C07D301/00

METHOD FOR PRODUCING 4,4,7-TRIFLUORO-1,2,3,4-TETRAHYDRO-5H-1-BENZAZEPINE COMPOUND AND INTERMEDIATE USED IN THE METHOD

The present invention provides a method for producing a 4,4,7-trifluoro-1,2,3,4-tetrahydro-5H-1-benzazepine compound which has an superior agonistic activity to an arginine vasopressin V2 receptor and is useful as an active ingredient for a pharmaceutical composition for preventing and/or treating urinary frequency, urinary incontinence, enuresis, central diabetes insipidus, nocturia, nocturnal enuresis, or the like; and useful intermediates for use in the methods. The production method of the present invention is suitable for the industrial production of a medicament, because of a smaller number of steps, a higher yield, and a lower cost, as compared with the methods in the related art.

UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY

Novel lithographic compositions for use as an EUV underlayer are disclosed. The invention includes methods of fabricating microelectronics structures using those compositions as well as structures formed by those methods. The method involves utilizing an underlayer immediately below the photoresist layer. The underlayer can either be directly applied to the substrate, or it can be applied to any intermediate layer(s) that may be applied to the substrate. The preferred underlayers are formed from spin-coatable, monomeric, oligomeric, and/or polymeric compositions and exhibit uniform thicknesses and low roughness. The disclosed method enables a 14/28 nm pattern using EUV lithography and better depth of focus (DOF) than standard EUV underlayers.

UNDERLAYER AND METHODS FOR EUV LITHOGRAPHY

Novel lithographic compositions for use as an EUV underlayer are disclosed. The invention includes methods of fabricating microelectronics structures using those compositions as well as structures formed by those methods. The method involves utilizing an underlayer immediately below the photoresist layer. The underlayer can either be directly applied to the substrate, or it can be applied to any intermediate layer(s) that may be applied to the substrate. The preferred underlayers are formed from spin-coatable, monomeric, oligomeric, and/or polymeric compositions and exhibit uniform thicknesses and low roughness. The disclosed method enables a 14/28 nm pattern using EUV lithography and better depth of focus (DOF) than standard EUV underlayers.

Catalyst regeneration process

A process for at least partially reactivating the catalytic activity of at least a partially deactivated catalyst following a reaction cycle, the catalyst having been used in a catalytic reaction process for hydrogenating an aromatic epoxide to produce a hydrogenated aliphatic epoxide; said process including contacting the at least partially deactivated catalyst with an oxygen-containing source at a temperature of less than about 100 C. and in the presence of a reactivation solvent for a pre-determined period of time sufficient to at least partially re-oxidize and reactivate the catalyst for further use; and a catalytic reaction process for hydrogenating an aromatic epoxide to produce a hydrogenated aliphatic epoxide including the above reactivating process step; and optionally including a step for washing the deactivated catalyst with a solvent prior to re-oxidizing the deactivated catalyst.

Catalyst regeneration process

A process for at least partially reactivating the catalytic activity of at least a partially deactivated catalyst following a reaction cycle, the catalyst having been used in a catalytic reaction process for hydrogenating an aromatic epoxide to produce a hydrogenated aliphatic epoxide; said process including contacting the at least partially deactivated catalyst with an oxygen-containing source at a temperature of less than about 100 C. and in the presence of a reactivation solvent for a pre-determined period of time sufficient to at least partially re-oxidize and reactivate the catalyst for further use; and a catalytic reaction process for hydrogenating an aromatic epoxide to produce a hydrogenated aliphatic epoxide including the above reactivating process step; and optionally including a step for washing the deactivated catalyst with a solvent prior to re-oxidizing the deactivated catalyst.

Method for producing N-retinoylcysteic acid alkyl ester

A method for producing derivatives of N-retinoylaminoalkane sulfonic acid, the method comprising providing retinoic acid, chloroformate, aminoalkanesulfonic acid selected from the group consisting of cysteic acid and alkyl ester thereof, cysteinesulfinic acid and alkyl ester thereof, homocysteic acid and alkyl ester thereof, homocysteinesulfinic acid and alkyl esters thereof, taurine and derivatives thereof, and an organic solvent, and a base, mixing said components under substantial absence of oxidizing compounds thereby forming a reaction mixture comprising a liquid phase, wherein the liquid phase is one phase and the derivatives of N-retinoylaminoalkane sulfonic acid are formed in said liquid phase.

Method for producing N-retinoylcysteic acid alkyl ester

A method for producing derivatives of N-retinoylaminoalkane sulfonic acid, the method comprising providing retinoic acid, chloroformate, aminoalkanesulfonic acid selected from the group consisting of cysteic acid and alkyl ester thereof, cysteinesulfinic acid and alkyl ester thereof, homocysteic acid and alkyl ester thereof, homocysteinesulfinic acid and alkyl esters thereof, taurine and derivatives thereof, and an organic solvent, and a base, mixing said components under substantial absence of oxidizing compounds thereby forming a reaction mixture comprising a liquid phase, wherein the liquid phase is one phase and the derivatives of N-retinoylaminoalkane sulfonic acid are formed in said liquid phase.

Process for the preparation of substituted phenyl ketones

The present invention relates to a process for providing substituted phenyl ketones. Furthermore, the invention relates to the use of substituted phenoxyphenyl ketones obtained by the inventive process for the preparation of triazoles.

VINYL-CONTAINING COMPOUNDS AND PROCESSES FOR MAKING THE SAME
20180290992 · 2018-10-11 ·

The present invention provides a process for forming vinyl-containing compounds including the steps of: a) reacting in a nitrogen atmosphere a dicarboxylic acid and/or anhydride and a functional mono or polyfunctional alcohol to provide a hydroxyl-containing polyester; b) reacting the hydroxyl-containing polyester with a vinyl-containing organic acid in the presence of an esterification catalyst, a polymerization inhibitor and an azeotropic agent; and c) reacting the vinyl functional esterified intermediate, residual esterification catalyst and residual vinyl-containing organic acid with an epoxy to provide the vinyl-containing compound.

VINYL-CONTAINING COMPOUNDS AND PROCESSES FOR MAKING THE SAME
20180290992 · 2018-10-11 ·

The present invention provides a process for forming vinyl-containing compounds including the steps of: a) reacting in a nitrogen atmosphere a dicarboxylic acid and/or anhydride and a functional mono or polyfunctional alcohol to provide a hydroxyl-containing polyester; b) reacting the hydroxyl-containing polyester with a vinyl-containing organic acid in the presence of an esterification catalyst, a polymerization inhibitor and an azeotropic agent; and c) reacting the vinyl functional esterified intermediate, residual esterification catalyst and residual vinyl-containing organic acid with an epoxy to provide the vinyl-containing compound.