluidly connected to the multi-port valve. Multiple liquid sources may contain the same liquid treatment, mixed differently to have different densities. A liquid pump, such as a static rate pump, is fluidly connected downstream of the multi-port valve or directly connected to a liquid source. A modular control stick comprises a frame mounted to the treatment chamber, a mass flow meter mounted to the frame and fluidly connected downstream of the liquid pump and configured to generate a measured mass flow signal relative to a real time mass flow rate of the liquid seed treatment; and a flow meter transmitter operably connected to the mass flow meter and configured to generate a switch signal when comparison of the measured mass flow signal deviates from a reference value corresponding to a desired flow rate.
Agricultural seed treatment control system for liquid agrochemicals
A seed treatment applicator for applying a liquid seed treatment to an agricultural seed within a treatment chamber. A multi-port valve allows a first liquid source and a second liquid source to be fluidly connected to the multi-port valve. Multiple liquid sources may contain the same liquid treatment, mixed differently to have different densities. A liquid pump, such as a static rate pump, is fluidly connected downstream of the multi-port valve or directly connected to a liquid source. A modular control stick comprises a frame mounted to the treatment chamber, a mass flow meter mounted to the frame and fluidly connected downstream of the liquid pump and configured to generate a measured mass flow signal relative to a real time mass flow rate of the liquid seed treatment; and a flow meter transmitter operably connected to the mass flow meter and configured to generate a switch signal when comparison of the measured mass flow signal deviates from a reference value corresponding to a desired flow rate.
DEVICE AND METHOD FOR TREATING THE SURFACES OF MOULDED PARTS
A device and method is provided for treating surfaces, in particular for colouring moulded parts, said device comprising a container for receiving moulded parts and a first cover. The container can be closed, preferably, by using the first cover. A system is also provided for introducing liquid and/or powdery surface treatment agents into an inner chamber of the closed container. The system comprises a capsule in which the surface treatment agents which are to be introduced are accommodated.
METHODS, SYSTEMS, AND COMPOSITIONS FOR THE LIQUID-PHASE DEPOSITION OF THIN FILMS ONTO THE SURFACE OF BATTERY ELECTRODES
Methods, systems, and compositions for the liquid-phase deposition (LPD) of thin films. The thin films can be coated onto the surface of porous components of electrochemical devices, such as battery electrodes. Embodiments of the present disclosure achieve a faster, safer, and more cost-effective means for forming uniform, conformal layers on non-planar microstructures than known methods. In one aspect, the methods and systems involve exposing the component to be coated to different liquid reagents in sequential processing steps, with optional intervening rinsing and drying steps. Processing may occur in a single reaction chamber or multiple reaction chambers.
Apparatus to make decorations on prefabricated water-proofing bitumen-mix membranes and corresponding plant for the production of said prefabricated water-proofing membranes
Apparatus to make decorations on a prefabricated water-proofing bitumen-mix membrane, wherein the decorations are made by depositing solid particles, in the form of flakes, grains, sand or grit, suitable to adhere to at least one surface of said prefabricated water-proofing bitumen-mix membrane. The apparatus includes at least one transfer member provided with a support surface suitable to receive, support and transfer the solid particles toward the surface to be enhanced of the prefabricated water-proofing bitumen-mix membrane. The support surface is provided with a plurality of cavities suitable to receive the solid particles. The cavities are made inside at least one surface portion of the support surface and the surface portion, essentially reproducing the shape and sizes of at least one of the decorations.
Apparatus to make decorations on prefabricated water-proofing bitumen-mix membranes and corresponding plant for the production of said prefabricated water-proofing membranes
Apparatus to make decorations on a prefabricated water-proofing bitumen-mix membrane, wherein the decorations are made by depositing solid particles, in the form of flakes, grains, sand or grit, suitable to adhere to at least one surface of said prefabricated water-proofing bitumen-mix membrane. The apparatus includes at least one transfer member provided with a support surface suitable to receive, support and transfer the solid particles toward the surface to be enhanced of the prefabricated water-proofing bitumen-mix membrane. The support surface is provided with a plurality of cavities suitable to receive the solid particles. The cavities are made inside at least one surface portion of the support surface and the surface portion, essentially reproducing the shape and sizes of at least one of the decorations.
METHOD AND DEVICE FOR PLATING A RECESS IN A SUBSTRATE
The teaching relates to a method for plating a recess in a substrate, a device for plating a recess in a substrate and a system for plating a recess in a substrate comprising the device. The method for plating a recess in a substrate includes the following:
a) Providing a substrate with a substrate surface comprising at least one recess,
b) applying a replacement gas to the recess to replace an amount of ambient gas in the recess to at least partially clear the recess from the ambient gas,
c) applying a processing fluid to the recess, wherein the replacement gas dissolves in the processing fluid to at least partially clear the recess from the replacement gas, and
d) plating the recess.
Method and device for plating a recess in a substrate
The invention relates to a method for plating a recess in a substrate, a device for plating a recess in a substrate and a system for plating a recess in a substrate comprising the device. The method for plating a recess in a substrate comprises the following steps: a) Providing a substrate with a substrate surface comprising at least one recess, b) applying a replacement gas to the recess to replace an amount of ambient gas in the recess to at least partially clear the recess from the ambient gas, c) applying a processing fluid to the recess, wherein the replacement gas dissolves in the processing fluid to at least partially clear the recess from the replacement gas, and d) plating the recess.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus includes a processing tank, a holder, an organic solvent supply, a drainage port, a gas supply, and an exhaust port. The processing tank stores an aqueous layer. The holder holds a substrate. The organic solvent supply supplies an organic solvent onto the aqueous layer to form a liquid layer of the organic solvent. The drainage port discharges the aqueous layer from a bottom wall of the processing tank and causes the liquid layer of the organic solvent to descend from above the substrate to below the substrate. The gas supply supplies a gas of a water repellent agent to the liquid layer from above the processing tank while the liquid layer descends. The exhaust port is exposed on a side wall of the processing tank by the descending of the liquid layer and discharges the gas of the water repellent gas.