An object of the present disclosure is to provide a film that has high water slidability, and a substrate having a surface covered with the film. The present disclosure provides a film having the properties of a sliding velocity of 150 mm/s or more at an inclination angle of 30° and an average surface roughness (Ra) of 1 μm or less, and further provides a substrate having a surface covered with the film.

Higher throughput in aqueous addition polymerization is made possible by use of an external shell and tube heat exchanger operated in reverse mode, with coolant flowing through the tubes and polymerization mixture flowing through the shell around the tubes.

A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.

A resist composition comprising a polymer comprising recurring units having an optionally substituted brominated phenol has advantages including high sensitivity, high resolution and reduced acid diffusion and forms a pattern of good profile with improved CDU.

A composition includes: a polymer including a repeating unit represented by formula (1); and a solvent. In the formula (1), Ar.sup.1 is a divalent group including an aromatic ring having 10 to 40 ring atoms; and R.sup.0 is a monovalent group including a heteroaromatic ring which includes a sulfur atom as a ring-forming atom.

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A composition includes: a polymer including a repeating unit represented by formula (1); and a solvent. In the formula (1), Ar.sup.1 is a divalent group including an aromatic ring having 10 to 40 ring atoms; and R.sup.0 is a monovalent group including a heteroaromatic ring which includes a sulfur atom as a ring-forming atom.

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A protective film-forming composition which protects against a semiconductor wet etching solution, contains a solvent and a compound or polymer thereof containing at least one acetal structure in a molecule thereof, and forms a protective film exhibiting excellent resistance against a semiconductor wet etching solution during the lithographic process when producing semiconductors; a method for producing a resist pattern-equipped substrate which uses the protective film; and a method for producing a semiconductor device.

The invention is related to a class of hydrophilic copolymers comprising loosely dangling thiol-containing pendant groups. The hydrophilic copolymers are highly reactive towards azetidinium groups of an azetidinium-containing polymer upon heating and can find particular use in for producing water-soluble highly-branched hydrophilic polymeric material useful for producing water gradient contact lenses.

The invention is related to a class of hydrophilic copolymers comprising loosely dangling thiol-containing pendant groups. The hydrophilic copolymers are highly reactive towards azetidinium groups of an azetidinium-containing polymer upon heating and can find particular use in for producing water-soluble highly-branched hydrophilic polymeric material useful for producing water gradient contact lenses.

A polymer to increase the primary detergent power of detergents and cleaning products, in particular with respect to soiling containing oil and/or grease. This is achieved essentially by the incorporation of polymers obtainable by polymerization of compounds of the general formula (I), in which R.sup.1, R.sup.2 and R.sup.3, independently of one another, represent H or an alkyl group having 1 to 3 C atoms with select ,-monoethylenically unsaturated monomers.