Patent classifications
B05D3/00
Printing system and method
There is disclosed a method of printing onto the surface of a substrate, which method comprises i) coating a donor surface with a monolayer of particles, ii) treating the substrate surface to render at least selected regions tacky, and iii) contacting the substrate surface with the donor surface to cause particles to transfer from the donor surface only to the tacky regions of the substrate surface. After printing on a substrate, the donor surface returns to the coating station where the continuity of the monolayer is restored by recovering with fresh particles the regions of the donor surface exposed by the transfer of particles to the substrate.
Lubricious one-part hydrophilic coatings
A lubricious coating for use on an implantable medical device includes a heterochelic component, a homotelechelic polymer and biocompatible initiator. Methods of forming such lubricious coatings are also provided.
PREVENTION OF HYDROPHOBIC DEWETTING THROUGH NANOPARTICLE SURFACE TREATMENT
Disclosed in this specification is a method for coating a substrate to prevent dewetting. A suspension of nanoparticles is deposited onto the substrate to produce a nanoparticle layer. The nanoparticle layer is then coated with a monomer. The monomer polymerizes on the nanoparticle layer to produce a polymeric layer.
PREVENTION OF HYDROPHOBIC DEWETTING THROUGH NANOPARTICLE SURFACE TREATMENT
Disclosed in this specification is a method for coating a substrate to prevent dewetting. A suspension of nanoparticles is deposited onto the substrate to produce a nanoparticle layer. The nanoparticle layer is then coated with a monomer. The monomer polymerizes on the nanoparticle layer to produce a polymeric layer.
METHOD FOR THE CONTINUOUS PRODUCTION OF A LOW-DENSITY MINERAL FOAM
A method for the continuous production of a mineral foam of which the density in the dry state (d) is from 40 to 600 kg/m.sup.3, includes (i) mixing cement; a water reducing agent; 0.5 to 10%, % by weight with respect to the total weight of cement, of ultrafine particles having a liquid-solid contact angle comprised from 30° to 140°, and of which the D50 is from 10 to 600 nm; water, with a water/cement weight ratio from 0.3 to 2.5; (ii) adding to the mixture from 0.5 to 10% of a pore-forming agent, % by weight with respect to the weight of cement; (iii) applying the mixture obtained at step (ii) on a support; (iv) leaving the mixture to expand on the support.
Method and apparatus for producing a decorative workpiece and workpiece
The inventions relates to a method for producing a decorative workpiece with a structured surface comprising the following steps: (B) applying a first liquid lacquer having a coarse structuring over the entire surface, wherein a difference in thickness between thicker regions and thinner regions is at least 50 μm, in particular at least 100 μm; (E) applying a second liquid, at least partially transparent lacquer for producing a fine structuring in some regions. Furthermore, an apparatus for performing the method and a workpiece produced by the method are claimed.
METHOD FOR FORMING FINE PATTERNS
A method of forming fine patterns includes the steps of forming a conductive layer on a base part, forming a sacrificial layer including an adhesive material on the conductive layer, the adhesive material including a catechol group, forming resist patterns on the sacrificial layer, and forming fine patterns by patterning the conductive layer using the resist patterns as a mask.
Polylactide/silicon-containing block copolymers for nanolithography
The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.
Polylactide/silicon-containing block copolymers for nanolithography
The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.
Friction brake assembly with an abradable metal foam brake pad
A brake assembly and a method for manufacturing a brake assembly are provided. The brake assembly includes a brake pad affixed to a substrate. The brake pad extends from the substrate to a brake pad friction surface, and includes abradable cellular metal foam with the hardened ceramic particles.