Method of forming a trisubstituted ethylene compound, the method comprising: (A) providing a trisubstituted ethylene compound bearing a first, a second and a third substituent, in which the first and the second substituent are bound to the one olefinic carbon atom and are different from one another; (B) providing a monosubstituted ethylene compound or a disubstituted ethylene compound in which the substituents are vicinally bound to the olefinic carbon atoms, bearing at least a fourth substituent, respectively; (C) subjecting the trisubstituted ethylene compound provided in step (A) to a cross-metathesis reaction with olefin provided in step (B) to form said trisubstituted ethylene, wherein the cross-metathesis reaction is catalysed by a transition metal complex bearing ligands from which one ligand is a carbene ligand, wherein the carbene complex is characterized by a M=C moiety, wherein M is the transition metal; and wherein the reaction proceeds stereoselectively.

Method of forming a trisubstituted ethylene compound, the method comprising: (A) providing a trisubstituted ethylene compound bearing a first, a second and a third substituent, in which the first and the second substituent are bound to the one olefinic carbon atom and are different from one another; (B) providing a monosubstituted ethylene compound or a disubstituted ethylene compound in which the substituents are vicinally bound to the olefinic carbon atoms, bearing at least a fourth substituent, respectively; (C) subjecting the trisubstituted ethylene compound provided in step (A) to a cross-metathesis reaction with olefin provided in step (B) to form said trisubstituted ethylene, wherein the cross-metathesis reaction is catalysed by a transition metal complex bearing ligands from which one ligand is a carbene ligand, wherein the carbene complex is characterized by a M=C moiety, wherein M is the transition metal; and wherein the reaction proceeds stereoselectively.

A process is disclosed for making CF.sub.3CF═CHF. The process involves reacting CF.sub.3CClFCCl.sub.2F with H.sub.2 in a reaction zone in the presence of a catalyst to produce a product mixture comprising CF.sub.3CF═CHF. The catalyst has a catalytically effective amount of palladium supported on a support selected from the group consisting of alumina, fluorided alumina, aluminum fluoride and mixtures thereof and the mole ratio of H.sub.2 to CF.sub.3CClFCCl.sub.2F fed to the reaction zone is between about 1:1 and about 5:1. Also disclosed are azeotropic compositions of CF.sub.3CClFCCl.sub.2F and HF and azeotropic composition of CF.sub.3CHFCH.sub.2F and HF.

A process is disclosed for making CF.sub.3CF═CHF. The process involves reacting CF.sub.3CClFCCl.sub.2F with H.sub.2 in a reaction zone in the presence of a catalyst to produce a product mixture comprising CF.sub.3CF═CHF. The catalyst has a catalytically effective amount of palladium supported on a support selected from the group consisting of alumina, fluorided alumina, aluminum fluoride and mixtures thereof and the mole ratio of H.sub.2 to CF.sub.3CClFCCl.sub.2F fed to the reaction zone is between about 1:1 and about 5:1. Also disclosed are azeotropic compositions of CF.sub.3CClFCCl.sub.2F and HF and azeotropic composition of CF.sub.3CHFCH.sub.2F and HF.

A process is disclosed for making CF.sub.3CF═CHF. The process involves reacting CF.sub.3CClFCCl.sub.2F with H.sub.2 in a reaction zone in the presence of a catalyst to produce a product mixture comprising CF.sub.3CF═CHF. The catalyst has a catalytically effective amount of palladium supported on a support selected from the group consisting of alumina, fluorided alumina, aluminum fluoride and mixtures thereof and the mole ratio of H.sub.2 to CF.sub.3CClFCCl.sub.2F fed to the reaction zone is between about 1:1 and about 5:1. Also disclosed are azeotropic compositions of CF.sub.3CClFCCl.sub.2F and HF and azeotropic composition of CF.sub.3CHFCH.sub.2F and HF.

The present invention relates to a growth inhibitor for forming a thin film, a method for forming a thin film using the same, and a semiconductor substrate prepared therefrom, and more particularly, to a growth inhibitor for forming a thin film represented by Chemical Formula 1 below, a method for forming a thin film using the same, and a semiconductor substrate prepared therefrom.

AnBmXo  [Chemical Formula 1] wherein A is carbon or silicon, B is hydrogen or a C1-C3 alkyl, X is a halogen, n is an integer from 1 to 15, o is an integer of 1 or more, and m is from 0 to 2n+1.

According to present invention, it is possible to suppress side reactions to appropriately lower a thin film growth rate and remove process byproducts in the thin film, thereby preventing corrosion or deterioration and greatly improving step coverage and thickness uniformity of a thin film even when the thin film is formed on a substrate having a complicated structure.

A process is disclosed for making CF.sub.3CF═CHF. The process involves reacting CF.sub.3CClFCCl.sub.2F with H.sub.2 in a reaction zone in the presence of a catalyst to produce a product mixture comprising CF.sub.3CF═CHF. The catalyst has a catalytically effective amount of palladium supported on a support selected from the group consisting of alumina, fluorided alumina, aluminum fluoride and mixtures thereof and the mole ratio of H.sub.2 to CF.sub.3CClFCCl.sub.2F fed to the reaction zone is between about 1:1 and about 5:1. Also disclosed are azeotropic compositions of CF.sub.3CClFCCl.sub.2F and HF and azeotropic composition of CF.sub.3CHFCH.sub.2F and HF.

A process is disclosed for making CF.sub.3CF═CHF. The process involves reacting CF.sub.3CClFCCl.sub.2F with H.sub.2 in a reaction zone in the presence of a catalyst to produce a product mixture comprising CF.sub.3CF═CHF. The catalyst has a catalytically effective amount of palladium supported on a support selected from the group consisting of alumina, fluorided alumina, aluminum fluoride and mixtures thereof and the mole ratio of H.sub.2 to CF.sub.3CClFCCl.sub.2F fed to the reaction zone is between about 1:1 and about 5:1. Also disclosed are azeotropic compositions of CF.sub.3CClFCCl.sub.2F and HF and azeotropic composition of CF.sub.3CHFCH.sub.2F and HF.

A process is disclosed for making CF.sub.3CF═CHF. The process involves reacting CF.sub.3CClFCCl.sub.2F with H.sub.2 in a reaction zone in the presence of a catalyst to produce a product mixture comprising CF.sub.3CF═CHF. The catalyst has a catalytically effective amount of palladium supported on a support selected from the group consisting of alumina, fluorided alumina, aluminum fluoride and mixtures thereof and the mole ratio of H.sub.2 to CF.sub.3CClFCCl.sub.2F fed to the reaction zone is between about 1:1 and about 5:1. Also disclosed are azeotropic compositions of CF.sub.3CClFCCl.sub.2F and HF and azeotropic composition of CF.sub.3CHFCH.sub.2F and HF.

A process is disclosed for making CF.sub.3CF═CHF. The process involves reacting CF.sub.3CClFCCl.sub.2F with H.sub.2 in a reaction zone in the presence of a catalyst to produce a product mixture comprising CF.sub.3CF═CHF. The catalyst has a catalytically effective amount of palladium supported on a support selected from the group consisting of alumina, fluorided alumina, aluminum fluoride and mixtures thereof and the mole ratio of H.sub.2 to CF.sub.3CClFCCl.sub.2F fed to the reaction zone is between about 1:1 and about 5:1. Also disclosed are azeotropic compositions of CF.sub.3CClFCCl.sub.2F and HF and azeotropic composition of CF.sub.3CHFCH.sub.2F and HF.