An application device according to an embodiment includes a liquid nozzle part, an air nozzle part, and an ejection controlling unit. The liquid nozzle part ejects liquid to be applied to an electronic component mounted on a substrate. The air nozzle part ejects air toward the substrate. The air nozzle is concentrically arranged with respect to the liquid nozzle part. The ejection controlling unit ejects the air from the air nozzle part at a timing in synchronization with an ejection timing of the liquid to be applied by the liquid nozzle part.

Systems and methods for inspecting and cleaning a nozzle of a dispenser are disclosed. The systems may include a platform supporting a cleaning substrate. The cleaning substrate may have a plurality of hook structures configured to remove a material from the nozzle. The systems may also include a camera configured to capture an image of the nozzle and a controller configured to control the system. The methods may include providing a cleaning substrate having a plurality of hook structures, and moving at least one of the nozzle and the cleaning substrate relative to the other to remove a material from the nozzle. The methods may also include capturing an image of the nozzle after dispensing with a camera, processing the image to generate a value, utilizing the value to determine if the nozzle should be cleaned, and if the determination is that the nozzle should be cleaned, cleaning the nozzle.

Systems and methods for inspecting and cleaning a nozzle of a dispenser are disclosed. The systems may include a platform supporting a cleaning substrate. The cleaning substrate may have a plurality of hook structures configured to remove a material from the nozzle. The systems may also include a camera configured to capture an image of the nozzle and a controller configured to control the system. The methods may include providing a cleaning substrate having a plurality of hook structures, and moving at least one of the nozzle and the cleaning substrate relative to the other to remove a material from the nozzle. The methods may also include capturing an image of the nozzle after dispensing with a camera, processing the image to generate a value, utilizing the value to determine if the nozzle should be cleaned, and if the determination is that the nozzle should be cleaned, cleaning the nozzle.

A mask assembly includes a mask frame in which a first opening is defined, the mask frame including a front surface through which the first opening extends, and a deposition mask which is attached to the front surface of the mask frame and through which a plurality of second openings is defined. The mask frame includes an in which the front surface extends along a direction of gravity, the deposition mask includes an initial mask which is attached to the front surface of the mask frame in the thereof and through which the plurality of second openings is defined, and the of the mask frame having the front surface which extends along the direction of gravity disposes the first opening of the mask frame corresponding to all of the plurality of second openings of the initial mask along the direction of gravity.

Apparatuses and methods related to a high pressure fluid processing device having a dual check valve setup that can be quickly and easily maintained with replacement parts are disclosed herein. In a general example embodiment, a high pressure processing device includes a body including a first surface having a first recess, a second surface having a second recess, and a third surface having a third recess, a first subassembly at least partially inserted into the first recess of the body, the first subassembly including a first check valve, a second subassembly at least partially inserted into the second recess of the body, the second subassembly including a second check valve, and a third subassembly at least partially inserted into the third recess of the body, the third subassembly coupling the body to a fluid driving mechanism, wherein the first subassembly, second subassembly and third subassembly are configured to be independently attachable to and detachable from the first recess, second recess and third recess, respectively.

Apparatuses and methods related to a high pressure fluid processing device having a dual check valve setup that can be quickly and easily maintained with replacement parts are disclosed herein. In a general example embodiment, a high pressure processing device includes a body including a first surface having a first recess, a second surface having a second recess, and a third surface having a third recess, a first subassembly at least partially inserted into the first recess of the body, the first subassembly including a first check valve, a second subassembly at least partially inserted into the second recess of the body, the second subassembly including a second check valve, and a third subassembly at least partially inserted into the third recess of the body, the third subassembly coupling the body to a fluid driving mechanism, wherein the first subassembly, second subassembly and third subassembly are configured to be independently attachable to and detachable from the first recess, second recess and third recess, respectively.

The present application discloses a decorating accessory 100 for protecting a surface beneath a hung door 200, the accessory 100 comprising an elongate tray 101 having a base 102 and a pair of longitudinal edges 103, 104 raised above the base 102, the tray 101 being tapered at a first end 105.

A mask assembly includes a mask frame in which a first opening is defined, the mask frame including a front surface through which the first opening extends, and a deposition mask which is attached to the front surface of the mask frame and through which a plurality of second openings is defined. The mask frame includes an in which the front surface extends along a direction of gravity, the deposition mask includes an initial mask which is attached to the front surface of the mask frame in the thereof and through which the plurality of second openings is defined, and the of the mask frame having the front surface which extends along the direction of gravity disposes the first opening of the mask frame corresponding to all of the plurality of second openings of the initial mask along the direction of gravity.

A system and method for controlling a needle motion of a material applicator are disclosed. The system includes an actuator assembly that contains a piezoelectric device, where the actuator assembly is connected to a needle and translates the needle along a vertical direction, and a sensor assembly that includes an emitter for emitting light, where a portion of the actuator assembly occludes a portion of the light. The sensor assembly also includes a receiver for receiving a non-occluded portion of the light and a sensor holder that secures the emitter and the receiver. The system further includes a controller in electrical communication with the piezoelectric device, emitter, and receiver, where the controller adjusts operation of the actuator assembly based on feedback received from the receiver.

A system and method for controlling a needle motion of a material applicator are disclosed. The system includes an actuator assembly that contains a piezoelectric device, where the actuator assembly is connected to a needle and translates the needle along a vertical direction, and a sensor assembly that includes an emitter for emitting light, where a portion of the actuator assembly occludes a portion of the light. The sensor assembly also includes a receiver for receiving a non-occluded portion of the light and a sensor holder that secures the emitter and the receiver. The system further includes a controller in electrical communication with the piezoelectric device, emitter, and receiver, where the controller adjusts operation of the actuator assembly based on feedback received from the receiver.