Patent classifications
B05C13/00
Gas cushion apparatus and techniques for substrate coating
A method of forming a material layer on a substrate comprises loading a substrate into a printing zone of a coating system using a substrate handler, printing an organic ink material on a substrate while the substrate is located in the printing zone, transferring the substrate from the printing zone to a treatment zone of the coating system, treating the organic ink material deposited on the substrate in the treatment zone to form a film layer on the substrate, and removing the substrate from the treatment zone using the substrate handler.
Gas cushion apparatus and techniques for substrate coating
A method of forming a material layer on a substrate comprises loading a substrate into a printing zone of a coating system using a substrate handler, printing an organic ink material on a substrate while the substrate is located in the printing zone, transferring the substrate from the printing zone to a treatment zone of the coating system, treating the organic ink material deposited on the substrate in the treatment zone to form a film layer on the substrate, and removing the substrate from the treatment zone using the substrate handler.
Movable wafer holder for film deposition chamber having six degrees of freedom
The present disclosure provides a flexible workpiece pedestal capable of tilting a workpiece support surface. The workpiece pedestal further includes a heater mounted on the workpiece support surface. The heater includes a plurality of heating sources such as heating coils. The plurality of heating sources in the heater allows heating the workpiece at different temperatures for different zones of the workpiece. For example, the workpiece can have a central zone heated by a first heating coil, a first outer ring zone that is outside of the central zone heated by a second heating coil, a second outer ring zone that is outside of the first outer ring zone heated by a third heating coil. By using the tunable heating feature and the tilting feature of the workpiece pedestal, the present disclosure can reduce or eliminate the shadowing effect problem of the related workpiece pedestal in the art.
Movable wafer holder for film deposition chamber having six degrees of freedom
The present disclosure provides a flexible workpiece pedestal capable of tilting a workpiece support surface. The workpiece pedestal further includes a heater mounted on the workpiece support surface. The heater includes a plurality of heating sources such as heating coils. The plurality of heating sources in the heater allows heating the workpiece at different temperatures for different zones of the workpiece. For example, the workpiece can have a central zone heated by a first heating coil, a first outer ring zone that is outside of the central zone heated by a second heating coil, a second outer ring zone that is outside of the first outer ring zone heated by a third heating coil. By using the tunable heating feature and the tilting feature of the workpiece pedestal, the present disclosure can reduce or eliminate the shadowing effect problem of the related workpiece pedestal in the art.
End effectors and methods for adhesively attaching a first part to a second part
An end effector, for adhesively attaching a first part to a second part, comprises a support and a first nozzle, coupled to the support and movable relative to the support, and a second nozzle, coupled to the support and movable relative to the support. The first nozzle comprises a first-nozzle body, comprising a first-nozzle-body outlet port and a first-nozzle separator plate, extending from the first-nozzle body. The second nozzle comprises a second-nozzle body, comprising a second-nozzle-body inlet port and a second-nozzle separator plate, extending from the second-nozzle body. The end effector further comprises a roller, coupled to the support, rotatable relative to the support about a roller axis, and located between the first nozzle and the second nozzle.
End effectors and methods for adhesively attaching a first part to a second part
An end effector, for adhesively attaching a first part to a second part, comprises a support and a first nozzle, coupled to the support and movable relative to the support, and a second nozzle, coupled to the support and movable relative to the support. The first nozzle comprises a first-nozzle body, comprising a first-nozzle-body outlet port and a first-nozzle separator plate, extending from the first-nozzle body. The second nozzle comprises a second-nozzle body, comprising a second-nozzle-body inlet port and a second-nozzle separator plate, extending from the second-nozzle body. The end effector further comprises a roller, coupled to the support, rotatable relative to the support about a roller axis, and located between the first nozzle and the second nozzle.
LIQUID MATERIAL DISCHARGE DEVICE AND LIQUID MATERIAL APPLICATION DEVICE
To provide a liquid material discharge device capable of adjusting relative alignment of a valve element with respect to a valve seat by mechanical means. A liquid material discharge device includes: a base member; a valve device mounted on the base member and including a valve element and a valve seat; and a valve driving device configured to move the valve element forward to and backward from the valve seat. The liquid material discharge device further includes an adjustment device 140 configured to adjust relative alignment of the valve element with respect to the valve seat, wherein the adjustment device includes a movable member 141 on which the valve driving device is disposed, and an inclination adjuster 146 configured to adjust an inclination of the movable member. A liquid material application device includes the liquid material discharge device.
LIQUID MATERIAL DISCHARGE DEVICE AND LIQUID MATERIAL APPLICATION DEVICE
To provide a liquid material discharge device capable of adjusting relative alignment of a valve element with respect to a valve seat by mechanical means. A liquid material discharge device includes: a base member; a valve device mounted on the base member and including a valve element and a valve seat; and a valve driving device configured to move the valve element forward to and backward from the valve seat. The liquid material discharge device further includes an adjustment device 140 configured to adjust relative alignment of the valve element with respect to the valve seat, wherein the adjustment device includes a movable member 141 on which the valve driving device is disposed, and an inclination adjuster 146 configured to adjust an inclination of the movable member. A liquid material application device includes the liquid material discharge device.
TILT AND ROTATE DISPENSER HAVING STRAIN WAVE GEAR SYSTEM
A dispensing system includes a dispensing unit assembly configured to dispense viscous material and a gantry coupled to the frame. The gantry is configured to support the dispensing unit assembly and to move the dispensing unit assembly in x-axis and y-axis directions. The dispensing unit assembly includes a support bracket secured to the gantry and a movable bracket rotatably coupled to the support bracket by a first strain wave gear system configured to enable the rotation of the movable bracket with respect to the support bracket about a first axis. The dispensing unit assembly further includes a dispensing unit rotatably coupled to the movable bracket by a second strain wave gear system configured to enable the rotation of the dispensing unit with respect to the movable bracket about a second axis generally perpendicular to the first axis.
TILT AND ROTATE DISPENSER HAVING STRAIN WAVE GEAR SYSTEM
A dispensing system includes a dispensing unit assembly configured to dispense viscous material and a gantry coupled to the frame. The gantry is configured to support the dispensing unit assembly and to move the dispensing unit assembly in x-axis and y-axis directions. The dispensing unit assembly includes a support bracket secured to the gantry and a movable bracket rotatably coupled to the support bracket by a first strain wave gear system configured to enable the rotation of the movable bracket with respect to the support bracket about a first axis. The dispensing unit assembly further includes a dispensing unit rotatably coupled to the movable bracket by a second strain wave gear system configured to enable the rotation of the dispensing unit with respect to the movable bracket about a second axis generally perpendicular to the first axis.