A polishing system including a platen to support a polishing pad, a carrier head to hold a substrate against the polishing pad, a source of dry ice particles, and a pad conditioner. The pad conditioner includes a compressor to generate a compressed gas stream, a mixer coupled to the source and the compressor to mix the dry ice particles with the compressed gas stream to form a stream of compressed gas with entrained dry ice particles, and a nozzle coupled to the mixer to direct the stream of compressed gas with entrained dry ice particles onto a polishing surface of the polishing pad at sufficient velocity to condition the polishing pad.

A derusting machine includes at least two derusting wheels; a driving mechanism; a support assembly; a dust hood; a plurality of suction nozzles disposed through the dust hood; a vacuum cleaner; and a pipe. The at least two derusting wheels are perpendicular to each other; each derusting wheel includes a plurality of wire wheels and a rotating wheel disposed between the plurality of wire wheels, and each the rotating wheel includes a carbide bit. The at least two derusting wheels are connected to the driving mechanism. The driving mechanism is disposed in or on the support assembly. The support assembly is a handle, a conveyor, or a support frame. The dust hood is attached to the at least two derusting wheels. The plurality of suction nozzles is connected to the vacuum cleaner through the pipe.

A processing apparatus includes a processing unit grinding or polishing the reverse side, which is exposed upwardly, of a wafer, an infrared camera unit capturing an image of the wafer from the reverse side thereof and acquiring an image including the face side of the wafer, an information register having information on a pattern of structural objects which a wafer to be processed is to have on the face side, registered therein, and a determining unit determining that the wafer to be determined is a wafer to be processed if the pattern of structural objects which a wafer to be processed is to have on the face side is found on the wafer to be determined before being processed by the processing unit.

Rotating applicators are disclosed. A disclosed example apparatus includes an inlet to receive a surface coating to be applied to a surface of a workpiece, a shaft having a fluid channel extending therethrough, where the fluid channel is in fluid communication with the inlet, and an applicator coupled to an end of the shaft, where the applicator has an opening in fluid communication with the fluid channel. The apparatus also includes a pump to cause the surface coating to flow from the inlet to the opening, and a motor to rotate the shaft while the applicator dispenses the surface coating from the opening.

A method of processing a ferrule end face using at least one grinding wheel rotatable about a central axis and having a working surface with an abrasive element is provided. The method includes holding the ferrule stationary, engaging the end face of the ferrule and the working surface of the at least one grinding wheel, rotating the at least one grinding wheel about the central axis, and moving the at least one grinding wheel relative to the ferrule along a curve perpendicular to the central axis. Processing the ferrule in this manner imparts a convex shape of the end face of the ferrule. An apparatus for carrying out the method is also disclosed.

A polishing apparatus capable of preventing wear of rollers which are to transmit a load to a retainer ring and capable of preventing wear particles from escaping outside is disclosed. The polishing apparatus includes: a retainer ring disposed so as to surround the substrate and configured to press the polishing surface while rotating together with a head body; a rotary ring secured to the retainer ring and configured to rotate together with the retainer ring; a stationary ring disposed on the rotary ring; and a local-load exerting device configured to apply a local load to a part of the retainer ring through the rotary ring and the stationary ring. The rotary ring has rollers which are in contact with the stationary ring.

The invention relates to an assembly for loading parts to be treated into a single-side or double-side treatment machine, comprising—a part holder in the form of a plate for holding at least one part to be treated, comprising a second side and first side, said first side being flat, and said part holder delimiting at least one through-hole forming a cell for housing at least one part to be treated, and a film mounted on the first side of the part holder opposite said through-hole, allowing said part to be treated to be held at least during the loading step.

A machining apparatus machines an end face of a tapered roller with a grinding wheel. The machining apparatus includes a support mechanism configured to support the tapered roller, a wheel unit on which the grinding wheel is mounted, and a base configured to support the wheel unit so that the wheel unit is swivelable about a center line in a vertical direction. A machining point where the grinding wheel is brought into contact with the end face of the tapered roller supported by the support mechanism is located on an extension of the center line serving as a swivel center of the wheel unit.

A cutting apparatus includes: a processing feeding unit that performs processing feeding of a chuck table adapted to hold a workpiece; and two cutting units in which rotational axes of two spindles coincide with each other and cutting blades mounted to the spindles face each other. Each cutting unit includes a flange mechanism in which the cutting blade having a cutting edge fixed to an outer peripheral edge of a one-side outer surface of a circular disk-shaped base is fixed to the spindle. The flange mechanism is fixed to a tip of the spindle, sucks an other-side outer surface of the base of the cutting blade, and fixes the cutting blade to the spindle with the one-side outer surface of the base exposed to the side of the tip of the spindle, and the one-side outer surfaces of the cutting blades fixed to the two cutting units.

Present invention teaches tool rest system having a magnetic base and a height-and-angle adjustable arm with a platform situated at the top portion of the arm, for working on the surface of a welding table with ferromagnetic attribute. An anti-tipping plate provides the anti-tipping power when a large or heavy load is placed upon the platform on the arm that is adjustable by two screws. Additional features of cable hanger and storage box adds to the convenience of use for welding work.