The present invention provides an UV cleaning device of a glass substrate, comprising a lamp box, an UV lamp positioned above inside the lamp box, a transparent shield positioned under the UV lamp, a humidifier positioned under the transparent shield and a power exhaust device under the transparent shield and opposite to the humidifier; in usage, the glass substrate is conveyed to be inside the lamp box, and UV light generated by the UV lamp irradiates on the glass substrate through the shield to clean the glass substrate and a humidity and an oxygen content inside the lamp box are adjusted with the humidifier to make a surface of the glass substrate adsorb one layer of water molecules. The electrons generated as the UV light cleans can be gradually conducted and led out with water molecules to effectively restrain the accumulation of the electrostatic to reduce the phenomenon of electrostatic damage, and meanwhile, the increase of the oxygen content makes the concentration of the activated oxygen atoms increases along with. Accordingly, the result of cleaning the organic objects with the UV light is promoted.

A method for controlling the direction of gas suctioning is carried out in a device (1) for producing a three-dimensional object (2) by selectively solidifying building material (13) layer by layer. The device (1) comprises an application device (12-14) for applying a layer of the building material (13) to a build area in a working plane (10), a solidifying device (20) for selectively solidifying the building material (13) in the applied layer, and at least two gas nozzles (40) which are arranged at the edge of the build area. The gas nozzles (40) are switchable into a function for suctioning gas from the device (1) and to a functionless state, and are switched depending on an operating state of the device (1).

Disclosed is a fume removal apparatus for a semiconductor manufacturing chamber. The disclosed fume removal apparatus for a semiconductor manufacturing chamber comprises: a fume exhaust pipe; a fume exhaust pipe opening-and-closing valve; a vacuum pump; and a control member, wherein the control member opens the fume exhaust pipe by opening the fume exhaust pipe opening-and-closing valve and forms a vacuum inside the fume exhaust pipe by operating the vacuum pump, so that fumes within the semiconductor manufacturing chamber can flow in along the fume exhaust pipe and be discharged to the outside. The disclosed fume removal apparatus for a semiconductor manufacturing chamber enables fumes to be rapidly, conveniently, and reliably removed from the semiconductor manufacturing chamber, and thus has an advantage of enabling a worker who should approach the inside of the semiconductor manufacturing chamber to safely perform work without coming into contact with the fumes.

A separating apparatus configured to separate a processing target object into a first separation body and a second separation body includes a first holder configured to hold the first separation body; a second holder configured to hold the second separation body; a moving unit configured to move the first holder and the second holder relatively to each other; and a separation surface cleaning unit configured to clean at least a separation surface of the first separation body or a separation surface of the second separation body.

A separating apparatus configured to separate a processing target object into a first separation body and a second separation body includes a first holder configured to hold the first separation body; a second holder configured to hold the second separation body; a moving unit configured to move the first holder and the second holder relatively to each other; and a separation surface cleaning unit configured to clean at least a separation surface of the first separation body or a separation surface of the second separation body.

In a substrate processing apparatus, the inner peripheral edge of a second-cup canopy part radially opposes an outer peripheral surface of an opposing-member side wall part. This suppresses dispersion of processing liquids to above a cup part. A second-cup gap distance that is a radial distance between the outer peripheral surface of the opposing-member side wall part and the inner peripheral edge of the second-cup canopy part is greater than a holder gap distance that is a radial distance between the inner peripheral surface of the opposing-member side wall part and the outer peripheral surface of the substrate holder. This prevents or suppresses the possibility that, when a second processing liquid dispersed from a substrate is received by a second cup, the second processing liquid may be pushed downward by a downward airflow. Accordingly, a plurality of types of processing liquids will be separately received by a plurality of cups.

A robust cleaning and ventilation system for a work station such as a manicure station, employing table geometry to create high efficiency in debris and odor removal while providing a conditioned make-up air return that completes the full ventilation process. The manicure station includes a modular implementation such that the necessary equipment is not a single custom bespoke installation and can be used universally.

A robust cleaning and ventilation system for a work station such as a manicure station, employing table geometry to create high efficiency in debris and odor removal while providing a conditioned make-up air return that completes the full ventilation process. The manicure station includes a modular implementation such that the necessary equipment is not a single custom bespoke installation and can be used universally.

The invention relates o a laser processing machine (11) with a laser processing head (12), with a support grate (16) that defines a support plane (A) for supporting a workpiece (8) to be processed, with a fluid supply device (21) and with a fluid removal device (31). The fluid supply device (21) and fluid removal device (31) are designed to generate a fluid flow (27) under the support plane (A) of the support grate (16). The fluid supply device (21) can be moved with the laser processing head (12).

A cleaner system for an MRI magnet room. The system includes a base vacuum and/or steam unit configured to supply vacuum and/or steam, the unit disposed outside the MRI magnet room. A hand-held or portable dispensing unit is substantially free of magnetic material so that it is safe to use inside the magnet room. A tubing system for conveying vacuum and/or steam from the base unit to the handheld unit, the tubing system including a magnet room portion configured for disposition inside the magnet room and free of magnetic material. A communication link is configured to communicate control signals generated by user manipulation of a control panel to the base unit.