Provided is a method for preparing a (meth)acryloyl group-containing organopolysiloxane having a step of transesterification between the components (a1) and (a2) in the presence of the components (a3) and (a4) to obtain the (meth)acryloyl group-containing organopolysiloxane, wherein component (a1) is an organopolysiloxane represented by the average composition formula (1) which has a hydroxy group-containing group, component (a2) is a (meth)acrylic acid ester represented by the general formula (2), component (a3) is a zirconium metal complex in an amount such that a molar ratio of component (a3) to the hydroxy group of component (a1) is 0.001 to 0.1, and component (a4) is a hydroxy group-containing amine represented by HON(R.sup.4).sub.2 in an amount such that a molar ratio of component (a4) to component (a3) is 0.10 to 1.5, wherein R.sup.4 is, independently of each other, a linear or branched aliphatic hydrocarbon group having 1 to 6 carbon atoms.

The disclosure provides for zirconium terephthalate-based metal organic frameworks with open metal sites, and uses thereof.

A class of organometallic compounds is provided. The compounds correspond in structure to Formula 1 (A)x-M-(OR3)4-x wherein: A is selected from the group consisting of —NR1R2, —N(R4)(CH2)nN(R5R6), —N═C(NR4R5)(NR6R7), OCOR1, halo and Y; R1 and R2 are independently selected from the group consisting of H and a cyclic or acyclic alkyl group having from 1 to 8 carbon atoms, with the proviso that at least one of R1 and R2 must be other than H; R4, R5, R6 and R7 are independently selected from the group consisting of H and an acyclic alkyl group having from 1 to 4 carbon atoms; Y is selected from the group consisting of a 3- to 13-membered heterocyclic radical containing at least one nitrogen atom; R3 is a cyclic or acyclic alkyl group having from 1 to 6 carbon atoms; M is selected from the group consisting of Si, Ge, Sn, Ti, Zr and Hf; x is an integer from 1 to 3; and n is an integer from 1 to 4. Compounds of the invention may be useful as precursors in chemical phase deposition processes such as atomic layer deposition (ALD), chemical vapour deposition (CVD), plasma assisted ALD and plasma assisted CVD. Methods of low temperature vapour phase deposition of metal oxide films, such as SiO2 films, are also provided.

According to examples of the present disclosure, the organometallic compound is represented by Formula 1 below, which is used as a precursor when a Group 4 metal-containing thin film is deposited to provide a high-quality Group 4 metal-containing thin film.

##STR00001##

In Formula 1, M is Zr or Hf, R1 is selected from a linear alkyl group having 2 to 6 carbon atoms and a branched alkyl group having 3 to 6 carbon atoms, R2 is a linear alkyl group having 1 to 3 carbon atoms, and R1 and R2 are different from each other.

According to examples of the present disclosure, the organometallic compound is represented by Formula 1 below, which is used as a precursor when a Group 4 metal-containing thin film is deposited to provide a high-quality Group 4 metal-containing thin film.

##STR00001##

In Formula 1, M is Zr or Hf, R1 is selected from a linear alkyl group having 2 to 6 carbon atoms and a branched alkyl group having 3 to 6 carbon atoms, R2 is a linear alkyl group having 1 to 3 carbon atoms, and R1 and R2 are different from each other.

The disclosure provides a process for preparing bis(monoalkyl-substituted cyclopentadiene) tungsten hydride compounds, for example bis(isopropylcyclopentadienyl)tungsten dihydride, via the corresponding magnesium compound and tungsten hexachloride, followed by treatment with a hydride reagent. Also provided is a process for preparing bis(monoalkyl-substituted cyclopentadiene) metal halide compounds. This latter aspect is achieved by reaction of the corresponding magnesium compound with a metal halide. Exemplary metals in this process include hafnium, zirconium, titanium, tantalum, niobium, tungsten, and molybdenum.

The disclosure provides a process for preparing bis(monoalkyl-substituted cyclopentadiene) tungsten hydride compounds, for example bis(isopropylcyclopentadienyl)tungsten dihydride, via the corresponding magnesium compound and tungsten hexachloride, followed by treatment with a hydride reagent. Also provided is a process for preparing bis(monoalkyl-substituted cyclopentadiene) metal halide compounds. This latter aspect is achieved by reaction of the corresponding magnesium compound with a metal halide. Exemplary metals in this process include hafnium, zirconium, titanium, tantalum, niobium, tungsten, and molybdenum.

Multivariate metal-organic framework compositions and methods of producing multivariate metal-organic frameworks. The metal-organic framework including at least one light-emitting linker in an amount sufficient for the composition to produce broadband emission spectra in high efficiencies.

Embodiments are directed to a metal-ligand complex of formula (I). In addition, a polymerization process includes polymerizing at least one olefin in the presence of a catalyst system comprising the metal-ligand complex and at least one activator to produce an olefinic polymer.

Embodiments are directed to a metal-ligand complex of formula (I). In addition, a polymerization process includes polymerizing at least one olefin in the presence of a catalyst system comprising the metal-ligand complex and at least one activator to produce an olefinic polymer.