A phased ultrasonic transducer and method for transmitting sound or ultrasound through a gaseous medium into a solid spectrum with ultrasound beam steering and focusing.

The present invention provides an ultrasonic washer that radiates ultrasonic waves from a plurality of vibration surfaces, radiates ultrasonic waves at the same phase, effectively generates cavitation around a nozzle through ultrasonic vibration, and has a high washing effect. The ultrasonic washer of the present invention is characterized by having: a washing tank in which is washed a nozzle that suctions a sample or reagent; and an ultrasonic vibrator having a piezoelectric element sandwiched between a front mass and a back mass, wherein a diaphragm between opposing upper and lower plates is formed at a leading end of the front mass installed at a leading end of the ultrasonic vibrator, and the nozzle is ultrasonically washed in a region between the upper plate and the lower plate

An ultrasonic block horn includes a generally cylindrical block of material having a first generally circular planar end surface, a second generally circular planar end surface and a generally circular circumferential side surface extending between the first and second generally planar end surfaces. A first plurality of through holes are formed in the generally cylindrical block of material, each of the first plurality of through holes extending from a first opening in the circumferential side surface to a second opening in the circumferential side surface, and each of the first plurality of through holes being generally parallel with, and spaced apart from, each other of the first plurality of through holes.

A rotary sonotrode comprises a rotary body that has a working surface and that is rotatably supported about its longitudinal axis in at least one rotary bearing. A vibration damper is provided between the rotary bearing and the rotary body.

A rotary sonotrode comprises a rotary body that has a working surface and that is rotatably supported about its longitudinal axis in at least one rotary bearing. A vibration damper is provided between the rotary bearing and the rotary body.

An ultrasound phased array transducer is disclosed that achieves suppression of grating lobes through the incorporation of a coupling layer, where the coupling layer is positioned adjacent to the phased array transducer such that an ultrasound beam propagates through the coupling layer prior to encountering a propagation medium. The phased-array elements may be provided such that one or both of the array pitch and a lateral extent of each ultrasound transducer element is larger than half of the ultrasound wavelength in the propagation medium. Grating lobes within the coupling layer and the propagation medium may be reduced or suppressed by selecting a coupling material having a speed of sound that exceeds that of the propagation medium. The coupling layer may have a thickness sufficient for the generation of a wavefront, and the coupling layer may be formed from a viscous or viscoelastic material.

An ultrasound phased array transducer is disclosed that achieves suppression of grating lobes through the incorporation of a coupling layer, where the coupling layer is positioned adjacent to the phased array transducer such that an ultrasound beam propagates through the coupling layer prior to encountering a propagation medium. The phased-array elements may be provided such that one or both of the array pitch and a lateral extent of each ultrasound transducer element is larger than half of the ultrasound wavelength in the propagation medium. Grating lobes within the coupling layer and the propagation medium may be reduced or suppressed by selecting a coupling material having a speed of sound that exceeds that of the propagation medium. The coupling layer may have a thickness sufficient for the generation of a wavefront, and the coupling layer may be formed from a viscous or viscoelastic material.

A method for controlling damages in cleaning a semiconductor wafer comprising features of patterned structures, the method comprising: delivering a cleaning liquid over a surface of a semiconductor wafer during a cleaning process; and imparting sonic energy to the cleaning liquid from a sonic transducer during the cleaning process, wherein power is alternately supplied to the sonic transducer at a first frequency and a first power level for a first predetermined period of time and at a second frequency and a second power level for a second predetermined period of time, the first predetermined period of time and the second predetermined period of time consecutively following one another, wherein at least one of the cleaning parameters is determined such that a percentage of damaged features as a result of the imparting sonic energy is lower than a predetermined threshold.

A method for controlling damages in cleaning a semiconductor wafer comprising features of patterned structures, the method comprising: delivering a cleaning liquid over a surface of a semiconductor wafer during a cleaning process; and imparting sonic energy to the cleaning liquid from a sonic transducer during the cleaning process, wherein power is alternately supplied to the sonic transducer at a first frequency and a first power level for a first predetermined period of time and at a second frequency and a second power level for a second predetermined period of time, the first predetermined period of time and the second predetermined period of time consecutively following one another, wherein at least one of the cleaning parameters is determined such that a percentage of damaged features as a result of the imparting sonic energy is lower than a predetermined threshold.

An ultrasonic vibrator driving apparatus performs driving by applying an alternating voltage as a drive voltage to an ultrasonic vibrator that includes a piezoelectric element and has a unique resonance frequency. The drive voltage is generated with a variable frequency in a frequency range including the resonance frequency of the ultrasonic vibrator. The frequency of the drive voltage is repeatedly swept with a predetermined sweep width and a predetermined sweep period so as to include the resonance frequency, based on a reference frequency set according to the resonance frequency of the ultrasonic vibrator. The sweep period and the sweep width are restricted by being associated so as to fall within a predetermined allowed range on a two-dimensional map divided by the sweep period and the sweep width.