Arrays of integrated analytical devices and their methods for production are provided. The arrays are useful in the analysis of highly multiplexed optical reactions in large numbers at high densities, including biochemical reactions, such as nucleic acid sequencing reactions. The integrated devices allow the highly sensitive discrimination of optical signals using features such as spectra, amplitude, and time resolution, or combinations thereof. The arrays and methods of the invention make use of silicon chip fabrication and manufacturing techniques developed for the electronics industry and highly suited for miniaturization and high throughput.

A holographic storage layer includes a reflective structure and photosensitive units. The reflective structure is a grid-shaped structure and includes cavities. The photosensitive units are disposed in the cavities, in which each of the photosensitive units is surrounded by the reflective structure. First openings and second openings are defined by the reflective structure, and the photosensitive units are exposed by the first openings and the second openings respectively.

Method for manufacturing an optical information recording medium includes: preparing a substrate material where a first guide groove has been formed on a first side of the substrate material; forming a second guide groove by applying an energy-curable resin material between a second side of the substrate material opposite to the first side and a stamper and subsequently curing the energy-curable resin material to form a substrate; providing at least one recording layer and a cover layer on a first side of the substrate where the first guide groove has been formed, while holding the substrate with the stamper left unremoved from the substrate to protect the second guide groove; and exposing the second guide groove by removing the stamper and providing at least one recording layer and a cover layer on a second side of the substrate where the second guide groove has been formed.

A holographic storage layer includes a reflective structure and photosensitive units. The reflective structure is a grid-shaped structure and includes cavities. The photosensitive units are disposed in the cavities, in which each of the photosensitive units is surrounded by the reflective structure. First openings and second openings are defined by the reflective structure, and the photosensitive units are exposed by the first openings and the second openings respectively.

Arrays of integrated analytical devices and their methods for production are provided. The arrays are useful in the analysis of highly multiplexed optical reactions in large numbers at high densities, including biochemical reactions, such as nucleic acid sequencing reactions. The integrated devices allow the highly sensitive discrimination of optical signals using features such as spectra, amplitude, and time resolution, or combinations thereof. The arrays and methods of the invention make use of silicon chip fabrication and manufacturing techniques developed for the electronics industry and highly suited for miniaturization and high throughput.

Arrays of integrated analytical devices and their methods for production are provided. The arrays are useful in the analysis of highly multiplexed optical reactions in large numbers at high densities, including biochemical reactions, such as nucleic acid sequencing reactions. The integrated devices allow the highly sensitive discrimination of optical signals using features such as spectra, amplitude, and time resolution, or combinations thereof. The arrays and methods of the invention make use of silicon chip fabrication and manufacturing techniques developed for the electronics industry and highly suited for miniaturization and high throughput.

Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

Arrays of integrated analytical devices and their methods for production are provided. The arrays are useful in the analysis of highly multiplexed optical reactions in large numbers at high densities, including biochemical reactions, such as nucleic acid sequencing reactions. The integrated devices allow the highly sensitive discrimination of optical signals using features such as spectra, amplitude, and time resolution, or combinations thereof. The arrays and methods of the invention make use of silicon chip fabrication and manufacturing techniques developed for the electronics industry and highly suited for miniaturization and high throughput.

A holographic storage layer includes a reflective structure and photosensitive units. The reflective structure is a grid-shaped structure and includes cavities. The photosensitive units are disposed in the cavities, in which each of the photosensitive units is surrounded by the reflective structure. First openings and second openings are defined by the reflective structure, and the photosensitive units are exposed by the first openings and the second openings respectively.