A fluorene-based photoinitiator, a preparation method thereof, a photocurable composition having the same, and use thereof in the field of photocuring are disclosed. In some embodiments, the fluorene-based photoinitiator has a structure represented by Formula I, wherein X is -A-(X).sub.n, wherein A is selected from a heteroatom which is selected from O, N, or S, X is selected from a C.sub.1-C.sub.20 linear alkyl group, a C.sub.1-C.sub.20 branched alkyl group, a C.sub.3-C.sub.8 cycloalkyl group, a C.sub.1-C.sub.10 alkyl group substituted with a C.sub.3-C.sub.8 cycloalkyl group or one or more of carbon atoms in X are substituted with a heteroatom, and n is 1 or 2; and R.sub.4 is a hydroxy group or a N-morpholinyl group. In some embodiments, the fluorene-based photoinitiator comprises a structure represented by Formula II.

The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R.sup.1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100. ##STR00001##

The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R.sup.1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100. ##STR00001##

The invention relates to penflufen-containing polymer particles, to penflufen-containing compositions comprising them, to processes for preparing them, and to the use thereof for protecting technical materials, more particularly wood, wood products, and wood-plastic composites.

The invention relates to penflufen-containing polymer particles, to penflufen-containing compositions comprising them, to processes for preparing them, and to the use thereof for protecting technical materials, more particularly wood, wood products, and wood-plastic composites.

A polymer having a first monomer operatively connected to Rose Bengal, a second monomer, and a surfactant, wherein the surfactant is selected from the group consisting of ionic surfactants, anionic surfactants, cationic surfactants, nonionic surfactants, zwitterionic surfactants, and mixtures thereof. The Rose Bengal in polymer in an amount effective for rendering the polymer antimicrobial or antiviral upon exposure of said polymer to light; and the polymer produces singlet oxygen from air in the presence of light. A substrate have these features is also included.

A dispersion of particles is provided that each contain at least one ferromagnetic domain and at least one phosphor domain having a stimulation wavelength, a glow persistence of at least 5 seconds and a visible wavelength emission. A polymeric resin that is transmissive of the stimulation wavelength and the visible wavelength emission coats the ferromagnetic and phosphor domains to define each particle size. A method of non-destructively inspecting a test article applies a dispersion of these particles to a surface of the test article. A magnetic field is then induced including the test article. The surface of the test article is exposed to incident energy adapted to stimulate phosphorescence of the dispersion of particles. With the incident energy exposure ceased, the position of the dispersion of particles on the surface of the test article is imaged. An inspection system for non-destructively inspecting a test article is also provided.

Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (LWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents an alkyl group which may be substituted with a fluorine atom, R.sup.3 represents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, R.sup.4 to R.sup.8 each independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in R.sup.2 and R.sup.3 is 1 to 6, and R.sup.2 and R.sup.3, or R.sup.2 and R.sup.4 may be bonded to each other and form a ring. ##STR00001##

Provided are a photocurable composition capable of suppressing both deformation (change in line width roughness (LWR)) of a pattern after etching and breakage of a pattern after etching, a pattern forming method, and a method for manufacturing a device. Disclosed is a photocurable composition including a monofunctional (meth)acrylate represented by the following General Formula (I) and a photopolymerization initiator, where R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents an alkyl group which may be substituted with a fluorine atom, R.sup.3 represents a hydrogen atom, a linear alkyl group which may be substituted with a fluorine atom, or a branched alkyl group which may be substituted with a fluorine atom, R.sup.4 to R.sup.8 each independently represent a hydrogen atom, a halogen atom, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms, the total number of carbon atoms included in R.sup.2 and R.sup.3 is 1 to 6, and R.sup.2 and R.sup.3, or R.sup.2 and R.sup.4 may be bonded to each other and form a ring. ##STR00001##

Disclosed are high refractive index, hydrophobic, acrylic materials. These materials have both high refractive index and a high Abbe number. This combination means the materials have a low refractive index dispersion and thus are especially suitable for use as intraocular lens materials. The materials are also suitable for use in other implantable ophthalmic devices, such as keratoprostheses, corneal rings, corneal implants, and corneal inlays.