Provided is a method for producing a porous glass member whereby excellent productivity can be achieved because of a high etching rate during acidic treatment and a porous glass member having excellent alkali resistance can be obtained. A method for producing a porous glass member includes the steps of: subjecting a glass base material containing, in terms of % by mole, 40 to 80% SiO.sub.2, over 0 to 40% B.sub.2O.sub.3, 0 to 20% Li.sub.2O, 0 to 20% Na.sub.aO, 0 to 20% K.sub.2O, over 0 to 10% TiO.sub.2, over 0 to 20% ZrO.sub.2, 0 to 10% Al.sub.2O.sub.3, and 0 to 20% RO (where R represents at least one selected from among Mg, Ca, Sr, and Ba) and having a molar ratio of Li.sub.2O/Na.sub.2O of 0 to 0.16 to thermal treatment to separate the glass base material into two phases; and removing one of the two phases with an acid.

Provided is a method for producing a porous glass member whereby cracking during production is less likely to occur and a porous glass member having excellent alkali resistance can be produced. A method for producing a porous glass member includes the steps of: subjecting a glass base material containing, in terms of % by mole, 40 to 80% SiO.sub.2, over 0 to 40% B.sub.2O.sub.3, 0 to 20% Li.sub.2O, 0 to 20% Na.sub.2O, 0 to 20% K.sub.2O, over 0 to 2% P.sub.2O.sub.5, over 0 to 20% ZrO.sub.2, 0 to 10% Al.sub.2O.sub.3, and 0 to 20% RO (where R represents at least one selected from among Mg, Ca, Sr, and Ba) to thermal treatment to separate the glass base material into two phases; and removing one of the two phases with an acid.

Provided is a method for producing a porous glass member whereby cracking during production is less likely to occur and a porous glass member having excellent alkali resistance can be produced. A method for producing a porous glass member includes the steps of: subjecting a glass base material containing, in terms of % by mole, 40 to 80% SiO.sub.2, over 0 to 40% B.sub.2O.sub.3, 0 to 20% Li.sub.2O, 0 to 20% Na.sub.2O, 0 to 20% K.sub.2O, over 0 to 2% P.sub.2O.sub.5, over 0 to 20% ZrO.sub.2, 0 to 10% Al.sub.2O.sub.3, and 0 to 20% RO (where R represents at least one selected from among Mg, Ca, Sr, and Ba) to thermal treatment to separate the glass base material into two phases; and removing one of the two phases with an acid.

A method for manufacturing fine surface roughness having an average pitch of 50 nanometers to 5 micrometers on a quartz glass substrate without preparing a mask prior to an etching process, the method comprising the steps of: making the quartz glass substrate undergo ion etching with argon gas in an ion etching apparatus, in which the quartz glass substrate is placed on a first electrode, the first electrode is connected to a high frequency power source and a second electrode is grounded; and making the quartz glass substrate undergo reactive ion etching with trifluoromethane (CHF.sub.3) gas or a mixed gas of trifluoromethane (CHF.sub.3) and oxygen in the ion etching apparatus in which the quartz glass substrate is placed on the first electrode, the first electrode is connected to the high frequency power source and the second electrode is grounded.

A method for manufacturing fine surface roughness having an average pitch of 50 nanometers to 5 micrometers on a quartz glass substrate without preparing a mask prior to an etching process, the method comprising the steps of: making the quartz glass substrate undergo ion etching with argon gas in an ion etching apparatus, in which the quartz glass substrate is placed on a first electrode, the first electrode is connected to a high frequency power source and a second electrode is grounded; and making the quartz glass substrate undergo reactive ion etching with trifluoromethane (CHF.sub.3) gas or a mixed gas of trifluoromethane (CHF.sub.3) and oxygen in the ion etching apparatus in which the quartz glass substrate is placed on the first electrode, the first electrode is connected to the high frequency power source and the second electrode is grounded.

The present invention relates to a nano-protrusion forming method and a base material having a nano-protrusion surface formed by the method. The method includes forming an anti-reflective layer including nano-protrusions having a width of several nm to several tens of nm, and/or an anti-glare layer including protrusions having a width of several tens of nm to several μm, by a wet etching process using an acid solution without using a nano-mask.

The present invention relates to a nano-protrusion forming method and a base material having a nano-protrusion surface formed by the method. The method includes forming an anti-reflective layer including nano-protrusions having a width of several nm to several tens of nm, and/or an anti-glare layer including protrusions having a width of several tens of nm to several μm, by a wet etching process using an acid solution without using a nano-mask.

A glass-based article includes a first major surface and a first compressive stress region extending to a first depth of compression from the first major surface. The glass-based article includes a second major surface including a first surface portion and one or more edge surface portions recessed from the first surface portion. The glass-based article includes a second compressive stress region extending to a second depth of compression from the first surface portion. Additionally, methods of manufacturing a glass-based article are disclosed.

A glass-based article includes a first major surface and a first compressive stress region extending to a first depth of compression from the first major surface. The glass-based article includes a second major surface including a first surface portion and one or more edge surface portions recessed from the first surface portion. The glass-based article includes a second compressive stress region extending to a second depth of compression from the first surface portion. Additionally, methods of manufacturing a glass-based article are disclosed.

A display device according to some exemplary embodiment includes: a display area; a non-display area surrounding the display area and including a sealing area; a first substrate including a center portion including a portion in the display area and an external portion including a portion in the sealing area; a second substrate including a center portion including a portion in the display area and an external portion including a portion in the sealing area; and a sealing portion between the first substrate and the second substrate and in the sealing area, wherein a thickness of the center portion of the first substrate is different from a thickness of the external portion of the first substrate, and a thickness of the center portion of the second substrate is different from a thickness of the external portion of the second substrate.