Patent classifications
C01G23/00
Optical lens with antireflective film, projection lens, and projection lens optical system
An optical lens with an antireflective film includes: a lens substrate; and an antireflective film disposed on the lens substrate. The antireflective film is formed of layers each having a physical thickness of 140 nm or less. In order from an air side, the antireflective film has: a first layer formed as an MgF.sub.2 layer, a second layer, a fourth layer, a sixth layer, an eighth layer, and a tenth layer each having a refractive index of 2.0 or more and 2.3 or less, and a third layer, a fifth layer, a seventh layer, and a ninth layer each formed as an SiO.sub.2 layer.
RADIOFREQUENCY COMPONENT INCORPORATING TEMPERATURE COMPENSATED DIELECTRIC MATERIAL
Disclosed are embodiments of tungsten bronze crystal structures that can have both a high dielectric constant and low temperature coefficient, making them advantageous for applications that experience temperature changes and gradients. In particular, tantalum can be substituted into the crystal structure to improve properties. Embodiments of the material can be useful for radiofrequency applications such as resonators and antennas.
Functional layer including layered double hydroxide, and composite material
There is provided a functional layer including a layered double hydroxide (LDH). The functional layer includes a first layer with a thickness of 0.10 μm or more, the first layer being composed of fine LDH particles having a diameter of less than 0.05 μm, and a second layer composed of large LDH particles having a mean particle diameter of 0.05 μm or more, the second layer being an outermost layer provided on the first layer.
Functional layer including layered double hydroxide, and composite material
There is provided a functional layer including a layered double hydroxide (LDH). The functional layer includes a first layer with a thickness of 0.10 μm or more, the first layer being composed of fine LDH particles having a diameter of less than 0.05 μm, and a second layer composed of large LDH particles having a mean particle diameter of 0.05 μm or more, the second layer being an outermost layer provided on the first layer.
Complex titanate compound, method of preparing same, and friction material
This composite titanium oxide compound is a composite titanium oxide compound wherein primary particles of an alkali metal titanate compound and primary particles of an alkaline earth metal titanate compound are joined to form secondary particles. The secondary particles have an average particle size of 1 to 80 μm. When the concentration of elements in the secondary particles is analyzed, a region where the alkaline earth metal is detected covers 50% or more of the surface area in 3% or less of the total number of secondary particles.
METHOD FOR PRODUCING METAL OXIDE FIBERS, AND METAL OXIDE FIBERS
A method of producing a metal oxide fiber is described, including a spinning step of spinning a composition containing a polymetalloxane and an organic solvent to obtain a thread-like product; and a firing step of firing the thread-like product obtained in the spinning step at a temperature of 200° C. or higher and 2,000° C. or lower to obtain a metal oxide fiber, where the polymetalloxane has a repeating structure composed of a metal atom selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Pd, Ag, In, Sn, Sb, Hf, Ta, W and Bi, and an oxygen atom and where the weight average molecular weight of the polymetalloxane is 20,000 or more and 2,000,000 or less.
Method of producing high performance lithium titanate anode material for lithium ion battery applications
The method of producing lithium titanate anode material for lithium ion battery applications is comprising of: a) mixing of mixed phase having 60-80% anatase and 20-40% rutile of TiO.sub.2 as titanium precursor with Li.sub.2CO.sub.3 as lithium precursor in a stoichiometric ratio of 5:4 and adding with 2 to 5% stearic acid as process control agent as well as carbon precursor; b) milling in horizontal attrition milling unit maintained with the ball to powder ratio of 10:1-12:1 at 250-500 rpm for 0.5 to 2 hrs c) repeating the milling for 40 to 48 times; d) palletisation of the milled powder to a diameter of 30-35 mm under a pressure of 0.5-1 ton; e) annealing under inert atmosphere at a temperature of 700-900° C. for a period of 2-12 hrs; and f) grinding the resultant annealed composite powder to a fine powder. Resultant powder has shown excellent electrochemical properties in terms of charge-discharge, cyclic-stability and rate capability.
Multi-layered ceramic electronic component and method for manufacturing the same
A multi-layered ceramic electronic component has a ceramic body including a dielectric layer and an internal electrode, and an external electrode formed outside of the ceramic body and electrically connected to the internal electrode. The internal electrode includes a conductive metal and a fiber-shaped ceramic additive. For example, the fiber-shaped ceramic additive can include barium titanate (BaTiO.sub.3) and, optionally, dysprosium (Dy) and/or barium (Ba). The fiber-shaped ceramic additive may have a diameter of 10 to 200 nm, and a ratio of length to diameter of 10 to 100.
Multi-layered ceramic electronic component and method for manufacturing the same
A multi-layered ceramic electronic component has a ceramic body including a dielectric layer and an internal electrode, and an external electrode formed outside of the ceramic body and electrically connected to the internal electrode. The internal electrode includes a conductive metal and a fiber-shaped ceramic additive. For example, the fiber-shaped ceramic additive can include barium titanate (BaTiO.sub.3) and, optionally, dysprosium (Dy) and/or barium (Ba). The fiber-shaped ceramic additive may have a diameter of 10 to 200 nm, and a ratio of length to diameter of 10 to 100.
DIELECTRIC FILM, DIELECTRIC ELEMENT, AND ELECTRONIC CIRCUIT BOARD
A dielectric film includes a main component of a complex oxide represented by a general formula of (Sr.sub.1-xCa.sub.x).sub.yTiO.sub.3. 0.40x0.90 and 0.90y1.10 are satisfied. A ratio of a diffraction peak intensity on (1, 1, 2) plane of the complex oxide to a diffraction peak intensity on (0, 0, 4) plane of the complex oxide in an X-ray diffraction chart of the dielectric film is 3.00 or more. Instead, a ratio of an intensity of a diffraction peak appearing at a diffraction angle 2 of 32 or more and 34 or less to an intensity of a diffraction peak appearing at a diffraction angle 2 of 46 or more and 48 or less in an X-ray diffraction chart of the dielectric film obtained by an X-ray diffraction measurement with Cu-K ray as an X-ray source is 3.00 or more.