The present invention relates to the field of carrier and delivery systems for active molecular compounds. In particular, the present invention provides aqueous dispersions for delivery of active molecular compounds.

Compositions comprising synergistic blends of organic acids and hydrazones and methods of reducing bacterial and fungal contamination using the blends are disclosed.

Compositions comprising synergistic blends of organic acids and hydrazones and methods of reducing bacterial and fungal contamination using the blends are disclosed.

N-Acyl sarcosines of Formula I, wherein, R═C.sub.7 alkyl and C.sub.10 alkenyl group with terminal double bond, are described as new antimicrobial preservatives for home and personal care products. ##STR00001## Lipidated sarcosines of this patent application preserve creams, lotions, emulsions, solutions or suspensions types of formulations of personal care industry. These are used in: leave-on ̆ (cold cream, sunscreen) as well as: rinse-off ̆ (facewash, body wash, shampoo) formulations either alone or in combination with other antimicrobials.

N-Acyl sarcosines of Formula I, wherein, R═C.sub.7 alkyl and C.sub.10 alkenyl group with terminal double bond, are described as new antimicrobial preservatives for home and personal care products. ##STR00001## Lipidated sarcosines of this patent application preserve creams, lotions, emulsions, solutions or suspensions types of formulations of personal care industry. These are used in: leave-on ̆ (cold cream, sunscreen) as well as: rinse-off ̆ (facewash, body wash, shampoo) formulations either alone or in combination with other antimicrobials.

A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer, the CMP slurry composition including a solvent, the solvent being a polar solvent or a non-polar solvent; an abrasive agent; and a biocide, wherein the abrasive agent includes silica modified with a silane containing two nitrogen atoms or silica modified with a silane containing three nitrogen atoms, the biocide includes a compound of Formula 3:

##STR00001##

A CMP slurry composition for polishing a tungsten pattern wafer and a method of polishing a tungsten pattern wafer, the CMP slurry composition including a solvent, the solvent being a polar solvent or a non-polar solvent; an abrasive agent; and a biocide, wherein the abrasive agent includes silica modified with a silane containing two nitrogen atoms or silica modified with a silane containing three nitrogen atoms, the biocide includes a compound of Formula 3:

##STR00001##

A method for providing a bio-active layer on a surface, includes the steps of: a) ionizing a plasma gas at low temperature of 150° C. or lower, and at about atmospheric pressure, thereby creating a plasma; b) introducing a precursor into the plasma; c) exposing the surface to the plasma comprising the precursor, thereby forming a coating onto the surface. The plasma gas is ionized by means of electrodes, wherein the plasma gas is ionized by the electrodes with a power of at most 10 Watt per cm.sup.2 of the electrode surface. The bio-active layer is an antibiofouling layer, an antibacterial layer, an antiviral layer and/or a microbial collecting layer, such that the plasma gas includes inert gas for at least 99% by volume. The inert gas is a non-noble gas.

A method for providing a bio-active layer on a surface, includes the steps of: a) ionizing a plasma gas at low temperature of 150° C. or lower, and at about atmospheric pressure, thereby creating a plasma; b) introducing a precursor into the plasma; c) exposing the surface to the plasma comprising the precursor, thereby forming a coating onto the surface. The plasma gas is ionized by means of electrodes, wherein the plasma gas is ionized by the electrodes with a power of at most 10 Watt per cm.sup.2 of the electrode surface. The bio-active layer is an antibiofouling layer, an antibacterial layer, an antiviral layer and/or a microbial collecting layer, such that the plasma gas includes inert gas for at least 99% by volume. The inert gas is a non-noble gas.

The present invention relates to the field of carrier and delivery systems for active molecular compounds. In particular, the present invention provides aqueous dispersions for delivery of active molecular compounds.