An automated painting system that includes a robotic arm and a painting end effector coupled at a distal end of the robotic arm, with the painting end effector configured to apply paint to a target surface. The painting system can also include a computing device executing a computational planner that: generates instructions for driving the painting end effector and robotic arm to perform at least one painting task that includes applying paint, via the painting the end effector, to a plurality of drywall pieces, the generating based at least in part on obtained target surface data; and drives the end effector and robotic arm to perform the at least one painting task.

The invention relates to a dosing system (1) for a dosing material having a nozzle (40), a feed channel (44) for dosing material, a discharge element (31), an actuator unit (10) that is coupled to the discharge element (31) and/or the nozzle (40) and has a piezo actuator (60), and a cooling device (2). The cooling device (2) comprises a supply device (21, 24, 26) for feeding a precooled cooling medium into a housing (11) of the dosing system (1). The cooling device (2) is configured for direct cooling of at least one subregion of the piezo actuator (60) and/or at least one subregion of a movement mechanism (14) coupled to the piezo actuator (60) by means of the precooled cooling medium.

A nozzle is provided for providing anode material into an electrochemical cell and method of using the same. The nozzle comprises a hollow tubular body extending between an open upper end and an open lower end; a lower deflector spaced apart from the open lower end of the hollow tubular body and forming an annular opening between a deflection surface of the lower deflector and the open lower end of the hollow tubular body; and a support rod connecting the lower deflector with the hollow tubular body, wherein the support rod is suspended within an interior of the hollow tubular body by one or more support trusses.

A nozzle is provided for providing anode material into an electrochemical cell and method of using the same. The nozzle comprises a hollow tubular body extending between an open upper end and an open lower end; a lower deflector spaced apart from the open lower end of the hollow tubular body and forming an annular opening between a deflection surface of the lower deflector and the open lower end of the hollow tubular body; and a support rod connecting the lower deflector with the hollow tubular body, wherein the support rod is suspended within an interior of the hollow tubular body by one or more support trusses.

An automated painting system that includes a robotic arm and a painting end effector coupled at a distal end of the robotic arm, with the painting end effector configured to apply paint to a target surface. The painting system can also include a computing device executing a computational planner that: generates instructions for driving the painting end effector and robotic arm to perform at least one painting task that includes applying paint, via the painting the end effector, to a plurality of drywall pieces, the generating based at least in part on obtained target surface data; and drives the end effector and robotic arm to perform the at least one painting task.

A system for forming a particle layer on a substrate may include at least one sprayer and at least two masks configured to selectively mask a substrate in a first region and second region of the substrate. The at least one sprayer may be configured to spray particles at the substrate, where the at least two masks maintain the first region and second region substantially free of the deposited material. A heater may be employed to heat the substrate as the particles are sprayed by the at least one sprayer onto the substrate.

A system for forming a particle layer on a substrate may include at least one sprayer and at least two masks configured to selectively mask a substrate in a first region and second region of the substrate. The at least one sprayer may be configured to spray particles at the substrate, where the at least two masks maintain the first region and second region substantially free of the deposited material. A heater may be employed to heat the substrate as the particles are sprayed by the at least one sprayer onto the substrate.

A system for forming a particle layer on a substrate may include at least one sprayer and at least two masks configured to selectively mask a substrate in a first region and second region of the substrate. The at least one sprayer may be configured to spray particles at the substrate, where the at least two masks maintain the first region and second region substantially free of the deposited material. A heater may be employed to heat the substrate as the particles are sprayed by the at least one sprayer onto the substrate.

A system for forming a particle layer on a substrate may include at least one sprayer and at least two masks configured to selectively mask a substrate in a first region and second region of the substrate. The at least one sprayer may be configured to spray particles at the substrate, where the at least two masks maintain the first region and second region substantially free of the deposited material. A heater may be employed to heat the substrate as the particles are sprayed by the at least one sprayer onto the substrate.

A substrate processing apparatus includes a substrate holder, a processing liquid supply and a cover unit. The substrate holder holds a substrate horizontally and rotate the substrate. The processing liquid supply supplies a processing liquid toward a first surface of the substrate held by the substrate holder. The cover unit faces a second surface of the substrate, the second surface being opposite to the first surface. The cover unit includes a heater configured to heat the substrate. The cover unit is provided with an opening at a position corresponding to a central portion of the substrate and multiple gas supply openings, at an outer peripheral side than the opening, through which a gas is supplied toward the second surface of the substrate. The gas is heated by the heater. A supply amount of at least some of the gas is adjusted based on a rotation speed of the substrate.