Patent classifications
C08F2/00
Continuous method for producing a diene elastomer
A continuous method for producing a diene elastomer is provided. The method comprises a polymerization reaction of a catalytic system with at least one conjugated diene monomer to be polymerized in solution in a solvent. The catalytic system is based on at least a rare earth organic salt and an alkylating agent, in at least two full polymerization reactors in series. A portion of the conjugated diene monomer to be polymerized is introduced into a polymerization reactor subsequent to the first polymerization reactor.
POLYMERIC MATERIALS
Apparatus for undertaking a chemical reaction includes an elongate housing and a receptacle. The elongate housing may include a cooling means, and end fittings, which may include ports where fluids may be introduced and/or removed. In use of the apparatus, a chemical reaction product is formed within the receptacle. Subsequently the receptacle containing the chemical reaction product is withdrawn from the elongate housing.
POLYMERIC MATERIALS
Apparatus for undertaking a chemical reaction includes an elongate housing and a receptacle. The elongate housing may include a cooling means, and end fittings, which may include ports where fluids may be introduced and/or removed. In use of the apparatus, a chemical reaction product is formed within the receptacle. Subsequently the receptacle containing the chemical reaction product is withdrawn from the elongate housing.
Multi-stage polymeric latexes, coating compositions containing such latexes, and articles coated therewith
An aqueous coating composition useful in coating a variety of substrates, including interior or exterior portions of food or beverage cans. The coating composition includes a multi-stage polymeric latex having two or more emulsion polymerized stages in an aqueous carrier liquid, wherein the latex has one or both of: (i) a lower glass transition temperature (Tg) emulsion polymerized stage having a calculated Tg that is at least 20° C. lower than a calculated Tg of a higher Tg emulsion polymerized stage, or (ii) a gradient Tg with at least a 20° C. differential in the calculated Tg of monomers fed at the start of polymerization compared to monomers fed at the end of polymerization.
When spray-applied on the interior of a food or beverage can, the composition exhibits a global extraction result of less than 50 ppm and a metal exposure value of less than 3 mA.
Method for manufacturing low molecular weight acrylic resin
A method for manufacturing a low molecular weight acrylic resin, and more particularly, to a method for manufacturing a low molecular weight acrylic resin having a high conversion rate and a low poly dispersion index includes maintaining the temperature of a reacting part with a screw stirrer at a specific temperature during a continuous polymerization of a solvent-free acrylic composition in a continuous flow reactor having the reacting part.
FINE RESIN PARTICLES AND METHOD FOR PRODUCING THE SAME
An object is to provide fine resin particles that have solvent resistance sufficient to withstand a heating step after solvent dispersion and that generate few bubbles during dispersion and have high dispersibility in a solvent, and a method for producing the fine resin particles. As a solution, fine resin particles obtained by polymerizing a vinyl monomer, the fine resin particles having a gel fraction of 93% or more and a solvent resistance index of 50 or less, and fine resin particles obtained by polymerizing a vinyl monomer, in which the vinyl monomer contains a reactive surfactant having a polyoxyalkylene chain in a molecule thereof, and a vinyl polymer chain of the fine resin particles is terminated with a hydroxy group derived from a polymerization initiator, are provided.
Method of preparing ethylene polymers by controlled high pressure polymerization
The present invention relates to a method for the radical polymerization or copolymerization of ethylene at high pressures using a hydroxylamine ester as radical initiator. The hydroxylamine esters according to the invention are suitable initiators for the high pressure polymerization of ethylene leading to high molecular weight polyethylenes with narrow molecular weight distributions (Poyldispersity Index PD=1, 2-4.5).
Method of preparing ethylene polymers by controlled high pressure polymerization
The present invention relates to a method for the radical polymerization or copolymerization of ethylene at high pressures using a hydroxylamine ester as radical initiator. The hydroxylamine esters according to the invention are suitable initiators for the high pressure polymerization of ethylene leading to high molecular weight polyethylenes with narrow molecular weight distributions (Poyldispersity Index PD=1, 2-4.5).
Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample. By using a copolymer for lithography in which the total of the triad fractions obtained in this way is not more than 20 mole % in the copolymer, a resist composition with excellent solubility and sensitivity can be manufactured.
Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample. By using a copolymer for lithography in which the total of the triad fractions obtained in this way is not more than 20 mole % in the copolymer, a resist composition with excellent solubility and sensitivity can be manufactured.