A positive resist composition is provided comprising (A) an acid generator in the form of a sulfonium salt consisting of a fluorine-containing sulfonate anion and a fluorine-containing sulfonium cation, (B) a quencher in the form of a sulfonium salt containing at least two fluorine atoms in its cation or containing at least 5 fluorine atoms in its anion and cation, and (C) a base polymer comprising repeat units (a1) having a carboxy group whose hydrogen is substituted by an acid labile group and/or repeat units (a2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group. The resist composition exhibits a high sensitivity, high resolution and improved LWR or CDU.

A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

A method of photooxygenating furfural in a photooxygenating system, whereby a liquid mixture comprising furfural, a photosensitizer, and a reaction solvent is passed through a reaction section of the photooxygenating system, wherein the liquid mixture is exposed to solar radiation, while a portion of the furfural is oxidized in presence of the photosensitizer and a furanone compound is produced. Various embodiments of the photocatalytic water splitting reactor, and the water splitting system are also provided.

The invention relates to compounds of general formula I

##STR00001##

wherein R is heteroaryl optionally substituted by R7; or R is heterocycloalkyl or heterocycloalkenyl, optionally substituted by R8; or R is X wherein X is NR11R12; and pharmaceutically acceptable salts, hydrates, or solvates thereof, for usealone or in combination with one or more other pharmaceutically active compoundsin therapy, for preventing, treating or ameliorating diseases or conditions responsive to stimulation of neutrophil oxidative burst, responsive to stimulation of keratinocyte IL-8 release or responsive to induction of necrosis.

The invention relates to compounds of general formula I ##STR00001##
wherein R is heteroaryl optionally substituted by R7; or R is heterocycloalkyl or heterocycloalkenyl, optionally substituted by R8; or R is X wherein X is NR11R12; and pharmaceutically acceptable salts, hydrates, or solvates thereof, for usealone or in combination with one or more other pharmaceutically active compoundsin therapy, for preventing, treating or ameliorating diseases or conditions responsive to stimulation of neutrophil oxidative burst, responsive to stimulation of keratinocyte IL-8 release or responsive to induction of necrosis.

The invention relates to compounds of general formula I ##STR00001##
wherein R is heteroaryl optionally substituted by R7; or R is heterocycloalkyl or heterocycloalkenyl, optionally substituted by R8; or R is X wherein X is NR11R12; and pharmaceutically acceptable salts, hydrates, or solvates thereof, for usealone or in combination with one or more other pharmaceutically active compoundsin therapy, for preventing, treating or ameliorating diseases or conditions responsive to stimulation of neutrophil oxidative burst, responsive to stimulation of keratinocyte IL-8 release or responsive to induction of necrosis.

The present inventions concerns derivatives of aminocyclobutane, particularly as NMDA receptor antagonists, their application in human therapy and their method of preparation. These compounds correspond to the general formula (1): ##STR00001##
wherein: X.sub.1 represents a hydrogen atom or fluorine atom; X.sub.2 is a hydrogen atom or fluorine atom or chlorine atom; R1 represents a hydrogen atom or fluorine atom or chlorine atom or methyl group or methoxy group or cyano group; R2 represents independently or together a methyl group or ethyl group.

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below: ##STR00001##
in which Ra.sup.1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra.sup.2 and Ra.sup.3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X.sup. represents a counter anion.

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below: ##STR00001##
in which Ra.sup.1 represents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Ra.sup.2 and Ra.sup.3 each independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. X.sup. represents a counter anion.