C07D307/00

Resist composition, patterning process, and barium, cesium and cerium salts

A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of -fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

Resist composition, patterning process, and barium, cesium and cerium salts

A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of -fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

Monomer, polymer, resist composition, and patterning process
10054853 · 2018-08-21 · ·

A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning. ##STR00001##

Monomer, polymer, resist composition, and patterning process
10054853 · 2018-08-21 · ·

A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning. ##STR00001##

PERFUME SYSTEMS

The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles.

PERFUME SYSTEMS

The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles.

Process for the production of 1,4-butanediol and tetrahydrofuran from furan

The present invention provides a process for the production of THF and 1,4-BDO from furan in the presence of a catalytic composition, wherein the catalytic composition contains at least one metal selected from the group consisting of Fe, Ru, Os, Co, Rh, Jr, Ni, Pd, Pt and, optionally, contains one or more additional metal on a solid support, and wherein said process comprises the steps of: i) contacting furan with hydrogen and water in a reactor in the presence of said catalytic composition for a time; ii) stopping the flow of furan and the flow of water to the reactor and removing furan and water from the reactor; iii) subjecting the catalytic composition to a gas stream comprising hydrogen at a temperature of from 200 to 600 C. in the absence of the furan and water; iv) re-starting the flow of furan and the flow of water to the reactor.

Triterpenoid sapogenin production in plant and microbial cultures

The disclosure relates to a method for enhancing the biosynthesis and/or secretion of sapogenins in the culture medium of plant and microbial cell cultures. Further, the disclosure also relates to the identification of novel genes involved in the biosynthesis of sapogenin intermediates, as well as to novel sapogenin compounds.

Triterpenoid sapogenin production in plant and microbial cultures

The disclosure relates to a method for enhancing the biosynthesis and/or secretion of sapogenins in the culture medium of plant and microbial cell cultures. Further, the disclosure also relates to the identification of novel genes involved in the biosynthesis of sapogenin intermediates, as well as to novel sapogenin compounds.

Compositions and methods for reduction of ketones, aldehydes and iminiums, and products produced thereby

A method of producing an alcohol, comprises reducing an aldehyde or a ketone with a hydridosilatrane. The reducing is carried out with an activator.