An abrasive article can include a body including a first portion coupled to a second portion in a radial plane. The body can include a central opening extending in an axial direction of the body through the first portion and through the second portion. The central opening can include a circumferential surface defining an inner diameter of the body. The circumferential surface can be defined by at least a portion of the first portion and at least a portion of the second portion. The first portion can include first abrasive particles contained within a first bond material, including an inorganic material, and the second portion can include second abrasive particles contained within a second bond material, including an organic material. The organic material can include epoxy. In an embodiment, the second portion comprises an elongation-at-fracture of less than 2.7%, a Stiffness Value of at least 8.3, or a combination thereof.

Embodiments of the invention relate generally to overmolded protective leaching masks, and methods of manufacturing and using the same for leaching superabrasive elements such as polycrystalline diamond elements. In an embodiment, a protective leaching mask assembly includes a superabrasive element including a central axis and a superabrasive table, and a protective mask overmolded onto at least a portion of the superabrasive element. The protective mask includes a base portion and at least one sidewall extending from the base portion and defining an opening generally opposite the base portion. The at least one sidewall includes an inner surface configured to abut with a selected portion of the superabrasive element being chemically resistant to a leaching agent and an outer surface sloping at an oblique angle relative to the central axis.

A polishing pad is provided. The polishing pad comprises a polishing layer and a metal-containing layer. The polishing layer has a polishing surface and a backside surface opposite to each other, wherein the backside surface has a plurality of cavities. The metal-containing layer is disposed on the backside surface of the polishing layer and fills into the cavities, wherein a first contact area is between the metal-containing layer and the backside surface of the polishing layer, and the first contact area is larger than the orthogonal projection area of the polishing layer.

A superhard polycrystalline construction comprises a body of polycrystalline superhard material comprising a superhard phase, and a non-superhard phase dispersed in the superhard phase, the superhard phase comprising a plurality of inter-bonded superhard grains. The non-superhard phase comprises particles or grains that do not chemically react with the superhard grains and form less than around 10 volume % of the body of polycrystalline superhard material. There is also disclosed a method of forming such a superhard polycrystalline construction.

A method for fabricating a polishing pad including a plurality of polishing structures includes providing a mold having a top surface and a bottom surface, the mold including a plurality of recesses that correspond to polishing structures formed on the top surface thereof; dispensing a polymer mix on the mold and allowing the polymer mix to fill the plurality of recesses to be formed as the polishing structures; laminating a base film on the top surface of the mold; curing the polymer mix to allow the polymer mix to adhere to the base film and to form the polishing structures on the base film; and demolding the base film and the polishing structures from the mold to obtain a polishing pad sheet. Subsequently, the polishing pad sheet is cut into a plurality of polishing pads.

In methods and systems of making an abrasive article, abrasive particles are loaded to a distribution tool including a plurality of upper walls defining a plurality of spacing slots, and a plurality of lower walls defining a plurality of distribution slots. The spacing slots are open to the distribution slots, which are open to a lower side of the tool. The loaded particles are spaced and distributed from the distribution tool to a major face of a backing web below the lower side and moving relative to the tool in a machine direction. The upper walls space the particles in the machine direction. The particles distributed by the lower walls undergo an orientation sequence in which each particle is oriented into a column aligned along the machine direction. The upper walls can be disposed oblique to the lower walls. The upper and lower walls can have pointed upper portions.

The present disclosure provides a polymer bond abrasive article formed of a continuous photocured polymer matrix having abrasive particles retained therein. The photocured polymer matrix includes at least one of an optical brightener or a light absorber, and the polymer bond abrasive article has a three-dimensional shape. An abrasive tool is also provided, including the abrasive article affixed to a shaft or a pad. Further, a method of making the polymer bond abrasive article is provided, including a) obtaining a photocurable composition liquid dispersion; b) selectively curing a portion of the photocurable composition; and repeating steps a) and b) to form the polymer bond abrasive article. The dispersion contains at least one photocurable component; abrasive particles; a photoinitiator; and at least one of an optical brightener or a light absorber.

The present disclosure provides a polymer bond abrasive article formed of a continuous photocured polymer matrix having abrasive particles retained therein. The photocured polymer matrix includes at least one of an optical brightener or a light absorber, and the polymer bond abrasive article has a three-dimensional shape. An abrasive tool is also provided, including the abrasive article affixed to a shaft or a pad. Further, a method of making the polymer bond abrasive article is provided, including a) obtaining a photocurable composition liquid dispersion; b) selectively curing a portion of the photocurable composition; and repeating steps a) and b) to form the polymer bond abrasive article. The dispersion contains at least one photocurable component; abrasive particles; a photoinitiator; and at least one of an optical brightener or a light absorber.

Embodiments relate to polycrystalline diamond compacts (“PDCs”) including a polycrystalline diamond (“PCD”) table in which a metal-solvent catalyst is alloyed with at least one alloying element to improve thermal stability of the PCD table. In an embodiment, a PDC includes a substrate and a PCD table bonded to the substrate. The PCD table includes diamond grains defining interstitial regions. The PCD table includes an alloy comprising at least one Group VIII metal and at least one metallic alloying element that lowers a temperature at which melting of the at least one Group VIII metal begins. The alloy includes one or more solid solution phases comprising the at least one Group VIII metal and the at least one metallic alloying element and one or more intermediate compounds comprising the at least one Group VIII metal and the at least one metallic alloying element.

The present invention provides methods of manufacturing a chemical mechanical polishing (CMP polishing) layer for polishing substrates, such as semiconductor wafers comprising providing a composition of a plurality of liquid-filled microelements having a polymeric shell; classifying the composition via centrifugal air classification to remove fines and coarse particles and to produce liquid-filled microelements having a density of 800 to 1500 g/liter; and, forming the CMP polishing layer by (i) converting the classified liquid-filled microelements into gas-filled microelements by heating them, then mixing them with a liquid polymer matrix forming material and casting or molding the resulting mixture to form a polymeric pad matrix, or (ii) combining the classified liquid-filled microelements directly with the liquid polymer matrix forming material, and casting or molding.