B24B57/00

APPARATUS AND METHOD FOR PROCESSING POLISHING SLURRY
20260021557 · 2026-01-22 ·

Disclosed is an apparatus and method for processing polishing slurry. The apparatus has a filtration unit, a permeation unit, and a control unit. A transfer pipeline connects the filtration and permeation units. The control unit, which consists primarily of electronic circuits, manages both units. The filtration unit is used to remove multiple first particles larger than a first dimension from the slurry and to transfers the filtered slurry to the permeation unit. The permeation unit is used to remove at least a portion of the second particles that are smaller than a second dimension. This process results in a polishing slurry with a more uniform particle size distribution.

POLISHING MATERIAL FILTRATION SYSTEM AND RELATED METHODS

A method is provided. The method includes: flowing chemical mechanical polishing (CMP) slurry into a filter assembly, the filter assembly including a filter element extending along a filter element axis, the flowing being via an inlet defined in a body of the filter assembly and located at a first location adjacent a first end of the filter element, the inlet extending along an inlet axis non-parallel to the filter element axis; and after flowing the CMP slurry into the filter assembly, flowing the CMP slurry out of the filter assembly via a first outlet, the first outlet defined in the body of the filter assembly and located at a second location adjacent a second end of the filter element, the first outlet extending along a first outlet axis non-parallel to the filter element axis.

POLISHING MATERIAL FILTRATION SYSTEM AND RELATED METHODS

A method is provided. The method includes: flowing chemical mechanical polishing (CMP) slurry into a filter assembly, the filter assembly including a filter element extending along a filter element axis, the flowing being via an inlet defined in a body of the filter assembly and located at a first location adjacent a first end of the filter element, the inlet extending along an inlet axis non-parallel to the filter element axis; and after flowing the CMP slurry into the filter assembly, flowing the CMP slurry out of the filter assembly via a first outlet, the first outlet defined in the body of the filter assembly and located at a second location adjacent a second end of the filter element, the first outlet extending along a first outlet axis non-parallel to the filter element axis.

Device for Collecting Machining Suspensions with Material Removal and/or Tool Wear Used During the Machining of Workpiece Parts
20260102876 · 2026-04-16 ·

It is provided a device with a container for collecting machining suspensions, in particular polishing suspension, used during the machining of workpiece parts in a machine tool for machining workpiece parts, and a machine tool with at least one tool spindle for receiving tools and at least one workpiece spindle for receiving and holding a workpiece part to be machined, wherein this collecting device is provided between the workpiece spindle and the tool spindle.

Device for Collecting Machining Suspensions with Material Removal and/or Tool Wear Used During the Machining of Workpiece Parts
20260102876 · 2026-04-16 ·

It is provided a device with a container for collecting machining suspensions, in particular polishing suspension, used during the machining of workpiece parts in a machine tool for machining workpiece parts, and a machine tool with at least one tool spindle for receiving tools and at least one workpiece spindle for receiving and holding a workpiece part to be machined, wherein this collecting device is provided between the workpiece spindle and the tool spindle.