The present inventions concerns derivatives of aminocyclobutane, particularly as NMDA receptor antagonists, their application in human therapy and their method of preparation.

These compounds correspond to the general formula (1):

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wherein: X.sub.1 represents a hydrogen atom or fluorine atom; X.sub.2 is a hydrogen atom or fluorine atom or chlorine atom; R1 represents a hydrogen atom or fluorine atom or chlorine atom or methyl group or methoxy group or cyano group; R2 represents independently or together a methyl group or ethyl group.

An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R.sup.1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R.sup.2 and R.sup.3 each independently represent a monovalent hydrocarbon group, or the like. R.sup.4 and R.sup.5 each independently represent a monovalent hydrocarbon group, or the like. R.sup.6 and R.sup.7 each independently represent a monovalent hydrocarbon group, or the like. R.sup.8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R.sup.9 represents a monovalent hydrocarbon group, or the like. R.sup.10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R.sup.11 and R.sup.12 each independently represent a monovalent hydrocarbon group, or the like. R.sup.13 and R.sup.14 each independently represent a monovalent hydrocarbon group, or the like. ##STR00001##

A monomer containing as a polymerizable group an acenaphthylene structure having an acid labile group of tertiary ester type attached thereto is provided as well as a polymer comprising repeat units derived from the monomer. A chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., EL, LWR and profile, collapse resistance during fine pattern formation, and etch resistance after development.

A monomer containing as a polymerizable group an acenaphthylene structure having an acid labile group of tertiary ester type attached thereto is provided as well as a polymer comprising repeat units derived from the monomer. A chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., EL, LWR and profile, collapse resistance during fine pattern formation, and etch resistance after development.

A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a0-1) or a constitutional unit derived from a compound represented by General Formula (a0-2). In the formulae, R.sup.01 and R.sup.02 represent a hydrogen atom; L.sup.01 and L.sup.02 represent a single bond or a divalent linking group; Ar.sup.01 and Ar.sup.02 represent an aryl group substituted with iodine atoms; Xa.sup.01 represents a group which forms an alicyclic hydrocarbon group together with a carbon atom to which Ar.sup.01 is bonded; Ra.sup.02 represents a hydrocarbon group which may have a substituent; and Xa.sup.02 represents a group which forms an alicyclic hydrocarbon group together with a carbon atom to which Ra.sup.02 is bonded and a group which is bonded to Ar.sup.02 to form a condensed ring

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The present invention relates to the use of compositions comprising 4-isopropyl-1-methyl-7-oxabicyclo[2.2.1]heptan-2-ol or specific esters or ethers thereof and 3-isopropyl-6-methyl-cyclohex-2-en-1-one, or of 4-isopropyl-1-methyl-7-oxabic yclo[2.2.1]heptan-2-ol or specific esters or ethers thereof as aroma chemicals or for modifying and/or enhancing the aroma of a composition. The invention relates moreover to compositions comprising 4-isopropyl-1-methyl-7-oxabicyclo[2.2.1]heptan-2-ol or specific esters or ethers thereof and 3-isopropyl-6-methyl-cyclohex-2-en-1-one, to specific compositions comprising 4-isopropyl-1-methyl-7-oxabicyclo[2.2.1]heptan-2-ol, and to specific esters or ethers of 4-isopropyl-1-methyl-7-oxabicyclo[2.2.1]heptan-2-ol.

The present invention relates to the use of compositions comprising 4-isopropyl-1-methyl-7-oxabicyclo[2.2.1]heptan-2-ol or specific esters or ethers thereof and 3-isopropyl-6-methyl-cyclohex-2-en-1-one, or of 4-isopropyl-1-methyl-7-oxabic yclo[2.2.1]heptan-2-ol or specific esters or ethers thereof as aroma chemicals or for modifying and/or enhancing the aroma of a composition. The invention relates moreover to compositions comprising 4-isopropyl-1-methyl-7-oxabicyclo[2.2.1]heptan-2-ol or specific esters or ethers thereof and 3-isopropyl-6-methyl-cyclohex-2-en-1-one, to specific compositions comprising 4-isopropyl-1-methyl-7-oxabicyclo[2.2.1]heptan-2-ol, and to specific esters or ethers of 4-isopropyl-1-methyl-7-oxabicyclo[2.2.1]heptan-2-ol.

The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO.sub.3.sup., wherein a hydrogen atom or an electron-donating group bonds to an carbon atom with respect to SO.sub.3.sup., and an electron-withdrawing group bonds to a carbon atom with respect to SO.sub.3.sup.; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R.sup.1 and R.sup.2 each independently represent a hydrogen atom or a monovalent electron-donating group. R.sup.3 represent a monovalent electron-withdrawing group. R.sup.4 represents a hydrogen atom or a monovalent hydrocarbon group.

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The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO.sub.3.sup., wherein a hydrogen atom or an electron-donating group bonds to an carbon atom with respect to SO.sub.3.sup., and an electron-withdrawing group bonds to a carbon atom with respect to SO.sub.3.sup.; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R.sup.1 and R.sup.2 each independently represent a hydrogen atom or a monovalent electron-donating group. R.sup.3 represent a monovalent electron-withdrawing group. R.sup.4 represents a hydrogen atom or a monovalent hydrocarbon group.

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A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a0-1), in which R.sup.01 represents a hydrogen atom, L.sup.01 represents a divalent linking group, Ra.sup.01 and Ra.sup.02 each independently represent a hydrocarbon group which may have a substituent, Ar.sup.01 represents an aryl group in which some or all hydrogen atoms are substituted with iodine atoms, and the aryl group may have a substituent other than the iodine atoms

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