B24D18/00

Method of manufacturing an impregnated structure for abrading
09731404 · 2017-08-15 · ·

A layer of matrix powder is deposited within a mold opening. A layer of super-abrasive particles is then deposited over the matrix powder layer. The super-abrasive particles have a non-random distribution, such as being positioned at locations set by a regular and repeating distribution pattern. A layer of matrix powder is then deposited over the super-abrasive particles. The particle and matrix powder layer deposition process steps are repeated to produce a cell having alternating layers of matrix powder and non-randomly distributed super-abrasive particles. The cell is then fused, for example using an infiltration, hot isostatic pressing or sintering process, to produce an impregnated structure. A working surface of the impregnated structure that is oriented non-parallel (and, in particular, perpendicular) to the super-abrasive particle layers is used as an abrading surface for a tool.

Polyurethane polishing pad

The polishing pad is for planarizing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a cast polyurethane polymeric material formed from a prepolymer reaction of H.sub.12MDI/TDI with polytetramethylene ether glycol to form an isocyanate-terminated reaction product. The isocyanate-terminated reaction product has 8.95 to 9.25 weight percent unreacted NCO and has an NH.sub.2 to NCO stoichiometric ratio of 102 to 109 percent. The isocyanate-terminated reaction product is cured with a 4,4′-methylenebis(2-chlororaniline) curative agent. The cast polyurethane polymeric material, as measured in a non-porous state, having a shear storage modulus, G′ of 250 to 350 MPa as measured with a torsion fixture at 30° C. and 40° C. and a shear loss modulus, G″ of 25 to 30 MPa as measured with a torsion fixture at 40° C. The polishing pad having a porosity of 20 to 50 percent by volume and a density of 0.60 to 0.95 g/cm.sup.3.

Polycrystalline diamond compacts including a cemented carbide substrate and applications therefor
09732563 · 2017-08-15 · ·

Embodiments relate to a polycrystalline diamond compact (“PDC”) including a polycrystalline diamond (“PCD”) table bonded to a cemented carbide substrate including tungsten carbide grains having a fine average grain size to provide one or more of enhanced wear resistance, corrosion resistance, or erosion resistance, and a PDC with enhanced impact resistance. In an embodiment, a PDC includes a cemented carbide substrate having a cobalt-containing cementing constituent cementing tungsten carbide grains together exhibiting an average grain size of about 1.5 μm or less. The substrate includes an interfacial surface and a depletion zone depleted of the cementing constituent that extends inwardly from the interfacial surface to a depth of, for example, about 30 μm to about 60 μm. The PDC includes a PCD table bonded to the interfacial surface of the substrate. The PCD table includes diamond grains bonded together exhibiting an average grain size of about 40 μm or less.

METHOD OF MAKING AN ABRASIVE ARTICLE AND ABRASIVE ARTICLE
20170225300 · 2017-08-10 ·

A method of making an abrasive article comprises urging a malleable thermosetting melt-flowable composition through openings extending through a porous abrasive member to form an abrasive article precursor; which is heated to form the abrasive article. Multiple abrasive articles may be stacked prior to heating. Methods can be used to fabricate abrasive articles such as grinding wheels and cut-off wheels.

ABRASIVE PREFORMS, METHOD OF MAKING AN ABRASIVE ARTICLE, AND BONDED ABRASIVE ARTICLE

Abrasive preforms include a frame having first and second opposed parallel major surfaces. The first major surface has a plurality of first cavities formed therein. The second major surface optionally has a plurality of second cavities formed therein. The frame comprises a binder precursor material. Abrasive particles are disposed in at least a portion of the plurality of first cavities and optional plurality of second cavities. Methods of making abrasive articles using the abrasive preforms and bonded abrasive articles preparable thereby are also disclosed.

Cerium oxide based composite polishing powder and preparation method thereof

The present invention provides a cerium oxide based composite polishing powder and a preparation method thereof. The polishing powder contains the element magnesium in an amount of 0.005 wt %-5 wt % to magnesium oxide meter. The preparation method includes: (1) uniformly mixing a salt solution containing cerium serving as the main component of the polishing powder; (2) uniformly mixing a precipitating agent of an aqueous magnesium bicarbonate solution with the mixed solution prepared in step (1) to obtain a slurry; (3) aging the slurry prepared in step (2) for 0-48 h while the temperature of the slurry is kept at 30-90 degrees centigrade, and filtering the aged slurry to obtain the precursor powder of the polishing powder; (4) calcinating the precursor powder at 600-1000 degrees centigrade, then dispersing and separating the calcinated precursor powder to obtain the polishing powder. The present invention improves the polishing performance and the suspension performance of polishing powder.

Methods of forming cutting elements by oxidizing metal in interstitial spaces in polycrystalline material
09724804 · 2017-08-08 · ·

Methods of forming a cutting element include disposing a volume of polycrystalline material adjacent a liquid electrolytic solution and applying an electrical between the polycrystalline material and a cathode in contact with the liquid electrolytic solution to increase an oxidation state of the metal catalyst material. The polycrystalline material includes interbonded grains of hard material and metal catalyst particles in the interstitial spaces between adjacent grains of hard material. Some methods include forming a barrier over a portion of a surface of a volume of polycrystalline material.

INTEGRATED SYSTEM FOR AUTOMATIC FORMING, PICKING, AND INSPECTION OF GRINDING WHEEL MESH PIECE AND METHOD THEREFOR

An integrated system for automatic forming, picking, and inspection of a grinding wheel mesh piece and a method thereof, including a visual inspection system (1), a conveying system (2), a cutting system (3), and a picking system (4); the conveying system (2) is used to precisely control a conveying action of a cutting section conveying platform (51) and a picking section conveying platform (52), and the visual inspection system (1) is used to acquire an image of a grinding wheel mesh cloth, establish virtual origin coordinates of a cutting layout and center coordinates of the grinding wheel mesh piece after cutting, recognize defects of the grinding wheel mesh cloth, and calibrate qualified center coordinates and unqualified center coordinates; the cutting system (3) is used to cut the grinding wheel mesh cloth moved to the cutting section conveying platform (51) to obtain a circular grinding wheel mesh piece.

Elongate shaped abrasive particles, methods of making the same, and abrasive article including the same

An elongate shaped abrasive particle comprises an elongate shaped ceramic body having opposed first and second ends joined to each other by at least two longitudinal sidewalls. At least one of the at least two longitudinal sidewalls is concave along its length. At least one of the first and second ends is a fractured surface. Methods of making elongate shaped abrasive particles and abrasive articles including them are also disclosed.

ABRASIVE ARTICLES HAVING INTERNAL COOLANT FEATURES AND METHODS OF MANUFACTURING THE SAME
20220266421 · 2022-08-25 ·

A bonded abrasive article is disclosed. The bonded abrasive article has abrasive particles retained within a binder in an active grinding layer. The bonded abrasive article also has an internal reservoir configured to receive a fluid. The bonded abrasive article also has a feature configured to change a property of the fluid. The bonded abrasive article also has a delivery feature configured to deliver to fluid to a contact zone.