A superhard material abrasive belt for grinding and polishing and a preparation method and use thereof are disclosed. The superhard material abrasive belt includes a lining cloth layer, an electroplating substrate, which is above the lining cloth layer, a grinding unit, which is on the electroplating substrate, a binder layer, which is between the electroplating substrate and the lining cloth layer, and a modified resin layer, which is arranged in the gap between the grinding units on the electroplating substrate.

The disclosure relates to an abrasive article comprising: a fabric substrate comprising strands forming first void spaces between the strands; a laminate joined to the fabric substrate; a cured resin composition joined to the laminate opposite the fabric substrate; abrasive particles joined to the cured resin composition; and a plurality of second void spaces extending through the laminate coinciding with first void spaces in the fabric substrate. The disclosure also relates to methods of making such abrasive articles.

Abrasive particles comprising shaped abrasive particles each having a sidewall, each of the shaped abrasive particles comprising alpha alumina and having a first face and a second face separated by a sidewall and having a maximum thickness, T; and the shaped abrasive particles further comprising a plurality of grooves on the second face.

Abrasive particles comprising shaped abrasive particles each having a sidewall, each of the shaped abrasive particles comprising alpha alumina and having a first face and a second face separated by a sidewall and having a maximum thickness, T; and the shaped abrasive particles further comprising a plurality of grooves on the second face.

A sanding tool includes a backing layer an adhesive layer and an abrasive layer. The adhesive layer is provided at the backing layer for bonding the abrasive layer at the backing layer via flocking techniques.

Abrasive articles are disclosed comprising at least one primary elongate abrasive element extending along an element axis. The primary elongate abrasive element comprises a plurality of formed abrasive particles, wherein at least 50% of the formed abrasive particles are orientationally aligned along the element axis.

Abrasive articles are disclosed comprising at least one primary elongate abrasive element extending along an element axis. The primary elongate abrasive element comprises a plurality of formed abrasive particles, wherein at least 50% of the formed abrasive particles are orientationally aligned along the element axis.

A polishing pad, a polyurethane polishing layer and a preparation method thereof are provided, belonging to the technical field of polishing in chemical-mechanical planarization treatment. The polyurethane polishing layer having a coefficient of thermal expansion of 100-200 ppm/° C. comprises a reaction product produced by reacting of multiple components. The multiple components include an isocyanate-terminated prepolymer, a hollow microsphere polymer and a curing agent composition. The curing agent composition includes 5-55 wt % of an aliphatic diamine composition, 0-8 wt % of a polyamine composition and 40-90 wt % of an aromatic bifunctional composition. The polyurethane polishing layer has a density of 0.6-1.1 g/cm.sup.3, a Shore hardness of 45-70D and an elongation at break of 50-450%. The polyurethane polishing layer is prepared by a simple process with low cost and energy consumption. The polyurethane polishing layer prepared by the process has a high hydrolytic stability, a uniform density and a stable removal rate.

A method and systems for controlling optical transmissivity of a polish pad material are provided. The method and systems may include adjusting control parameters to determine the optical transmissivity of a polish pad material. The control parameters may also include pre-processing controls, casting controls, and/or curing controls. Methods and systems also provided for assembling a polish pad that controls the optical transmissivity of the polish pad. Additionally, a polish pad with a controlled optical transmissivity is provided.

There are provided a polishing pad and a polishing method using the same that are useful for removing the surface waviness of a curved resin-painted surface at a high polishing removal rate. A polishing pad (10) according to one aspect of the present invention includes a layer having a polishing surface (30). The layer having the polishing surface (30) has a sparse and dense structure in which a proportion of a sparse portion of the polishing surface (30) is 52% or more and 96% or less, and is composed of a sheet material having an A hardness of 70 or more measured according to JIS K 6253.