A method of photooxygenating furfural in a photooxygenating system, whereby a liquid mixture comprising furfural, a photosensitizer, and a reaction solvent is passed through a reaction section of the photooxygenating system, wherein the liquid mixture is exposed to solar radiation, while a portion of the furfural is oxidized in presence of the photosensitizer and a furanone compound is produced. Various embodiments of the photocatalytic water splitting reactor, and the water splitting system are also provided.

Devices, systems, and methods for forming furan based surfactants by reactive distillation are disclosed herein. Various embodiments can provide a consolidated reaction process that uses reactive distillation to synthesize oleo-furan surfactant molecules and intermediates by combining reaction and separation steps into a single reaction unit or a number of connected reaction units. The single reaction unit or a number of connected reaction units can include a catalyst bed and act to separate reaction side products at opposing ends of the unit or units.

A chemical reactor including: a plurality of heat exchange plates which between them define reaction compartments, in which reactor each heat exchange plate includes two walls between them defining at least one heat exchange space, the respective walls being fixed together by joining regions, and the reactor also comprises at least one injection device for injecting substance into the reaction compartments, said substance-injection device passing through the heat-exchange plates in respective joining regions thereof. Also, a chemical reaction process that can be carried out in this reactor.

Provided is a monomer that improves solubility in organic solvents, hydrolyzability, and solubility in water after hydrolysis of a resin as well as imparts higher heat resistance to a resin. A resin for a photoresist containing a polymerization unit represented by Formula (Y), wherein R.sup.h represents a halogen atom or an alkyl group having from 1 to 6 carbons and having a halogen atom; R.sup.1 is a substituent attached to a ring and represents a halogen atom, an alkyl group that has from 1 to 6 carbons and may have a halogen atom, a hydroxyalkyl group that has from 1 to 6 carbons and may have a halogen atom and has a hydroxyl group moiety which may be protected by a protecting group, a carboxyl group that may form a salt, or a substituted oxycarbonyl group; A represents an alkylene group having from 1 to 6 carbons, an oxygen atom, a sulfur atom, or no bond; m is the number of R.sup.1 and represents an integer from 0 to 8; X represents an electron-withdrawing substituent; n is the number of X and represents an integer from 1 to 9; B represents a single bond or a linking group; and a steric position of a COOB-group attached to a polymer chain may be either endo or exo.

Provided herein are methods and dose packs for the monitoring of medication adherence. In one aspect, the dose pack comprises comprise a multiplicity of doses of an agent and a multiplicity of doses of a marker and be configured to isolate a pair of at least one of the multiplicity of doses of the agent and at least one of the multiplicity of doses of the marker for co-administration of the pair to the subject according to the dosing schedule. In another aspect, the method comprises obtaining a sample from the subject subsequent to the conclusion of a monitoring window and analyzing the sample for the presence or absence of a marker or a degradation product thereof.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001##

wherein R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc., A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group which may have a substituent, —CH.sub.2— included in the group may be replaced by —O—, —CO—, —S—, etc., X.sup.4, X.sup.5 and X.sup.6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ≤ m1 + m7 ≤ 5, 0 ≤ m2 + m8 ≤ 4, 0 ≤ m3 + m9 ≤ 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X.sup.7 represents a single bond, —CH.sub.2—, —O—, —S—, etc., and Al— represents an organic anion.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001##

wherein R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc., A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group which may have a substituent, —CH.sub.2— included in the group may be replaced by —O—, —CO—, —S—, etc., X.sup.4, X.sup.5 and X.sup.6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ≤ m1 + m7 ≤ 5, 0 ≤ m2 + m8 ≤ 4, 0 ≤ m3 + m9 ≤ 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X.sup.7 represents a single bond, —CH.sub.2—, —O—, —S—, etc., and Al— represents an organic anion.

Disclosed are a salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein Q.sup.1 and Q.sup.2 each represent a fluorine atom or a perfluoroalkyl group; R.sup.11 and R.sup.12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X.sup.1 and X.sup.2 each represent *—CO—O—, *—O—CO—, etc.; L.sup.1 represents a single bond or a hydrocarbon group which may have a substituent; A.sup.1 represents a group having a lactone structure which may have a substituent; L.sup.2 and L.sup.3 each represent a single bond or an alkanediyl group; R.sup.1 represents an iodine atom or a haloalkyl group; R.sup.2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z.sup.+ represents an organic cation.

A radiation-sensitive resin composition contains: a polymer having an acid-labile group, a radiation-sensitive acid generator, a compound represented by the following formula (1), and a solvent. In the formula (1), X represents an oxygen atom or a sulfur atom; R.sup.1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R.sup.2 to R.sup.5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and optionally two or more of R.sup.2 to R.sup.5 taken together represent an alicyclic structure having 3 to 20 ring atoms or an aliphatic heterocyclic structure having 3 to 20 ring atoms together with the carbon atom to which the two or more of R.sup.2 to R.sup.5 bond; Z.sup.n+ represents a cation having a valency of n; and n is an integer of 1 to 3. ##STR00001##

A radiation-sensitive resin composition contains: a polymer having an acid-labile group, a radiation-sensitive acid generator, a compound represented by the following formula (1), and a solvent. In the formula (1), X represents an oxygen atom or a sulfur atom; R.sup.1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R.sup.2 to R.sup.5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and optionally two or more of R.sup.2 to R.sup.5 taken together represent an alicyclic structure having 3 to 20 ring atoms or an aliphatic heterocyclic structure having 3 to 20 ring atoms together with the carbon atom to which the two or more of R.sup.2 to R.sup.5 bond; Z.sup.n+ represents a cation having a valency of n; and n is an integer of 1 to 3. ##STR00001##