A microelectronic device including an isolation device. The isolation device includes a lower isolation element, an upper isolation element, and an inorganic dielectric plateau between the lower isolation element and the upper isolation element. The inorganic dielectric plateau contains an upper etch stop layer and a lower etch stop layer between the upper isolation element and the lower isolation element. The upper etch stop layer provides an end point signal during the plateau etch process which provides feedback on the amount of inorganic dielectric plateau which has been etched. The lower etch stop layer provides a traditional etch stop function to provide for a complete plateau etch and protection of an underlying metal bond pad. The inorganic dielectric plateau also contains alternating layers of high stress and low stress silicon dioxide, which provide a means of reinforcement of the inorganic dielectric plateau.

A system-in-package includes: a photonic integrated circuit (PIC) including an active photonic component; and an electronic integrated circuit (EIC) stacked on the PIC, the EIC including: an electrical component electrically connected to a landing pad, and a copper pillar embedded in the landing pad and protruding from the landing pad that connects with the active photonic component such that the electrical component is electrically connected to the active photonic component. The landing pad has a larger surface area than a cross sectional area of the copper pillar, and wherein, when viewed from the EIC towards the PIC, the active photonic component on the PIC is offset from the landing pad of the EIC, wherein the offset is sufficient to keep a parasitic capacitance between the landing pad and the active photonic component within a pre-determined threshold level of tolerance.

Provided is a semiconductor package including a first semiconductor chip, a plurality of second semiconductor chips stacked on the first semiconductor chip, a step cover layer surrounding side surfaces of the plurality of second semiconductor chips and covering side portions of the plurality of second semiconductor chips, wherein a maximum thickness of the step cover layer is 40 micrometers (m) or less, and a moisture barrier layer covering an outer surface of the step cover layer.

A semiconductor die stack includes a first semiconductor die having a first lattice direction, and a second semiconductor die bonded to the first semiconductor die and having a second lattice direction different than the first lattice direction.

A die alignment method includes vertically aligning a first die comprising first magnetic patterns and a second die comprising second magnetic patterns with each other using magnetic force between the first magnetic patterns and the second magnetic patterns. Each of the first magnetic patterns and the second magnetic patterns comprises a horizontally magnetically anisotropic material. The first magnetic patterns and the second magnetic patterns do not vertically overlap each other when the first die and the second die are vertically aligned with each other.

A package includes a substrate. The package further includes a first die on the substrate. The package further includes a second die on the substrate. The package further includes a first stress relief structure on the substrate, wherein a distance between the first stress relief structure to the first die is a first distance. The package further includes a second stress relief structure on the substrate, wherein a distance between the second stress relief structure to the first distance, and the second stress relief structure is separated from the first stress relief structure.

Semiconductor systems having anti-warpage frames (and associated systems, devices, and methods) are described herein. In one embodiment, a semiconductor system includes (a) a printed circuit board (PCB) having a first side and a second side opposite the first side, and (b) at least one memory device attached to the PCB at the first side of the PCB. The semiconductor system further includes a frame structure attached to the PCB at the first side of the PCB and proximate the at least one memory device. The frame structure can be configured to resist warpage of the PCB, for example, when the semiconductor system is heated to attach the at least one memory device to the PCB.

Semiconductor systems having anti-warpage frames (and associated systems, devices, and methods) are described herein. In one embodiment, a semiconductor system includes (a) a printed circuit board (PCB) having a first side and a second side opposite the first side, and (b) at least one memory device attached to the PCB at the first side of the PCB. The semiconductor system further includes a frame structure attached to the PCB at the first side of the PCB and proximate the at least one memory device. The frame structure can be configured to resist warpage of the PCB, for example, when the semiconductor system is heated to attach the at least one memory device to the PCB.

Various embodiments of the present disclosure provide a semiconductor device structure. The semiconductor device structure comprises a substrate comprising a first trench, wherein the first trench extends into a front side surface of the substrate, a first trench capacitor comprising a plurality of first capacitor electrode layers and a plurality of first capacitor dielectric layers disposed in alternating manner within the first trench and over the front side surface of the substrate, wherein a first air gap is enclosed by the plurality of first capacitor electrode layers and the plurality of first capacitor dielectric layers within the first trench, an interconnect structure disposed over the first trench capacitor, wherein one or more first capacitor electrode layers of the plurality of first capacitor electrode layers are in electrical connection with a first conductive feature in a dielectric layer of the interconnect structure, and a first seal ring structure disposed in the interconnect structure and encircling an interior portion of the substrate, wherein at least a portion of the first seal ring structure is in contact with the first conductive feature.

A semiconductor device includes a substrate having a plurality of dies. A dielectric layer is arranged on the substrate including a plurality of Back End of Line (BEOL) interconnects, and a plurality of dummy metal structures. A dicing street is arranged between the dies. A high-refraction low-absorptance layer is arranged on the substrate below the dummy metal structures, and the high-refraction low-absorptance layer covers at least a partial area of the dicing street between the dice.