The present technology relates to a semiconductor device and a method of manufacturing the semiconductor device. The semiconductor device includes a stack structure including a plurality of interlayer insulating layers and a plurality of gate conductive layers that are alternately stacked, a channel plug at least partially passing through the stack structure on a cell region, and a plurality of support structures at least partially passing through the stack structure on a contact region.

Semiconductor (SC) chip devices and associated methods of making are presented. The SC chips are designed to include enlarged extension semiconductor areas next to functional integrated circuit (IC) dies on these SC chips. Some variations include designing semiconductor wafers prior to fabrication so that the resultant IC dies are surrounded by the extension semiconductor areas. Other variations include processing post manufactured semiconductor wafers to expand the size of the available extension areas by including truncated pieces of IC dies that are immediately adjacent to functional working primary IC dies. These variations provide additional room for redistribution layers to fan-out from the IC dies outwards onto the extension areas.

Embodiments of the present disclosure provide a method for forming TSV structures. In some embodiments, buffering structures are formed adjacent dummy devices in the TSV region. By introducing buffering structures adjacent the end gate structures of the dummy device in the TSV region, residual metallic material may be eliminated, thereby, avoiding arcing in fabrication of TSV structures.

A vertical solid state device comprising: a connection pad; and side walls comprising a metal-insulator-semiconductor (MIS) structure; wherein a gate of the MIS structure is shorted to at least one contact of the vertical solid state device and a threshold voltage (VT) of the MIS structure is adjusted to increase the efficiency of the device.

A semiconductor module includes: a substrate; and a semiconductor device that is located on one side of the substrate in a first direction and is conductively bonded to the substrate, wherein the semiconductor device includes: a first terminal, a second terminal, and a third terminal; a semiconductor element that is located on one side of the first terminal, the second terminal, and the third terminal in the first direction; and a sealing resin that covers the semiconductor element, wherein the semiconductor element includes a first circuit and a second circuit that are connected in series with each other, wherein the first circuit is electrically connected to the first terminal and the third terminal, wherein the second circuit is electrically connected to the second terminal and the third terminal, wherein the sealing resin has a bottom surface facing the substrate.

A semiconductor structure includes a circuit region, a seal ring region and at least one alignment mark. The seal ring region surrounds the circuit region and includes a seal ring corner region. The seal ring is disposed in the seal ring region, and includes a corner seal ring portion in the seal ring corner region. The corner seal ring portion divides the seal ring corner region into a plurality of sub-regions, and the at least one alignment mark is disposed in at least one of the sub-regions of the seal ring corner region.

A semiconductor structure may be provided by forming a first molding compound around a first semiconductor die such that a top surface of the first molding compound is coplanar with a top dielectric surface of the first semiconductor die; forming a combination of at least one bonding-level dielectric layer, first bonding pads, and dummy pads over the first semiconductor die and the first molding compound, wherein each of the bonding pads is formed directly on a respective conductive structure within the first semiconductor die; and attaching a second semiconductor die including second bonding pads therein to the first semiconductor die by performing a bonding process that bonds the second bonding pads to the first bonding pads by metal-to-metal bonding such that a first subset of the dummy pads has an areal overlap in a plan view with the second semiconductor die.

A method of manufacturing a semiconductor device with an attached battery is provided. The method includes affixing a semiconductor die to a die pad region of a first battery lead of a leadframe. The first battery lead of the leadframe is separated from a second battery lead of the leadframe. An encapsulant encapsulates the semiconductor die and portions of the first and second battery leads of the leadframe. The battery is affixed to an exposed portion of the first battery lead of the leadframe such that a first terminal of the battery is conductively connected to the first battery lead. An exposed portion of the second battery lead of the leadframe is bent to overlap a top surface portion of the battery such that a second terminal of the battery conductively connected to the second battery lead.

A semiconductor package according to some example embodiments may include a chip base including a main chip region and an edge region around the main chip region, a device layer on the chip base, a wiring layer on the device layer, an upper insulating stack on the wiring layer, and a trench on the edge region, the trench recessed from the upper insulating stack to the device layer, and an inner surface of the trench exposed to an outside of the semiconductor chip.

A method for fabricating an integrated circuit structure is provided. The method includes forming an epitaxial stack over a semiconductor substrate, wherein the epitaxial stack comprises a plurality of first epitaxial layers and a plurality of second epitaxial layers alternately arranged over the semiconductor substrate; patterning the epitaxial stack into a first fin and a second fin, wherein from a top view the first fin extends along a first direction, and the second fin has a first fin line extending along the first direction and a second fin line extending along a second direction different from the first direction; forming a first gate structure over a first portion of the first fin; etching a recess in a second portion of the first fin adjacent the first portion of the first fin; and forming a source/drain feature in the recess.