A fluorochemical surface treating agent comprising a hydrolyzable group-containing silane modified with a fluorooxyalkylene-containing polymer and/or a partial hydrolytic condensate thereof forms a water/oil repellent layer having chemical resistance and mar resistance.

The invention relates to a metallocene complex according to formula (1) wherein M is a metal selected from lanthanides or transition metals from group 3, 4, 5 or 6 of the Periodic System of the Elements, Q is an anionic ligand to M, k is the number of Q groups and equals the valence of M minus 2, Z.sub.1, Z.sub.2, Z.sub.3 and Z.sub.4 are identical or different and can be chosen from the group consisting of hydrogen and a hydrocarbon radical with 1-20 carbon atoms, and adjacent substituents Z can form a ring system together with the carbon atoms of the Cp ring to which they are bound. ##STR00001##

The invention relates to a metallocene complex according to formula (1) wherein M is a metal selected from lanthanides or transition metals from group 3, 4, 5 or 6 of the Periodic System of the Elements, Q is an anionic ligand to M, k is the number of Q groups and equals the valence of M minus 2, Z.sub.1, Z.sub.2, Z.sub.3 and Z.sub.4 are identical or different and can be chosen from the group consisting of hydrogen and a hydrocarbon radical with 1-20 carbon atoms, and adjacent substituents Z can form a ring system together with the carbon atoms of the Cp ring to which they are bound. ##STR00001##

Hydridosilapyrroles and hydridosilaazapyrrole are a new class of heterocyclic compounds having a silicon bound to carbon and nitrogen atoms within the ring system and one or two hydrogen atoms on the silicon atom. The compounds have formula (I): ##STR00001##
in which R is a substituted or unsubstituted organic group and R′ is an alkyl group. These compounds react with a variety of organic and inorganic hydroxyl groups by a ring-opening reaction and may be used to produce silicon nitride or silicon carbonitride films.

The invention provides a molecular transition metal complex selected from Formula 1, as described herein; an ethylene-based polymer; and a process to form the ethylene-based polymer, said process comprising polymerizing ethylene in the presence of at least one molecular transition metal complex selected from Formula 1, as described herein, and wherein either Z.sub.1 or Z.sub.2 is dative covalent (coordinate) to the metal (M).

##STR00001##

The invention provides a molecular transition metal complex selected from Formula 1, as described herein; an ethylene-based polymer; and a process to form the ethylene-based polymer, said process comprising polymerizing ethylene in the presence of at least one molecular transition metal complex selected from Formula 1, as described herein, and wherein either Z.sub.1 or Z.sub.2 is dative covalent (coordinate) to the metal (M).

##STR00001##

A catalyst system comprising a combination of: 1) one or more catalyst compounds comprising at least one nitrogen linkage; 2) a support comprising an organosilica material, which is a mesoporous organosilica material; and 3) an optional activator. Useful catalysts include pyridyldiamido transition metal complexes, HN5 compounds, and bis(imino)pyridyl complexes. The organosilica material is a polymer of at least one monomer of Formula [Z.sup.1OZ.sup.2SiCH.sub.2].sub.3(1), where Z.sup.1 represents a hydrogen atom, a C.sub.1-C.sub.4alkyl group, or a bond to a silicon atom of another monomer and Z.sup.2 represents a hydroxyl group, a C1-C.sub.4alkoxy group, a C.sub.1-C.sub.6 alkyl group, or an oxygen atom bonded to a silicon atom of another monomer. This invention further relates to processes to polymerize olefins comprising contacting one or more olefins with the above catalyst system.

Provided are a novel cyclodisilazane derivative, a method for preparing the same, and a silicon-containing thin film using the same, wherein the cyclodisilazane derivative having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under a pressure where handling is easy, may form a high purity silicon-containing thin film having excellent physical and electrical properties by various deposition methods.

Disclosed are a zirconium-based metal-organic framework material and a preparation method thereof. Plasma-activated water or strong acid electrolyzed water is added to a raw material system for preparing a zirconium-based metal-organic framework material UiO-66, and they are then subjected to a reaction to obtain a crude product. The crude product is subjected to a post-treatment to obtain the zirconium-based metal-organic framework material UiO-66.

Disclosed are a zirconium-based metal-organic framework material and a preparation method thereof. Plasma-activated water or strong acid electrolyzed water is added to a raw material system for preparing a zirconium-based metal-organic framework material UiO-66, and they are then subjected to a reaction to obtain a crude product. The crude product is subjected to a post-treatment to obtain the zirconium-based metal-organic framework material UiO-66.