Solution casting a nanostructure. Preparing a template by ablating nanoholes in a substrate using single-femtosecond laser machining. Replicating the nanoholes by applying a solution of a polymer and a solvent into the template. After the solvent has substantially dissipated, removing the replica from the substrate.

The present invention relates to a new method of synthesizing two-dimensional polyaniline (PANI) nanosheets using ice as a removable hard template. The method comprises polymerizing aniline on an ice surface. The synthesized PANI nanosheets show distinctly high current flows of 5.5 mA at 1 V and a high electrical conductivity of 35 S/cm, which mark a significant improvement over previous values on other PANIs reported over the past decades. These improved electrical properties of the PANI nanosheets are attributed to the long-range ordered edge-on -stacking of the quinoid ring, ascribed to the ice surface-assisted vertical growth of PANI. The PANI nanosheet can be easily transferred onto various types of substrates via float-off from the ice surfaces. In addition, PANI can be patterned into any shape using predetermined masks, and this is expected to facilitate the eventual convenient and inexpensive application of conducting polymers in versatile electronic device forms.

A mold having a first part with a carcass with a molding zone added thereto to provide a mechanical interface between the molding zone and the carcass. Inductors of the mold extend along a longitudinal direction in cavities between the mechanical interface and the molding zone. A cooling device of the mold extends at the mechanical interface between the molding zone and the carcass.

Provided are a photocurable composition having high filling property and capable of reducing a mold release force upon production of a film through the utilization of a photo-imprint method, and a method of manufacturing a film using the photocurable composition. The photocurable composition is a photocurable composition, including at least the following component (A) to component (C): (A) a polymerizable compound; (B) a photopolymerization initiator; and (C) a surfactant represented by the following general formula (1):
Rf.sub.1-Rc-X.(1)

The present invention general related to a method and a reusable mold for making a contact lens, comprising a first mold half having a first mold surface in contact with a silicone containing lens forming composition and a second mold half having a second mold surface in contact with the lens forming composition. The first mold half and the second mold half are configured to receive each other such that a cavity is formed between the first mold surface and the second mold surface. The cavity defines the shape of a contact lens to be molded. The lens forming composition is polymerizable and/or crosslinkable by actinic radiation. The reusable mold has at least one of the mold halves is made from chalcogenide glasses, Zinc Selenide or Zinc Sulfide.

A method of manufacturing a component (124) having a main body (116) and at least one ring sleeve (118) through a molding assembly (100), the method comprising: providing a mold (102) having an inlet (115) and defining a hollow portion (H); placing at least one core to form a free-space (104, 106) within the component (124) inside the mold (102) to bifurcate the hollow portion (H) into a first cavity and a second cavity; pouring a molding material (117) inside the mold (102) through the inlet (115); allowing the molding material (117) to set inside the mold (102) around the core within the first cavity and the second cavity to form a main body (116) and at least one ring sleeve (118) of the component (124); connecting the first cavity and the second cavity and forming at least one first bond and one second bond (130, 132, 134, 136) between the main body (116) and the at least one ring sleeve (118); and removing the at least one core from at least part of the hollow portion (H) within the mold (102); characterized in that: providing the core with at least one recess allowing the molding material (117) to flow therethrough such that on withdrawing the core out of the mold (102), at least one first bond (130, 132) breaks and on withdrawing the core outside the mold (102), at least one second bond (134, 136) breaks.

Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

A method of manufacturing a component (124) having a main body (116) and at least one ring sleeve (118) through a molding assembly (100), the method comprising: providing a mold (102) having an inlet (115) and defining a hollow portion (H); placing at least one core to form a free-space (104, 106) within the component (124) inside the mold (102) to bifurcate the hollow portion (H) into a first cavity and a second cavity; pouring a molding material (117) inside the mold (102) through the inlet (115); allowing the molding material (117) to set inside the mold (102) around the core within the first cavity and the second cavity to form a main body (116) and at least one ring sleeve (118) of the component (124); connecting the first cavity and the second cavity and forming at least one first bond and one second bond (130, 132, 134, 136) between the main body (116) and the at least one ring sleeve (118); and removing the at least one core from at least part of the hollow portion (H) within the mold (102); characterized in that: providing the core with at least one recess allowing the molding material (117) to flow therethrough such that on withdrawing the core out of the mold (102), at least one first bond (130, 132) breaks and on withdrawing the core outside the mold (102), at least one second bond (134, 136) breaks.

Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

A photocurable composition of the present invention to be used for manufacturing a film with high productivity is a photocurable composition to be used for manufacturing a film having a predetermined pattern shape by curing the photocurable composition with light under a state where the photocurable composition is brought into contact with a mold having concavo-convex on a surface thereof, the photocurable composition including: a polymerizable compound; a photopolymerization initiator; a photosensitive gas generating agent for generating a gas through light stimulation; and a gas generation promotor for increasing an aggregation rate of the gas generated from the photosensitive gas generating agent at an interface between the mold and the photocurable composition, in which the gas generation promotor includes a fluorine atom-containing surfactant that is free of a polymerizable substituent.