A substrate processing apparatus includes: a chamber; and a processing gas supply unit connected to the chamber via a processing gas supply flow path and configured to supply a processing gas. The processing gas supply unit includes a raw material cartridge that includes a raw material tank that accommodates a porous member containing a metal-organic framework adsorbed with gas molecules of a raw material of the processing gas; a main body configured to communicate the raw material tank and the processing gas supply flow path with each other when the raw material cartridge is attached; and a desorption mechanism configured to desorb the gas molecules of the raw material of the processing gas and allow the gas molecules to flow out as the processing gas to the processing gas supply flow path while the raw material cartridge is attached to the main body.

Provided is a compound represented by the following general formula (1) or (2):

##STR00001##

where R.sup.1 to R.sup.4 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the like, R.sup.5 and R.sup.6 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M.sup.1 represents a gallium atom or an indium atom;

##STR00002##

where R.sup.7 to R.sup.10 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the like, R.sup.11 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and M.sup.2 represents a gallium atom or an indium atom.

Provided is a compound represented by the following general formula (1) or (2):

##STR00001##

where R.sup.1 to R.sup.4 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the like, R.sup.5 and R.sup.6 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M.sup.1 represents a gallium atom or an indium atom;

##STR00002##

where R.sup.7 to R.sup.10 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the like, R.sup.11 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and M.sup.2 represents a gallium atom or an indium atom.

The present invention relates to a gadolinium-based compound of a Chemical Formula 1, a method for producing the same, and an MRI contrast agent containing the same. [Chemical Formula 1] [structural formula] In chemical formula 1, A and Linker represent linking groups, and RB represents a Rose Bengal-derived part.

The present invention relates to a gadolinium-based compound of a Chemical Formula 1, a method for producing the same, and an MRI contrast agent containing the same. [Chemical Formula 1] [structural formula] In chemical formula 1, A and Linker represent linking groups, and RB represents a Rose Bengal-derived part.

Described are precursor compounds and methods for atomic layer deposition of films containing scandium(III) oxide or scandium(III) sulfide. Such films may be utilized as dielectric layers in semiconductor manufacturing processes, particular for depositing dielectric films and the use of such films in various electronic devices.

Provided herein are photochemical separations. The methods herein can include exposing a first metal complex and a second metal complex to light to facilitate an irreversible chemical reaction to form a modified first metal complex. The modified first metal complex then may be separated from the second metal complex. Compositions also are provided.

Provided herein are photochemical separations. The methods herein can include exposing a first metal complex and a second metal complex to light to facilitate an irreversible chemical reaction to form a modified first metal complex. The modified first metal complex then may be separated from the second metal complex. Compositions also are provided.

Described are precursor compounds and methods for atomic layer deposition of films containing scandium(III) oxide or scandium(III) sulfide. Such films may be utilized as dielectric layers in semiconductor manufacturing processes, particular for depositing dielectric films and the use of such films in various electronic devices.

The present invention relates to a colorant for a heat transfer fluid and a composition comprising same.