An article includes an optical transforming layer and a guide region positioned inside and adjacent to at least a portion of a perimeter of the optical transforming layer. The guide region comprises an inlet end positioned adjacent to a first surface of the optical transforming layer and an outlet end positioned adjacent a second surface of the optical transforming layer. The guide region propagates light from the inlet end to the outlet end such that the light is directed from the first surface to the second surface. The guide region includes a phase-separated glass comprising a continuous network phase and a discontinuous phase. A relative difference in index of refraction between the continuous network phase and the discontinuous phase is greater than or equal to 0.3%. The discontinuous phase comprises elongated shaped regions aligned along a common axis and having an aspect ratio greater than or equal to 10:1.

An article includes an optical transforming layer and a guide region positioned inside and adjacent to at least a portion of a perimeter of the optical transforming layer. The guide region comprises an inlet end positioned adjacent to a first surface of the optical transforming layer and an outlet end positioned adjacent a second surface of the optical transforming layer. The guide region propagates light from the inlet end to the outlet end such that the light is directed from the first surface to the second surface. The guide region includes a phase-separated glass comprising a continuous network phase and a discontinuous phase. A relative difference in index of refraction between the continuous network phase and the discontinuous phase is greater than or equal to 0.3%. The discontinuous phase comprises elongated shaped regions aligned along a common axis and having an aspect ratio greater than or equal to 10:1.

A system for use in glass production technology such as for production of glass packaging, glassware, glass home equipments, wherein the system allows all kinds of design additions such as color, pattern, texture, decor, seal and form changing processes to be applied to the product without requiring re-firing of the product, after removal of the product from the moulds in the production lines while the product is still hot and the temperature is kept constant.

A system for use in glass production technology such as for production of glass packaging, glassware, glass home equipments, wherein the system allows all kinds of design additions such as color, pattern, texture, decor, seal and form changing processes to be applied to the product without requiring re-firing of the product, after removal of the product from the moulds in the production lines while the product is still hot and the temperature is kept constant.

A transparent substrate having an antiglare function includes first and second faces. The transparent substrate has a resolution index value T, a reflected image diffusivity index value R, and a sparkle index value S satisfying T≥0.25, R≥0.8, and 0.75≤S≤0.95, respectively. The resolution index value T is calculated as (luminance of zero-degrees transmission light)/(luminance of total transmission light). The reflected image diffusivity index value R is calculated as (R.sub.2+R.sub.3)/(2×R.sub.1), where R.sub.1 denotes a luminance of reflected light reflected at first angle α.sub.1, and R.sub.2, R.sub.3 denote luminance of reflected light at the second angle α.sub.2, the third angle α.sub.3, respectively, with respect to the first angle α.sub.1. The sparkle index value S is calculated as 1−(S.sub.a/S.sub.s), where the first sparkle S.sub.a and the second sparkle S.sub.s denote a sparkle value of the transparent substrate and a sparkle value of a glass substrate, respectively.

A transparent substrate having an antiglare function includes first and second faces. The transparent substrate has a resolution index value T, a reflected image diffusivity index value R, and a sparkle index value S satisfying T≥0.25, R≥0.8, and 0.75≤S≤0.95, respectively. The resolution index value T is calculated as (luminance of zero-degrees transmission light)/(luminance of total transmission light). The reflected image diffusivity index value R is calculated as (R.sub.2+R.sub.3)/(2×R.sub.1), where R.sub.1 denotes a luminance of reflected light reflected at first angle α.sub.1, and R.sub.2, R.sub.3 denote luminance of reflected light at the second angle α.sub.2, the third angle α.sub.3, respectively, with respect to the first angle α.sub.1. The sparkle index value S is calculated as 1−(S.sub.a/S.sub.s), where the first sparkle S.sub.a and the second sparkle S.sub.s denote a sparkle value of the transparent substrate and a sparkle value of a glass substrate, respectively.

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 μm. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 μm. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Disclosed is a method of treating the surface of a quartz member. The method can remove a masking material generated by a chemical reaction between the quartz member and an etching solution, thereby completely removing scratches on the surface of the quartz member without interrupting the treatment process unlike existing technologies. The method also embosses the surface of the quartz member, thereby increasing the frictional resistance and surface roughness of the surface of the quartz member depending on the shape or density of protrusions on the surface. In addition, the method prevents deposits on the surface of the quartz member from peeling off.

Disclosed is a method of treating the surface of a quartz member. The method can remove a masking material generated by a chemical reaction between the quartz member and an etching solution, thereby completely removing scratches on the surface of the quartz member without interrupting the treatment process unlike existing technologies. The method also embosses the surface of the quartz member, thereby increasing the frictional resistance and surface roughness of the surface of the quartz member depending on the shape or density of protrusions on the surface. In addition, the method prevents deposits on the surface of the quartz member from peeling off.