Patent classifications
H
ELECTRICITY
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H10
SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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H10P
GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
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76/00
Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
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H10P76/00

Hardmask structure and method of forming semiconductor structure
12616004 · 2026-04-28 · ·

A hardmask structure and a method of forming a semiconductor structure are provided. The hardmask structure includes a first ashable hardmask, a first dielectric antireflective coating, and a second ashable hardmask. The first dielectric antireflective coating is disposed on the first ashable hardmask. The second ashable hardmask is disposed on the first dielectric antireflective coating. A stress of the first ashable hardmask is from about 100 MPa to about 100 MPa.