Provided is an apparatus for treating a substrate. The apparatus for treating a substrate may include: a liquid treating chamber configured to liquid-treat a substrate; and a controller configured to control the liquid treating chamber, and the liquid treating chamber may include a treating container having a treating space therein; a support unit configured to support and rotate the substrate in the treating space; a liquid supply unit configured to supply a liquid onto the substrate; and an elevation unit configured to adjust a relative height between the treating container and the support unit, and the controller may control the elevation unit so as to adjust the relative height between the treating container and the support unit according to a warpage state of the substrate supported on the support unit when conducting substrate treating by supplying the liquid onto the substrate while rotating the substrate.

Provided is an apparatus for treating a substrate. The apparatus for treating a substrate may include: a liquid treating chamber configured to liquid-treat a substrate; and a controller configured to control the liquid treating chamber, and the liquid treating chamber may include a treating container having a treating space therein; a support unit configured to support and rotate the substrate in the treating space; a liquid supply unit configured to supply a liquid onto the substrate; and an elevation unit configured to adjust a relative height between the treating container and the support unit, and the controller may control the elevation unit so as to adjust the relative height between the treating container and the support unit according to a warpage state of the substrate supported on the support unit when conducting substrate treating by supplying the liquid onto the substrate while rotating the substrate.

A cleaning apparatus includes a wash chamber, a platform and a lid. The platform is disposed in the chamber and sized to support an engine block. The lid has a first portion rotatably coupled to the wash chamber and a second portion rotatably coupled to the first portion. When the first portion of the lid is disposed in a position rotated distal to the wash chamber, the second portion of the lid is disposed in a position rotated proximal to the first portion of the lid. When the first portion of the lid is disposed in a position rotated proximal to the wash chamber, the second portion of the lid is disposed in a position rotated distal to the first portion of the lid.

A cleaning apparatus includes a wash chamber, a platform and a lid. The platform is disposed in the chamber and sized to support an engine block. The lid has a first portion rotatably coupled to the wash chamber and a second portion rotatably coupled to the first portion. When the first portion of the lid is disposed in a position rotated distal to the wash chamber, the second portion of the lid is disposed in a position rotated proximal to the first portion of the lid. When the first portion of the lid is disposed in a position rotated proximal to the wash chamber, the second portion of the lid is disposed in a position rotated distal to the first portion of the lid.

An onboard washing system provides the ability to wash specific areas at the rear of a concrete truck, without requiring an operator to climb a ladder or climb on the truck. Certain specified areas which are traditionally difficult to wash, including the inside of the charge hopper, the interior portions of the discharge chute, and rear portions of the mixing drum structure, can now be washed in an automated and efficient manner. The truck-mounted washing system has components which are specifically positioned to cause washing fluid (water) to be sprayed or directed toward predetermined areas in an efficient and effective manner. The system also includes hand-held washing wands or washing mechanisms, which allow an operator to easily reach additional zones or additional areas at the rear of the truck, which are lower. Most significantly, the truck-mounted wash systems and the hand-held nozzle systems (wand) are all operable while an operator remains on the ground.

An onboard washing system provides the ability to wash specific areas at the rear of a concrete truck, without requiring an operator to climb a ladder or climb on the truck. Certain specified areas which are traditionally difficult to wash, including the inside of the charge hopper, the interior portions of the discharge chute, and rear portions of the mixing drum structure, can now be washed in an automated and efficient manner. The truck-mounted washing system has components which are specifically positioned to cause washing fluid (water) to be sprayed or directed toward predetermined areas in an efficient and effective manner. The system also includes hand-held washing wands or washing mechanisms, which allow an operator to easily reach additional zones or additional areas at the rear of the truck, which are lower. Most significantly, the truck-mounted wash systems and the hand-held nozzle systems (wand) are all operable while an operator remains on the ground.

Methods and systems disclosed herein use acoustic energy to determine a gap between a wafer and an integrated circuit (IC) processing system and/or determine a thickness of a material layer of the wafer during IC processing implemented by the IC processing system. An exemplary method includes emitting acoustic energy through a substrate and a material layer disposed thereover. The substrate is positioned within an IC processing system. The method further includes receiving reflected acoustic energy from a surface of the substrate and a surface of the material layer disposed thereover and converting the reflected acoustic energy into electrical signals. The electrical signals indicate a thickness of the material layer.

Methods and systems disclosed herein use acoustic energy to determine a gap between a wafer and an integrated circuit (IC) processing system and/or determine a thickness of a material layer of the wafer during IC processing implemented by the IC processing system. An exemplary method includes emitting acoustic energy through a substrate and a material layer disposed thereover. The substrate is positioned within an IC processing system. The method further includes receiving reflected acoustic energy from a surface of the substrate and a surface of the material layer disposed thereover and converting the reflected acoustic energy into electrical signals. The electrical signals indicate a thickness of the material layer.

A firearm cleaning mat having an oil and/or solvent repellent surface and a small parts storage tray, the mat and tray being used during adjustment and maintenance of firearms. The oil and/or solvent repellent surface protects the firearm and the surface it is placed on from scratches and dents. The small parts storage tray is used to contain small parts and prevent them from being lost during firearm cleaning. A magnet is included in the small parts tray to retain small metal parts in the tray.

A firearm cleaning mat having an oil and/or solvent repellent surface and a small parts storage tray, the mat and tray being used during adjustment and maintenance of firearms. The oil and/or solvent repellent surface protects the firearm and the surface it is placed on from scratches and dents. The small parts storage tray is used to contain small parts and prevent them from being lost during firearm cleaning. A magnet is included in the small parts tray to retain small metal parts in the tray.