B24D11/00

Abrasive buffing articles

The present disclosure relates to abrasive buffing articles (“abrasive buffs”) and methods of making the same. The abrasive buffs include a substrate, such as a fabric, that has been impregnated with an abrasive polymeric composition that includes abrasive particles, such as primary abrasive particles and/or abrasive aggregates, such as spray dried abrasive aggregates. The abrasive buffs are flexible and capable of conforming to and effectively abrading, polishing, and buffing workpieces possessing a complex geometry.

Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same

Embodiments relate to a polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors, a process for preparing the same, and a process for preparing a semiconductor device using the same. In the polishing pad according to the embodiment, the size (or diameter) and distribution of a plurality of pores are adjusted, whereby the polishing performance such as polishing rate and within-wafer non-uniformity can be further enhanced.

Polishing pad, process for preparing the same, and process for preparing a semiconductor device using the same

Embodiments relate to a polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors, a process for preparing the same, and a process for preparing a semiconductor device using the same. In the polishing pad according to the embodiment, the size (or diameter) and distribution of a plurality of pores are adjusted, whereby the polishing performance such as polishing rate and within-wafer non-uniformity can be further enhanced.

METHOD FOR DEPOSITING ABRASIVE PARTICLES

The disclosure relates to, among other things, a method of making a coated abrasive article, the method comprising sequentially: locating a plurality of shaped abrasive particles in a tool comprising a plurality of cavities, wherein the plurality of shaped abrasive particles is held in the plurality of cavities, at least in part, electrostatically; and disposing the plurality of shaped abrasive particles onto a make layer precursor of a backing having first and second opposed major surfaces, wherein the make layer precursor is disposed on at least a portion of the first major surface.

CAMOUFLAGE FOR ABRASIVE ARTICLES

Abrasive articles and associated methods are shown that include one or more camouflaging layers that can be applied to a portion of the abrasive article. The one or more camouflaging layers can be applied over the size coat layer as a discontinuous colored layer covering a portion of the size coat layer. In an example, the camouflaging layer can be applied as a repeating pattern of one or more colors on the abrasive article. In an example, the camouflaging layer can be applied randomly to the abrasive article. The discontinuous layer can have a color markedly different than a color of the size coat layer and can be used to mask or minimize an appearance of particle imperfections or voids on the abrasive article. The discontinuous layer can be applicable to coated and non-woven abrasive articles in the form of sheets, discs, belts, pads, or rolls.

CAMOUFLAGE FOR ABRASIVE ARTICLES

Abrasive articles and associated methods are shown that include one or more camouflaging layers that can be applied to a portion of the abrasive article. The one or more camouflaging layers can be applied over the size coat layer as a discontinuous colored layer covering a portion of the size coat layer. In an example, the camouflaging layer can be applied as a repeating pattern of one or more colors on the abrasive article. In an example, the camouflaging layer can be applied randomly to the abrasive article. The discontinuous layer can have a color markedly different than a color of the size coat layer and can be used to mask or minimize an appearance of particle imperfections or voids on the abrasive article. The discontinuous layer can be applicable to coated and non-woven abrasive articles in the form of sheets, discs, belts, pads, or rolls.

ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLES
20210332278 · 2021-10-28 ·

A fixed abrasive article including a blend of abrasive particles having a first type of shaped abrasive particle comprising a first height (h1), a second type of shaped abrasive particle comprising a second height (h2) less than the first height, where the blend of abrasive particles includes a first content of the first type of shaped abrasive particles and a second content of the second type of shaped abrasive particle, and the first content is different as compared to the second content.

ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLES
20210332278 · 2021-10-28 ·

A fixed abrasive article including a blend of abrasive particles having a first type of shaped abrasive particle comprising a first height (h1), a second type of shaped abrasive particle comprising a second height (h2) less than the first height, where the blend of abrasive particles includes a first content of the first type of shaped abrasive particles and a second content of the second type of shaped abrasive particle, and the first content is different as compared to the second content.

Flocking Sanding Tool and Manufacturing Method Thereof
20210323121 · 2021-10-21 ·

A sanding tool includes a backing layer an adhesive layer and an abrasive layer. The adhesive layer is provided at the backing layer for bonding the abrasive layer at the backing layer via flocking techniques.

LEVERAGED POROMERIC POLISHING PAD

The invention provides a porous polyurethane polishing pad that includes a porous matrix. The matrix has large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with tertiary pores, a portion of the large pores is open to a top polishing surface and at least a portion of the large pores extend to the top polishing surface. Spring-arm sections connect lower and upper sections of the large pores. The spring-arm sections all are in a same horizontal direction as measured from the vertical orientation and they combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.