An onium salt monomer consists of a sulfonic acid anion containing a polymerizable group and being free of iodine and a triarylsulfonium cation containing iodine and fluorine. A resist composition comprising a polymer comprising repeat units derived from the monomer exhibits a high solvent solubility, high sensitivity and high contrast and forms a small-size pattern with satisfactory exposure latitude, edge roughness, dimension uniformity and depth of focus when processed by photolithography using high-energy radiation, as well as collapse resistance.

An object of the present disclosure is to provide a film that has high water slidability, and a substrate having a surface covered with the film. The present disclosure provides a film having the properties of a sliding velocity of 150 mm/s or more at an inclination angle of 30 and an average surface roughness (Ra) of 1 m or less, and further provides a substrate having a surface covered with the film.

An object of the present disclosure is to provide a film that has high water slidability, and a substrate having a surface covered with the film. The present disclosure provides a film having the properties of a sliding velocity of 150 mm/s or more at an inclination angle of 30 and an average surface roughness (Ra) of 1 m or less, and further provides a substrate having a surface covered with the film.

A plastic optical fiber 10 of the present disclosure includes: a core 11; and a cladding 12 disposed on an outer circumference of the core 11. The plastic optical fiber 10 has a length of 30 m or less. The core 11 has a diameter of 30 m or more and 100 m or less. Of the plastic optical fiber 10, a transmission loss at a wavelength of 850 nm is 70 dB/km or more and 500 dB/km or less, and a transmission band at a wavelength of 850 nm is 30 MHz.Math.km or more and 600 MHz.Math.km or less.

A plastic optical fiber 10 of the present disclosure includes: a core 11; and a cladding 12 disposed on an outer circumference of the core 11. The plastic optical fiber 10 has a length of 30 m or less. The core 11 has a diameter of 30 m or more and 100 m or less. Of the plastic optical fiber 10, a transmission loss at a wavelength of 850 nm is 70 dB/km or more and 500 dB/km or less, and a transmission band at a wavelength of 850 nm is 30 MHz.Math.km or more and 600 MHz.Math.km or less.

A fluororesin including a residue unit of formula (1) and having a haze value equal to 2% or less of a heat-press molded product (thickness 1 mm) with a small haze value of a melt-molded product and a method for producing the same. ##STR00001##
Rf.sub.1, Rf.sub.2, Rf.sub.3 and Rf.sub.4 each independently represent one of the groups consisting of a fluorine atom, a linear perfluoroalkyl group having 1 to 7 carbon atoms, a branched perfluoroalkyl group having 3 to 7 carbon atoms, and a cyclic perfluoroalkyl group having 3 to 7 carbon atoms, the perfluoroalkyl group may have an ethereal oxygen atom, Rf.sub.1, Rf.sub.2, Rf.sub.3 and Rf.sub.4 may be linked to each other to form a ring having 4 or more and 8 or less carbon atoms, and the ring may include an ethereal oxygen atom.

An onium salt monomer consists of an anion having an aromatic ring substituted with a polymerizable group and iodine, a substituent containing a fluorosulfonic acid anion structure and a substituent containing an iodized aromatic ring being appended to the aromatic ring, and a cation. A resist composition comprising a polymer comprising repeat units derived from the monomer exhibits a high solvent solubility, high sensitivity and high contrast and forms a small-size pattern having satisfactory lithography properties such as LWR and CDU as well as etch resistance.

An onium salt monomer consists of an anion having an aromatic ring substituted with a polymerizable group and iodine, a substituent containing a fluorosulfonic acid anion structure and a substituent containing an iodized aromatic ring being appended to the aromatic ring, and a cation. A resist composition comprising a polymer comprising repeat units derived from the monomer exhibits a high solvent solubility, high sensitivity and high contrast and forms a small-size pattern having satisfactory lithography properties such as LWR and CDU as well as etch resistance.

An object of the present disclosure is to provide an antenna cover base material that is coated with a fluoropolymer-containing film and that has excellent durability of water sliding. The present disclosure pertains to an antenna cover base material coated with a fluoropolymer-containing film, the film having the properties of a water sliding velocity of 150 mm/s or more at an inclination angle of 30, and an average surface roughness (Ra) of 1 m or less.

An object of the present disclosure is to provide an antenna cover base material that is coated with a fluoropolymer-containing film and that has excellent durability of water sliding. The present disclosure pertains to an antenna cover base material coated with a fluoropolymer-containing film, the film having the properties of a water sliding velocity of 150 mm/s or more at an inclination angle of 30, and an average surface roughness (Ra) of 1 m or less.