A method of cleaning a component within a turbine that includes disassembling the turbine engine to provide a flow path to an interior passageway of the component from an access point. The component has coked hydrocarbons formed thereon. The method further includes discharging a flow of cleaning solution towards the interior passageway from the access point, wherein the cleaning solution is configured to remove the coked hydrocarbons from the component.

A method for inhibiting a flash point of trans-1,2-dichloroethylene (T-1,2-DCE) and a use of T-1,2-DCE are provided. The T-1,2-DCE has an excellent cleaning effect and is environmental friendly but cannot be used alone because of huge safety hazard caused by its low flash point. 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd) is used to inhibit the flash point of T-1,2-DCE. However, because the actual boiling points of these two substances are quite different, the two substances are easily separated at a slightly-high ambient temperature. Because a boiling point of HCFO-1233zd is extremely low, HCFO-1233zd will escape rapidly, resulting in the loss of inhibition on the flash point. In the present disclosure, T-1,2-DCE and 1-chloro-2,3,3-trifluoropropene are mixed to prepare a mixed solution, and the mixed solution can effectively maintain the inhibition on the flash point of T-1,2-DCE in various ambient temperatures, such that the T-1,2-DCE can be heated to generate a steam for cleaning.

A method for inhibiting a flash point of trans-1,2-dichloroethylene (T-1,2-DCE) and a use of T-1,2-DCE are provided. The T-1,2-DCE has an excellent cleaning effect and is environmental friendly but cannot be used alone because of huge safety hazard caused by its low flash point. 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd) is used to inhibit the flash point of T-1,2-DCE. However, because the actual boiling points of these two substances are quite different, the two substances are easily separated at a slightly-high ambient temperature. Because a boiling point of HCFO-1233zd is extremely low, HCFO-1233zd will escape rapidly, resulting in the loss of inhibition on the flash point. In the present disclosure, T-1,2-DCE and 1-chloro-2,3,3-trifluoropropene are mixed to prepare a mixed solution, and the mixed solution can effectively maintain the inhibition on the flash point of T-1,2-DCE in various ambient temperatures, such that the T-1,2-DCE can be heated to generate a steam for cleaning.

In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.

A foam sprayer includes a body defining a channel, a nozzle, and an adapter configured to releasably attach to a first fluid source that provides a first fluid at a first pressure. The foam sprayer includes a connector attached to the body and configured to releasably connect the body to the adapter or to a second fluid source that provides a second fluid at a second pressure that is substantially greater than the first pressure. The foam sprayer also includes a mode selection device configured to switch the foam sprayer between a low-pressure mode and a high-pressure mode. The foam sprayer is configured to generate foam from the first fluid when the foam sprayer is in the high-pressure mode. The foam sprayer is configured to generate foam from the second fluid when the foam sprayer is in the high-pressure mode.

A device for cleaning an end face of an optical fiber may apply a vacuum to a solvent tank, where the device includes a vacuum generator to apply the vacuum and the solvent tank. The device may receive, from a solvent reservoir and in response to applying the vacuum, solvent with the solvent tank. Additionally, or alternatively, a device for cleaning an end face of an optical fiber may apply a pressure to a solvent reservoir, where the device includes a pressure port to apply the pressure and a solvent tank. The device may receive, from the solvent reservoir and in response to applying the pressure, solvent with the solvent tank.

A cleaning-in-place system for use with an easily cleanable flexible belt. A sprocket is provided with a body having a first opening formed between adjacent pairs of teeth. The opening extends toward the center of the sprocket to provide access to the underside of the belt, when the belt engages with the sprocket, for application of cleaning medium.

Provided are a method and system for increasing etch rate and etch selectivity of a masking layer on a substrate in an etch treatment system, the etch treatment system configured for single substrate processing. The method comprises placing the substrate into the etch processing chamber, the substrate containing the masking layer and a layer of silicon or silicon oxide, obtaining a supply of steam water vapor mixture at elevated pressure, obtaining a supply of treatment liquid for selectively etching the masking layer over the silicon or silicon oxide at a selectivity ratio, combining the treatment liquid and the steam water vapor mixture, and injecting the combined treatment liquid and the steam water vapor mixture into the etch processing chamber. The flow of the combined treatment liquid and the steam water vapor mixture is controlled to maintain a target etch rate and a target etch selectivity ratio of the masking layer to the layer of silicon or silicon oxide.

An endoscope system includes a valve configured to keep an internal space of an endoscope airtight, an air pump configured to open and close the valve by applying a negative pressure and a positive pressure, a pressure sensor configured to detect a pressure at a time of the negative pressure and the positive pressure being applied, and a control section configured to receive a detection signal from the pressure sensor, and perform drive control of the air pump.

A system and method for cleaning, rinsing, and sanitizing a container is disclosed. The system has a sanitizing agent chamber for storing a sanitizing agent, the one or more solution chambers in fluid communication with the container, a pump in fluid commination with the sanitizing agent, wherein the pump is in communication with a gas, and at least one spray nozzle fluidly connected to the at least one solution chamber via a conduit positioned within the container, wherein the spray nozzle comprises a housing inside which the sanitizing agent is mixed at pressure with the gas to disperse the sanitizing agent and gas mixture into the container for sanitizing the container.