A fluid feed ring (5), a substrate coating apparatus (1) and a method are provided for coating a substrate (2) with a catalyst component. The fluid feed ring (5) comprises an annular body (40) having an inner face (45) bounding a central bore of the fluid feed ring. A fluid feed port (47) receives the liquid and a plurality of outlet apertures (50) on the inner face of the annular body discharge the liquid onto a piston face (23) of the substrate coating apparatus (1). A distribution channel (51) extending at least part-way around the annular body (40) provides fluid communication between the fluid feed port (47) and the plurality of outlet apertures (50).

A fluid feed ring (5), a substrate coating apparatus (1) and a method are provided for coating a substrate (2) with a catalyst component. The fluid feed ring (5) comprises an annular body (40) having an inner face (45) bounding a central bore of the fluid feed ring. A fluid feed port (47) receives the liquid and a plurality of outlet apertures (50) on the inner face of the annular body discharge the liquid onto a piston face (23) of the substrate coating apparatus (1). A distribution channel (51) extending at least part-way around the annular body (40) provides fluid communication between the fluid feed port (47) and the plurality of outlet apertures (50).

A syringe attachment/detachment mechanism enables a syringe to be easily attached to and detached from a discharge device without causing twisting of a tube, and enabling the syringe and an adapter to be fixedly held in a desired orientation. In the syringe attachment/detachment mechanism and the device provided with the mechanism, the mechanism being adapted for a discharge device to which a syringe including an attachment part and an upper connection part is attached through screwing, the attachment part includes an inner cylindrical portion having a small-diameter opening, an outer cylindrical portion surrounding the inner cylindrical portion, and a screw portion. The attachment/detachment mechanism includes a support member including a cylindrical insertion portion into which the inner cylindrical portion is inserted, and having a channel formed therein for communication between the small-diameter opening and a nozzle of the discharge device. A rotation member includes a screw portion.

A substrate processing apparatus includes a substrate heating unit arranged to heat the underside of a substrate while supporting the substrate thereon and an attitude changing unit arranged to cause the substrate heating unit to undergo an attitude change between a horizontal attitude and a tilted attitude. In an organic solvent removing step to be performed following a substrate heating step of heating the substrate, the substrate heating unit undergoes an attitude change to the tilted attitude so that the upper surface of the substrate becomes tilted with respect to the horizontal surface.

In general, according to one embodiment, a film coating apparatus includes a discharge section configured to discharge a film formation material; a voltage application section configured to apply a voltage to the film formation material, and to set the film formation material at a high potential relative to a film formation object which is subjected to film formation; a mask disposed at a position overlapping a non-coating portion of the film formation object along a direction from the discharge section toward the non-coating portion; and a potential adjusting module configured to make a potential of the mask equal to a potential of the film formation object.

The invention includes an automated device and method for applying wax to snow sporting equipment. This includes skis and snowboards and provides kiosks where skiers and boarders can deposit their equipment in a track and have appropriate wax for current snow conditions applied to the equipment.

A method for etching a bevel edge of a substrate in a processing chamber is provided. The method includes flowing an inert gas into a center region of the processing chamber defined above a center region of the substrate and flowing a mixture of an inert gas and a processing gas over an edge region of the substrate. The method further includes striking a plasma in the edge region, wherein the flow of the inert gas and the flow of the mixture maintain a mass fraction of the processing gas substantially constant. A processing chamber configured to clean a bevel edge of a substrate is also provided.

A device for manufacturing hot-mix coated materials includes an oven (1) having an enclosure (2) provided towards its two opposite ends with a main inlet (3) designed to receive granular materials and with a main outlet; and a heater (10) defining a combustion section (5) inside the enclosure (2). The enclosure (2) starting with the combustion section (5) and continuing with a drying section (6), and then with a mixing section (7). The device is further provided with a bypass outlet (11) and with an external mixer (12) that is connected to the bypass outlet (11), which outlet is fitted with a blocking system (15) allowing granular materials to pass towards the inlet (13) of the external mixer (12) and a closed position allowing granular materials to pass towards the mixing section (7).

A device for manufacturing hot-mix coated materials includes an oven (1) having an enclosure (2) provided towards its two opposite ends with a main inlet (3) designed to receive granular materials and with a main outlet; and a heater (10) defining a combustion section (5) inside the enclosure (2). The enclosure (2) starting with the combustion section (5) and continuing with a drying section (6), and then with a mixing section (7). The device is further provided with a bypass outlet (11) and with an external mixer (12) that is connected to the bypass outlet (11), which outlet is fitted with a blocking system (15) allowing granular materials to pass towards the inlet (13) of the external mixer (12) and a closed position allowing granular materials to pass towards the mixing section (7).

In one embodiment, a liquid treatment method includes (A) imaging a discharging port part of the liquid nozzle each time the discharging process is performed to one substrate, and acquiring, from images thus obtained, size data on foreign matter possibly present at the discharging port part; and (B) based on a history of the size data arranged in chronological order, judging whether an abnormality in substrate-processing has occurred. In the item (B), if the number of continuous acquisition, indicating how many times the size data not smaller than a first threshold value has been acquired continuously, exceeds a predetermined value, then judging that an abnormality in substrate-processing has occurred.