Methods, systems, circuits, and devices for power-packet-switching power converters using bidirectional bipolar transistors (BTRANs) for switching. Four-terminal three-layer BTRANs provide substantially identical operation in either direction with forward voltages of less than a diode drop. BTRANs are fully symmetric merged double-base bidirectional bipolar opposite-faced devices which operate under conditions of high non-equilibrium carrier concentration, and which can have surprising synergies when used as bidirectional switches for power-packet-switching power converters. BTRANs are driven into a state of high carrier concentration, making the on-state voltage drop very low.

Electrostatic discharge (ESD) protection devices and methods. The ESD protection devices include a semiconductor substrate, a buried semiconducting layer, and an overlying semiconducting layer. The ESD protection devices also include a first bipolar device that includes a first bipolar device region, a first device base region, and a first device emitter region. The ESD protection devices also include a second bipolar device that includes a second bipolar device region, a second device well, a second device base region, and a second device emitter region. The ESD protection devices further include a sinker well that electrically separates the first bipolar device from the second bipolar device. The ESD protection devices are configured to transition from an off state to an on state responsive to receipt of greater than a threshold ESD voltage by the first device base region. The methods include methods of forming the ESD protection device.

In one embodiment, a shunt resistor is provided, comprising two terminals, a semiconductor substrate embodying at least one temperature sensor comprising at least a temperature sensitive element comprising at least one pn-junction, and at least two metal layers above the semiconductor substrate, at least the upper of the metal layer comprising a path that electrically connects the two terminals, whereby the temperature sensor is below and within the periphery of the upper metal layer.

According to example embodiments, a two-dimensional (2D) material element may include a first 2D material and a second 2D material chemically bonded to each other. The first 2D material may include a first metal chalcogenide-based material. The second 2D material may include a second metal chalcogenide-based material. The second 2D material may be bonded to a side of the first 2D material. The 2D material element may have a PN junction structure. The 2D material element may include a plurality of 2D materials with different band gaps.

A graphene base transistor comprises on a semiconductor substrate surface an emitter pillar and an emitter-contact pillar, which extend from a pillar foundation in a vertical direction. A dielectric filling layer laterally embeds the emitter pillar and the emitter-contact pillar above the pillar foundation. The dielectric filling layer has an upper surface that is flush with a top surface of the emitter pillar and with the at least one base-contact arm of a base-contact structure. A graphene base forms a contiguous layer between a top surface of the emitter pillar and a top surface of the base-contact arm. A collector stack and the base have the same lateral extension parallel to the substrate surface and perpendicular to those edges of the top surface of the emitter pillar and the base-contact arm that face each other.

Electrostatic discharge (ESD) protection is provided in circuits which use of a tunneling field effect transistor (TFET) or an impact ionization MOSFET (IMOS). These circuits are supported in silicon on insulator (SOI) and bulk substrate configurations to function as protection diodes, supply clamps, failsafe circuits and cutter cells. Implementations with parasitic bipolar devices provide additional parallel discharge paths.

Semiconductor devices and corresponding methods of manufacture are disclosed. The method includes forming vertical channel structures on a substrate. The vertical channel structures are formed within a layer stack of alternating layers of a first metal and a first dielectric. The vertical channel structures are channels of field effect transistors that have a current flow path perpendicular to a surface of the substrate. The vertical channel structures have a dielectric core. The method includes forming openings on the substrate that uncover a region of the layer stack adjacent to the vertical channel structures. The method includes, for each vertical channel structure, forming a corresponding staircase region in the layer stack, and forming metal contacts within each staircase region.

The present disclosure provides a transistor, a method for configuring the same, an electrostatic discharge (ESD) protection circuit, and an electronic device for ESD protection. The transistor comprises a P-type well, a body terminal region, a source region, and a metal silicide layer. The body terminal region and the source region are disposed within the P-type well. The body terminal region is adjacent to the source region. The metal silicide layer is disposed on surfaces of the body terminal region and the source region, and electrically connected to the body terminal region and the source region separately. A metal and contact structures are provided on the metal silicide layer to adjust the resistance between the emitter of the parasitic bipolar transistor of the transistor and the body terminal region or between the base of the parasitic bipolar transistor and the source region, for ESD protection.

The present disclosure provides a transistor, a method for configuring the same, an electrostatic discharge (ESD) protection circuit, and an electronic device for ESD protection. The transistor comprises a P-type well, a body terminal region, a source region, and a metal silicide layer. The body terminal region and the source region are disposed within the P-type well. The body terminal region is adjacent to the source region. The metal silicide layer is disposed on surfaces of the body terminal region and the source region, and electrically connected to the body terminal region and the source region separately. A metal and contact structures are provided on the metal silicide layer to adjust the resistance between the emitter of the parasitic bipolar transistor of the transistor and the body terminal region or between the base of the parasitic bipolar transistor and the source region, for ESD protection.

A bipolar transistor includes a sub-collector doped with a first dopant type and situated in a semiconductor substrate, a device layer doped with the first dopant type situated over the sub-collector, and a shallow trench isolation (STI) situated in the device layer and bordering a collector of the bipolar transistor. The bipolar transistor further includes a Reduced Surface Layer (RESURF) region doped with a second dopant type opposite the first dopant type situated between the collector and the STI, wherein the RESURF region protects against breakdown of the bipolar transistor.