Patent classifications
B24D11/00
Abrasive article including a coating
An abrasive article can include a substrate, abrasive particles coupled by a bond material to the substrate, and a coating overlying at least partially the exterior surface of the bond material. The coating can be a poly(p-xylylene) polymer applied via vapor deposition and may provide enhanced strength to the bond material and extended life time to the abrasive article.
METHODS AND PRECURSOR FORMULATIONS FOR FORMING ADVANCED POLISHING PADS BY USE OF AN ADDITIVE MANUFACTURING PROCESS
Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments of the disclosure further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.
POLISHING PAD EMPLOYING POLYAMINE AND CYCLOHEXANEDIMETHANOL CURATIVES
A chemical-mechanical polishing pad comprising a thermosetting polyurethane polishing layer includes an isocyanate-terminated urethane prepolymer, a polyamine curative, and a cyclohexanedimethanol curative. The polyamine curative and the cyclohexanedimethanol curative are in a molar ratio of polyamine curative to cyclohexanedimethanol curative in a range from about 20:1 to about 1:1.
Jewelry tool
Tooling strips and tools for using tooling strips.
Jewelry tool
Tooling strips and tools for using tooling strips.
CHARGE-MODIFIED PARTICLES AND METHODS OF MAKING THE SAME
A charge-modified particle comprising the inorganic core and a shell surrounding the inorganic core, wherein the shell comprises a copolymer comprising monomeric units corresponding to free-radically polymerizable monomers, and wherein at least one of the monomeric units comprises a substituted benzotriazolylphenolate salt. Methods of making the charge-modified particle by admicellar polymerization are also disclosed.
Concentric Abrasive Disc Punch
According to some embodiments, an abrasive disc punch comprises: a bottom plate; a top plate parallel to the bottom plate and coupled to the bottom plate via guide pins; springs coupled between the bottom plate and the top plate; a punch coupled to the top plate; and a cutting block coupled to the bottom plate. The cutting block comprises a cutting edge that is aligned coaxially with the punch. The abrasive disc punch further comprises a trim cushion coupled to the cutting block via a spring. The trim cushion is positioned within the cutting edge of the cutting block and comprises a flat horizontal top portion. In an open position the two or more springs separate the top plate and punch from the bottom plate and the cutting block, and the flat horizontal top portion of the trim cushion is positioned above the cutting edge of the cutting block.
Correction of fabricated shapes in additive manufacturing using sacrificial material
A method of fabricating a polishing pad using an additive manufacturing system includes depositing a first set of successive layers onto a support by droplet ejection. Depositing the first set of successive layers includes dispensing a polishing pad precursor to first regions corresponding to partitions of the polishing pad and dispensing a sacrificial material to second regions corresponding to grooves of the polishing pad. A second set of successive layers is deposited by droplet ejection over the first set of successive layers. The second set of successive layers corresponds to a lower portion of the polishing pad. The first set of successive layer and the second set of successive layers provide a body. The body is removed from the support. Removing the sacrificial material from the body provides the polishing pad with a polishing surface that has the partitions separated by the grooves.
Advanced polishing pad materials and formulations
Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.
Polishing pads produced by an additive manufacturing process
- Rajeev BAJAJ ,
- Daniel Redfield ,
- Mahendra C. ORILALL ,
- Boyi FU ,
- Aniruddh Khanna ,
- Jason G. FUNG ,
- Mario Cornejo ,
- Ashwin CHOCKALINGAM ,
- Mayu YAMAMURA ,
- Veera Raghava Reddy KAKIREDDY ,
- Ashavani Kumar ,
- Venkat Hariharan ,
- Gregory E. Menk ,
- Fred C. REDEKER ,
- Nag B. Patibandla ,
- Hou T. Ng ,
- Robert E. Davenport ,
- Amritanshu SINHA
Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.