C07D307/00

Salt, acid generator, resist composition and method for producing resist pattern

A salt represented by formula (I), an acid generator and a resist composition: ##STR00001##
wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, OR.sup.10, OCOOR.sup.10, O-L.sup.1-COOR.sup.10; R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a hydroxy group, etc.; L.sup.1 represents an alkanediyl group; R.sup.10 represents an acid-labile group; X.sup.1, X.sup.2 and X.sup.3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0m1+m75, 0m2+m84, 0m3+m94, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, CH.sub.2, O, S, etc.; and AI.sup. represents an organic anion.

RESIST COMPOSITION AND PATTERNING PROCESS

A resist composition comprising a base polymer and an onium salt of N-carbonylsulfonamide having iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.

Resin, composition and use

The present invention relates to an alkyd resin comprising the condensation product of at least the following components (A) a polybasic acid, (B) a polyhydric alcohol, and (C) a linear C.sub.12-C.sub.60 hydrocarbo monocarboxylic acid, and optionally (D) at least one component other than any of components A to C characterized in that at least a part of the polybasic acid (A) is a (optionally hydrogenated) Diels Alder adduct of citraconic acid with C.sub.4-C.sub.14 conjugated diene, a (optionally hydrogenated) Diels Alder adduct of citraconic anhydride with C.sub.4-C.sub.14 conjugated diene, a half ester of such a Diels Alder adduct and/or a diester of such a Diels Alder adduct.

Resin, composition and use

The present invention relates to an alkyd resin comprising the condensation product of at least the following components (A) a polybasic acid, (B) a polyhydric alcohol, and (C) a linear C.sub.12-C.sub.60 hydrocarbo monocarboxylic acid, and optionally (D) at least one component other than any of components A to C characterized in that at least a part of the polybasic acid (A) is a (optionally hydrogenated) Diels Alder adduct of citraconic acid with C.sub.4-C.sub.14 conjugated diene, a (optionally hydrogenated) Diels Alder adduct of citraconic anhydride with C.sub.4-C.sub.14 conjugated diene, a half ester of such a Diels Alder adduct and/or a diester of such a Diels Alder adduct.

Buagafuran Active Pharmaceutical Ingredient, Preparation Method and Application Thereof
20190337913 · 2019-11-07 · ·

A method suitable for large-scale production of buagafuran active pharmaceutical ingredient. A buagafuran active pharmaceutical ingredient (API) with a high purity prepared by the method includes an active ingredient of buagafuran, an impurity A, and an impurity B. In the buagafuran API, a content of the active ingredient of buagafuran is higher than 97.5%, and a total content of the impurity A and the impurity B is less than 0.04%. The buagafuran API can be applied to new drug development processes such as clinical research, pharmaceutical research and quality control research.

Buagafuran Active Pharmaceutical Ingredient, Preparation Method and Application Thereof
20190337913 · 2019-11-07 · ·

A method suitable for large-scale production of buagafuran active pharmaceutical ingredient. A buagafuran active pharmaceutical ingredient (API) with a high purity prepared by the method includes an active ingredient of buagafuran, an impurity A, and an impurity B. In the buagafuran API, a content of the active ingredient of buagafuran is higher than 97.5%, and a total content of the impurity A and the impurity B is less than 0.04%. The buagafuran API can be applied to new drug development processes such as clinical research, pharmaceutical research and quality control research.

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I):

##STR00001##

In formula (I), R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R.sup.6, R.sup.7 and R.sup.8 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and CH.sub.2 included in the alkyl group may be replaced by O or CO, m5 represents an integer of 1 to 5, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, m8 represents an integer of 0 to 4, and AI.sup. represents an organic anion.

Process for the production of 1,4-butanediol and tetrahydrofuran from furan

The present invention provides a process for the preparation of 1,4-butanediol and tetrahydrofuran said process comprising contacting furan with hydrogen and water in the presence of a supported catalytic composition comprising at least one first metal selected from those in groups 8 to 10 of the periodic table and a further metal selected from manganese, molybdenum, niobium and tungsten.

Method for producing gamma-valerolactone
10227318 · 2019-03-12 · ·

Provided is a method for producing -valerolactone that is hard to elute metallic components and has high productivity. -Valerolactone is synthesized by bringing a levulinic acid compound represented by the formula (1) (where R represents a hydrogen atom, a linear alkyl group of 1 to 6 carbon atoms or a branched alkyl group of 3 to 6 carbon atoms) into contact with hydrogen in the presence of a catalyst in which two or more different kinds of metals of Group VIII to Group X metals in the periodic table are supported on a support. ##STR00001##

Acid generator compounds and photoresists comprising same

Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.