A curved glass and a preparation method is provided. The preparation method for curved glass includes: melting a glass batch into a glass liquid, and clearing the glass liquid; introducing the cleared glass liquid into a mold cavity with a preset shape, and forming, by using a compression molding process, a glass product with a shape corresponding to that of the curved glass, where a size of the glass product is greater than a size of the curved glass; annealing the molded glass product; and processing the annealed glass product into the curved glass based on the shape and the size of the curved glass.

A curved glass and a preparation method is provided. The preparation method for curved glass includes: melting a glass batch into a glass liquid, and clearing the glass liquid; introducing the cleared glass liquid into a mold cavity with a preset shape, and forming, by using a compression molding process, a glass product with a shape corresponding to that of the curved glass, where a size of the glass product is greater than a size of the curved glass; annealing the molded glass product; and processing the annealed glass product into the curved glass based on the shape and the size of the curved glass.

A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.

A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.

A glass heating furnace is disclosed, comprising a furnace body, an interior of which is formed with a chamber; plural upper heating elements which are disposed in the chamber; plural lower heating elements, which are disposed in the chamber and are located oppositely below the upper heating elements; plural rollers, which are disposed in the chamber and are locate between the upper heating elements and the lower heating element to carry glass to be heated up; and a roller power module, which is disposed outside the furnace body and is connected with the rollers. The rollers are controlled by the roller power module to rotate clockwise and counterclockwise, driving glass to displace along a transversal direction. In addition, the upper heating elements and the lower heating elements are arranged in the chamber alternatingly and asymmetrically at an upper and lower position.

A heating device includes a base body that has a placement surface for placing a wafer thereon and a back surface that is on an opposite side of the placement surface; a heating resistor that is embedded in the base body; a cylindrical supporting body that has one end surface and the other end surface, the one end surface being connected to the back surface of the base body, the other end surface being on an opposite side of the one end surface; and a supporting-body channel that includes a portion extending in a direction from the other end surface to the one end surface of the cylindrical supporting body, and that is formed within a peripheral wall of the cylindrical supporting body. The supporting-body channel includes an opening portion that opens inwardly from an outer peripheral surface of the cylindrical supporting body.

A heating device includes a base body that has a placement surface for placing a wafer thereon and a back surface that is on an opposite side of the placement surface; a heating resistor that is embedded in the base body; a cylindrical supporting body that has one end surface and the other end surface, the one end surface being connected to the back surface of the base body, the other end surface being on an opposite side of the one end surface; and a supporting-body channel that includes a portion extending in a direction from the other end surface to the one end surface of the cylindrical supporting body, and that is formed within a peripheral wall of the cylindrical supporting body. The supporting-body channel includes an opening portion that opens inwardly from an outer peripheral surface of the cylindrical supporting body.

Described herein are alkali-free, boroalumino silicate glasses exhibiting desirable physical and chemical properties for use as substrates in flat panel display devices, such as, active matrix liquid crystal displays (AMLCDs) and active matrix organic light emitting diode displays (AMOLEDs). In accordance with certain of its aspects, the glasses possess excellent compaction and stress relaxation properties.

Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750 C.-950 C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650 C.-875 C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750 C.-950 C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650 C.-875 C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.