Embodiments describe a solid state electronic scanning LIDAR system that includes a scanning focal plane transmitting element and a scanning focal plane receiving element whose operations are synchronized so that the firing sequence of an emitter array in the transmitting element corresponds to a capturing sequence of a photosensor array in the receiving element. During operation, the emitter array can sequentially fire one or more light emitters into a scene and the reflected light can be received by a corresponding set of one or more photosensors through an aperture layer positioned in front of the photosensors. Each light emitter can correspond with an aperture in the aperture layer, and each aperture can correspond to a photosensor in the receiving element such that each light emitter corresponds with a specific photosensor in the receiving element.

Hybrid optical integration places very strict manufacturing tolerances and performance requirements upon the multiple elements to exploit passive alignment techniques as well as having additional processing requirements. Alternatively, active alignment and soldering/fixing where feasible is also complex and time consuming with 3, 4, or 6-axis control of each element. However, microelectromechanical (MEMS) systems can sense, control, and activate mechanical processes on the micro scale. Beneficially, therefore the inventors combine silicon MEMS based micro-actuators with silicon CMOS control and drive circuits in order to provide alignment of elements within a silicon optical circuit either with respect to each other or with other optical elements hybridly integrated such as compound semiconductor elements. Such inventive MEMS based circuits may be either maintained as active during deployment or powered off once the alignment has been “locked” through an attachment/retention/latching process.

Hybrid optical integration places very strict manufacturing tolerances and performance requirements upon the multiple elements to exploit passive alignment techniques as well as having additional processing requirements. Alternatively, active alignment and soldering/fixing where feasible is also complex and time consuming with 3, 4, or 6-axis control of each element. However, microelectromechanical (MEMS) systems can sense, control, and activate mechanical processes on the micro scale. Beneficially, therefore the inventors combine silicon MEMS based micro-actuators with silicon CMOS control and drive circuits in order to provide alignment of elements within a silicon optical circuit either with respect to each other or with other optical elements hybridly integrated such as compound semiconductor elements. Such inventive MEMS based circuits may be either maintained as active during deployment or powered off once the alignment has been “locked” through an attachment/retention/latching process.

Provided are a micro-nano wire manufacturing device and a micro-nano structure. The micro-nano wire manufacturing device includes a liquid-phase nanomaterial storage device and a micro-nano wire applying mechanism. The liquid-phase nanomaterial storage device is provided with a liquid outlet. The micro-nano wire applying mechanism is provided in one-to-one correspondence with the liquid outlet. The micro-nano wire applying mechanism includes at least two flexible wires. The roots of the flexible wires are secured to the liquid-phase nanomaterial storage device. One ends of the two flexible wires hang down to a substrate and abut against each other. The range of the angle between the projections of the two flexible wires on the substrate is 1°to 5°.

A method for manufacturing a microelectromechanical systems (MEMS) device, includes forming a cavity in a bulk semiconductor substrate; defining a movably suspended mass in the bulk semiconductor substrate by one or more trenches extending from a main surface area of the bulk semiconductor substrate to the cavity; arranging a cap structure on the main surface area of the bulk semiconductor substrate; and forming a capacitive structure. Forming the capacitive structure includes arranging a first electrode structure on the movably suspended mass; and providing a second electrode structure at the cap structure such that the first electrode structure and the second electrode structure are spaced apart in a direction perpendicular to the main surface area of the bulk semiconductor substrate.

A method for manufacturing a microelectromechanical systems (MEMS) device, includes forming a cavity in a bulk semiconductor substrate; defining a movably suspended mass in the bulk semiconductor substrate by one or more trenches extending from a main surface area of the bulk semiconductor substrate to the cavity; arranging a cap structure on the main surface area of the bulk semiconductor substrate; and forming a capacitive structure. Forming the capacitive structure includes arranging a first electrode structure on the movably suspended mass; and providing a second electrode structure at the cap structure such that the first electrode structure and the second electrode structure are spaced apart in a direction perpendicular to the main surface area of the bulk semiconductor substrate.

Method of manufacturing a micromechanical component intended to cooperate with another micromechanical component, the method comprising the steps of providing a substrate, forming a mould on said substrate, said mould defining sidewalls arranged to delimit said micromechanical component, providing particles on at least said sidewalls, depositing a metal in said mould so as to form said micromechanical component, and liberating said micromechanical component from said mould and removing said particles.

A substrate formed by using a sliding dielectric film with a low surface energy that activates surface migration of metal adatoms and a method of manufacturing the same. More particularly, a substrate with a sliding dielectric film includes a substrate; a sliding dielectric film with a low surface energy formed on the substrate; and a nanoparticle formed on the sliding dielectric film, wherein the surface energy of the nanoparticle is at least 1000 mJ/m.sup.2 greater than the surface energy of the sliding dielectric film. The substrate has a very high SERS enhancement factor with low light loss characteristics in the entire visible region by maximizing the plasmonic coupling between highly-dense and spaced-apart nanoparticles and between the lower substrate and the upper nanoparticles.

A substrate formed by using a sliding dielectric film with a low surface energy that activates surface migration of metal adatoms and a method of manufacturing the same. More particularly, a substrate with a sliding dielectric film includes a substrate; a sliding dielectric film with a low surface energy formed on the substrate; and a nanoparticle formed on the sliding dielectric film, wherein the surface energy of the nanoparticle is at least 1000 mJ/m.sup.2 greater than the surface energy of the sliding dielectric film. The substrate has a very high SERS enhancement factor with low light loss characteristics in the entire visible region by maximizing the plasmonic coupling between highly-dense and spaced-apart nanoparticles and between the lower substrate and the upper nanoparticles.

The present subject matter relates to charge pump devices, systems, and methods in which a plurality of series-connected charge-pump stages are connected between a supply voltage node and a primary circuit node, and a discharge circuit is connected to the plurality of charge-pump stages, wherein the discharge circuit is configured to selectively remove charge from the primary circuit node.