The enclosed disclosure relates to a method and apparatus for depositing functionalized nanoparticles within a semiconductor structure in order to create a nano-layer capable of enhancing imaging and contrast, The semiconductor structure can include any type of VNAND structure or 3D structure, The nanoparticles are formed in high-aspect ratio trenches of the structure and form a nano-layer. The functionalized nanoparticles comprise synthesized nanoparticles as well as organic molecules. The organic molecules are chosen to selectively bind to certain nanoparticles and surface materials.

A laminate including a base material and a resin layer provided on at least one surface of the base material. The resin layer is formed of a heat- or active energy ray-curable resin composition, and an outermost surface of the laminate on the one surface side of the base material has an unevenness containing a wrinkle structure.

Methods for plasma depositing polymers comprising cyclic siloxanes and related articles and compositions are generally provided. In some embodiments, the methods comprise flowing a precursor gas in proximity to a substrate within a PECVD reactor, wherein the precursor gas comprises an initiator and at least one monomer comprising a cyclic siloxane and at least two vinyl groups, and depositing a polymer formed from the at least one monomer on the substrate.

A method for making a dense organosilicon film with improved mechanical properties, the method comprising the steps of: providing a substrate within a reaction chamber; introducing into the reaction chamber a gaseous composition comprising hydrido-dialkyl-alkoxysilane; and applying energy to the gaseous composition comprising hydrido-dialkyl-alkoxysilane in the reaction chamber to induce reaction of the gaseous composition comprising hydrido-dialkyl-alkoxysilane to deposit an organosilicon film on the substrate, wherein the organosilicon film has a dielectric constant from ˜2.70 to ˜3.50, an elastic modulus of from ˜6 to ˜36 GPa, and an at. % carbon from ˜10 to ˜36 as measured by XPS.

A method of applying a gas-impermeable coating includes forming a polyelectrolyte complex suspension. The polyelectrolyte complex suspension is applied to a substrate. The substrate having the polyelectrolyte complex applied thereon is treated. The treating reduces salt content of the polyelectrolyte complex. The treating results in a gas-impermeable coating being formed on the substrate.

A method of applying a gas-impermeable coating includes forming a polyelectrolyte complex suspension. The polyelectrolyte complex suspension is applied to a substrate. The substrate having the polyelectrolyte complex applied thereon is treated. The treating reduces salt content of the polyelectrolyte complex. The treating results in a gas-impermeable coating being formed on the substrate.

A coating assembly for coating a plurality of substrates. The coating assembly includes a chamber. At least one target is disposed in the chamber and includes a coating material. At least one power supply is connected to the target. At least one support fixture is disposed in the chamber. The at least one support fixture includes a base having a plurality of recesses formed in an upper surface of the base. A first mounting component has a plurality of slots. The first mounting component is positioned on the upper surface of the base wherein at least some of the plurality of recesses are in registry with corresponding ones of the plurality of slots to define a plurality of cavities, each of the plurality of cavities configured to hold at least one of the plurality of substrates to be coated.

A method is described for inhibiting marine fouling on a surface. The surface is contacted with a composition comprising a waterborne polyurethane that is crosslinked with an acrylic acid functionalized polysaccharide, water, and a preservative. The composition is then dried to form a deposited film. The polysaccharide may be xanthan.

An apparatus for depositing organic layers on a substrate includes a gas-mixing device with one or more inlets, each for supplying a gas flow consisting of previously vaporized organic molecules that are conveyed by a carrier gas and have a molar mass greater than 300 g/mol or 400 g/mol, gas diversion elements which homogeneously mix the organic molecules in the carrier gas, and an outlet from which a homogeneous gas mixture discharges. The apparatus also comprises a conveying pipe which is connected to the outlet, and a gas inlet element that has a gas distribution volume, into which the conveying pipe leads and which has a gas outlet face that has gas outlet openings and faces a substrate holder for receiving the substrate. Furthermore, layers are deposited on the substrate using such an apparatus. The lateral homogeneity of the deposited layers is improved by one of several techniques.

The present invention provides a two-dimensional material nanosheets with a large area and a controllable thickness and a general preparation method therefor. As an intralayer heat transfer coefficient of a two-dimensional material is much higher than an interlayer heat transfer coefficient thereof, the two-dimensional material is uniformly heated and sublimated layer by layer by controlling the energy of the laser pulses, a thinning thickness is controlled by adjusting the action time of the laser pulses, and finally, a two-dimensional material film with a controllable thickness is obtained. At the same time, a sample displacement stage moving freely in a two-dimensional plane space can realize preparation of the two-dimensional material film with a large area. Compared with traditional methods, the present invention can control a sample thickness of the two-dimensional material film, has a high generality, and is suitable for all kinds two-dimensional materials.